Dual-Arm Cluster Tool Scheduling for Reentrant Wafer Flows
Abstract
:1. Introduction
2. Literature Review
3. The Reentrant Process and Periodical Schedules
3.1. Reentrant Process
3.2. Activity Description
3.3. Periodical Schedules
4. Scheduling Analysis by One-Wafer Cyclic Schedule
5. Two Novel Scheduling Methods
5.1. Scheduling Method One
5.2. Scheduling Method Two
Algorithm 1: For a DACT with (PM1, (PM2, PM3)3), the following algorithm is applied to choose one of the N3-WP1 and N3-WP2 schedules for the tool. | |
Input: ρ1, ρ2, ρ3, α, μ, β, and λ Output: The adopted schedule | |
1. | Calculate ψ, Π1, Π2, Π3, and Πlocal; |
2. | If max{Π2, Π3} ≤ ψ |
3. | If Π1 ≤ Πlocal + ψ |
4. | The N3-WP2 schedule is applied, and the cycle time is calculated by Theorem 9; |
5. | If Πlocal + ψ < Π1 ≤ 3Πlocal + ψ |
6. | Calculate ΠN3-WP1 by Theorem 4 and ΠN3-WP2 by Theorem 13; |
7. | If ΠN3-WP1 < ΠN3-WP2 |
8. | The N3-WP1 schedule is applied; |
9. | Else |
10. | The N3-WP2 schedule is applied; |
11. | If Π1 > 3Πlocal + ψ |
12. | The N3-WP1 schedule is applied, and the cycle time is calculated by Theorem 8; |
13. | Else |
14. | If Π1 ≤ Πlocal + ψ |
15. | The N3-WP2 schedule is applied, and the cycle time is calculated by Theorem 10; |
16. | If Πlocal + ψ < Π1 ≤ 2Πlocal |
17. | The N3-WP2 schedule is applied, and the cycle time is calculated by Theorem 11; |
18. | If 2Πlocal < Π1 ≤ 2.5Πlocal − 0.5ψ |
19. | The N3-WP2 schedule is applied, and the cycle time is calculated by Theorem 12; |
20. | If 2.5Πlocal − 0.5ψ < Π1 ≤ 3Πlocal + ψ |
21. | Calculate ΠN3-WP1 by Theorem 5 and ΠN3-WP2 by Theorem 12; |
22. | If ΠN3-WP1 < ΠN3-WP2 |
23. | The N3-WP1 schedule is applied; |
24. | Else |
25. | The N3-WP2 schedule is applied; |
26. | If 3Πlocal + ψ < Π1 ≤ 4Πlocal |
27. | Calculate ΠN3-WP1 by Theorem 6 and ΠN3-WP2 by Theorem 12. |
28. | If ΠN3-WP1 < ΠN3-WP2 |
29. | The N3-WP1 schedule is applied; |
30. | Else |
31. | The N3-WP2 schedule is applied; |
32. | If Π1 > 4Πlocal |
33. | The N3-WP1 schedule is applied, and the cycle time can be obtained by Theorem 7; |
6. Implementation of the Proposed Methods and Illustrative Examples
6.1. Implementation of the Proposed Methods
6.2. Illustrative Examples
7. Conclusions
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
References
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References | Number of Reentrant Times | Other Constraints | The Addressed Problem | Methods | Results |
---|---|---|---|---|---|
[31] | k ≥ 2 | None | Deadlock analysis | PNs | No optimality analysis |
[3] | k ≥ 2 | None | Scheduling | PNs and MIP | Optimal |
[32] | k = 2 | None | Scheduling | PNs | Optimal for SACTs |
[33] | k = 2 | None | Scheduling | PNs and 3-WP scheduling | Optimal for some cases |
[34] | k = 2 | None | Scheduling | PNs and 2-WP scheduling | Optimal for some cases |
[5] | k = 2 | None | Scheduling | PNs and 1-WP | Optimal |
[36,37] | k = 2 | WRTCs | Scheduling | 1-WP | Optimal |
[38,39] | k = 2 | WRTCs, time variation | Control and Scheduling | PNs and 1-WP | Optimal |
[35] | k ≥ 2 | None | Cycle time analysis | PNs and 3-WP | Optimal for some cases |
Notations | Robot Tasks | Time |
---|---|---|
PIi | Picking a wafer in Step i | α |
PLi | Placing a wafer in Step i | β |
Mij | Moving from Steps i to j | μ |
SWPi | Swapping in Step i | λ |
No. | ρ1 | ρ2 | ρ3 | N3-WP1 | N3-WP2 | 3-WP | The Adopted Scheduling Method | Improvement | ||
---|---|---|---|---|---|---|---|---|---|---|
ΠN3-WP1 | Theorem | ΠN3-WP2 | Theorem | Π3-WP | ||||||
1 | 250 | 35 | 50 | 258 | 7 | / | / | 302 | N3-WP1 | 14.57% |
2 | 150 | 25 | 30 | 158 | 8 | / | / | 195(1/3) | N3-WP1 | 19.11% |
3 | 70 | 25 | 30 | 130 | 4 | 118 | 9 | 142 | N3-WP2 | 16.90% |
4 | 70 | 25 | 35 | 140(1/3) | 5 | 129 | 10 | 152 | N3-WP2 | 15.13% |
5 | 95 | 40 | 50 | 183(2/3) | 5 | 174 | 11 | 198(2/3) | N3-WP2 | 12.42% |
6 | 110 | 40 | 50 | 188(2/3) | 5 | 174 | 12 | 208(2/3) | N3-WP2 | 16.61% |
7 | 140 | 25 | 30 | 153(1/3) | 4 | 163(1/3) | 13 | 188(2/3) | N3-WP1 | 18.73% |
8 | 100 | 25 | 30 | 140 | 4 | 136(2/3) | 13 | 162 | N3-WP2 | 15.64% |
9 | 210 | 35 | 50 | 222 | 6 | 236(2/3) | 12 | 275(1/3) | N3-WP1 | 19.37% |
10 | 200 | 35 | 50 | 218(2/3) | 5 | 230 | 12 | 268(2/3) | N3-WP1 | 18.61% |
11 | 120 | 35 | 50 | 192 | 5 | 176(2/3) | 12 | 215(1/3) | N3-WP2 | 17.96% |
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Song, T.; Qiao, Y.; He, Y.; Wu, N.; Li, Z.; Liu, B. Dual-Arm Cluster Tool Scheduling for Reentrant Wafer Flows. Electronics 2023, 12, 2411. https://doi.org/10.3390/electronics12112411
Song T, Qiao Y, He Y, Wu N, Li Z, Liu B. Dual-Arm Cluster Tool Scheduling for Reentrant Wafer Flows. Electronics. 2023; 12(11):2411. https://doi.org/10.3390/electronics12112411
Chicago/Turabian StyleSong, Tairan, Yan Qiao, Yunfang He, Naiqi Wu, Zhiwu Li, and Bin Liu. 2023. "Dual-Arm Cluster Tool Scheduling for Reentrant Wafer Flows" Electronics 12, no. 11: 2411. https://doi.org/10.3390/electronics12112411
APA StyleSong, T., Qiao, Y., He, Y., Wu, N., Li, Z., & Liu, B. (2023). Dual-Arm Cluster Tool Scheduling for Reentrant Wafer Flows. Electronics, 12(11), 2411. https://doi.org/10.3390/electronics12112411