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Volume 14
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10.3390/coatings14070881
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Article

Effect of SiO2 Layer Thickness on SiO2/Si3N4 Multilayered Thin Films

by
Ziming Huang
,
Jiaqi Duan
,
Minghan Li
,
Yanping Ma
* and
Hong Jiang
*
State Key Laboratory of Marine Resources Utilization in South China Sea & Special Glass Key Laboratory of Hainan Province, Hainan University, Haikou 570228, China
*
Authors to whom correspondence should be addressed.
Coatings 2024, 14(7), 881; https://doi.org/10.3390/coatings14070881
Submission received: 14 June 2024 / Revised: 1 July 2024 / Accepted: 11 July 2024 / Published: 14 July 2024
(This article belongs to the Section Thin Films)
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Abstract

Silicon nitride (Si3N4) materials are widely used in the electronics, optoelectronics, and semiconductor industries, with Si3N4 thin films exhibiting high densities, high dielectric constants, good insulation performance, and good thermal and chemical stability. However, direct deposition of Si3N4 thin films on glass can result in considerable tensile stress and cracking. In this study, magnetron sputtering was used to deposit a Si3N4 thin film on glass, and a silicon dioxide (SiO2) thin film was introduced to reduce the Si3N4 binding force and stress. The effect of the SiO2 layer thickness on the SiO2/Si3N4 multilayered thin film was explored. The results indicated that the introduction of the SiO2 layer could improve the weak adhesion characteristics of Si3N4 thin films. Moreover, sputtering the SiO2 layer to 150 nm resulted in the highest hardness and transmittance of the SiO2/Si3N4 multilayered thin films. The findings of this study lay a solid foundation for the application of Si3N4 thin films on glass.
Keywords: magnetron sputtering; silicon nitride; thin film; transition layer; binding force magnetron sputtering; silicon nitride; thin film; transition layer; binding force

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MDPI and ACS Style

Huang, Z.; Duan, J.; Li, M.; Ma, Y.; Jiang, H. Effect of SiO2 Layer Thickness on SiO2/Si3N4 Multilayered Thin Films. Coatings 2024, 14, 881. https://doi.org/10.3390/coatings14070881

AMA Style

Huang Z, Duan J, Li M, Ma Y, Jiang H. Effect of SiO2 Layer Thickness on SiO2/Si3N4 Multilayered Thin Films. Coatings. 2024; 14(7):881. https://doi.org/10.3390/coatings14070881

Chicago/Turabian Style

Huang, Ziming, Jiaqi Duan, Minghan Li, Yanping Ma, and Hong Jiang. 2024. "Effect of SiO2 Layer Thickness on SiO2/Si3N4 Multilayered Thin Films" Coatings 14, no. 7: 881. https://doi.org/10.3390/coatings14070881

APA Style

Huang, Z., Duan, J., Li, M., Ma, Y., & Jiang, H. (2024). Effect of SiO2 Layer Thickness on SiO2/Si3N4 Multilayered Thin Films. Coatings, 14(7), 881. https://doi.org/10.3390/coatings14070881

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