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Journal: Coatings, 2020
Volume: 10
Number: 542

Article: Effects of Cathode Voltage Pulse Width in High Power Impulse Magnetron Sputtering on the Deposited Chromium Thin Films
Authors: by Chin-Chiuan Kuo, Chun-Hui Lin, Yu-Tse Lin and Jing-Tang Chang
Link: https://www.mdpi.com/2079-6412/10/6/542

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