Order Article Reprints

Rafailov P, Mehandzhiev V, Sveshtarov P, Blagoev B, Terziyska P, Avramova I, Kirilov K, Ranguelov B, Avdeev G, Petrov S, et al. Atomic Layer Deposition Growth and Characterization of Al₂O₃ Layers on Cu-Supported CVD Graphene. Coatings. 2024; 14(6):662. https://doi.org/10.3390/coatings14060662

Rafailov, Peter, Vladimir Mehandzhiev, Peter Sveshtarov, Blagoy Blagoev, Penka Terziyska, Ivalina Avramova, Kiril Kirilov, Bogdan Ranguelov, Georgi Avdeev, Stefan Petrov, and et al. 2024. "Atomic Layer Deposition Growth and Characterization of Al₂O₃ Layers on Cu-Supported CVD Graphene" Coatings 14, no. 6: 662. https://doi.org/10.3390/coatings14060662

Rafailov, P., Mehandzhiev, V., Sveshtarov, P., Blagoev, B., Terziyska, P., Avramova, I., Kirilov, K., Ranguelov, B., Avdeev, G., Petrov, S., & Lin, S. H. (2024). Atomic Layer Deposition Growth and Characterization of Al₂O₃ Layers on Cu-Supported CVD Graphene. Coatings, 14(6), 662. https://doi.org/10.3390/coatings14060662