Zhang, L.; Chen, S.; Fu, S.; Han, S.; Zhang, L.; Zhang, Y.; Wang, M.; Liu, C.; Liang, X.
Wet Etching-Based WO3 Patterning for High-Performance Neuromorphic Electrochemical Transistors. Electronics 2025, 14, 1183.
https://doi.org/10.3390/electronics14061183
AMA Style
Zhang L, Chen S, Fu S, Han S, Zhang L, Zhang Y, Wang M, Liu C, Liang X.
Wet Etching-Based WO3 Patterning for High-Performance Neuromorphic Electrochemical Transistors. Electronics. 2025; 14(6):1183.
https://doi.org/10.3390/electronics14061183
Chicago/Turabian Style
Zhang, Liwei, Sixing Chen, Shaoming Fu, Songjia Han, Li Zhang, Yu Zhang, Mengye Wang, Chuan Liu, and Xiaoci Liang.
2025. "Wet Etching-Based WO3 Patterning for High-Performance Neuromorphic Electrochemical Transistors" Electronics 14, no. 6: 1183.
https://doi.org/10.3390/electronics14061183
APA Style
Zhang, L., Chen, S., Fu, S., Han, S., Zhang, L., Zhang, Y., Wang, M., Liu, C., & Liang, X.
(2025). Wet Etching-Based WO3 Patterning for High-Performance Neuromorphic Electrochemical Transistors. Electronics, 14(6), 1183.
https://doi.org/10.3390/electronics14061183
