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Journal: Coatings, 2021
Volume: 11
Number: 117

Article: Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
Authors: by Alexander Rogozhin, Andrey Miakonkikh, Elizaveta Smirnova, Andrey Lomov, Sergey Simakin and Konstantin Rudenko
Link: https://www.mdpi.com/2079-6412/11/2/117

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