Ćwik, K.; Zawadzki, J.; Zybała, R.; Ożga, M.; Witkowski, B.; Wojnar, P.; Wolska-Pietkiewicz, M.; Jędrzejewska, M.; Lewiński, J.; Borysiewicz, M.A.
Magnetron Sputtering as a Solvent-Free Method for Fabrication of Nanoporous ZnO Thin Films for Highly Efficient Photocatalytic Organic Pollution Degradation. Compounds 2024, 4, 534-547.
https://doi.org/10.3390/compounds4030032
AMA Style
Ćwik K, Zawadzki J, Zybała R, Ożga M, Witkowski B, Wojnar P, Wolska-Pietkiewicz M, Jędrzejewska M, Lewiński J, Borysiewicz MA.
Magnetron Sputtering as a Solvent-Free Method for Fabrication of Nanoporous ZnO Thin Films for Highly Efficient Photocatalytic Organic Pollution Degradation. Compounds. 2024; 4(3):534-547.
https://doi.org/10.3390/compounds4030032
Chicago/Turabian Style
Ćwik, Kamila, Jakub Zawadzki, Rafał Zybała, Monika Ożga, Bartłomiej Witkowski, Piotr Wojnar, Małgorzata Wolska-Pietkiewicz, Maria Jędrzejewska, Janusz Lewiński, and Michał A. Borysiewicz.
2024. "Magnetron Sputtering as a Solvent-Free Method for Fabrication of Nanoporous ZnO Thin Films for Highly Efficient Photocatalytic Organic Pollution Degradation" Compounds 4, no. 3: 534-547.
https://doi.org/10.3390/compounds4030032
APA Style
Ćwik, K., Zawadzki, J., Zybała, R., Ożga, M., Witkowski, B., Wojnar, P., Wolska-Pietkiewicz, M., Jędrzejewska, M., Lewiński, J., & Borysiewicz, M. A.
(2024). Magnetron Sputtering as a Solvent-Free Method for Fabrication of Nanoporous ZnO Thin Films for Highly Efficient Photocatalytic Organic Pollution Degradation. Compounds, 4(3), 534-547.
https://doi.org/10.3390/compounds4030032
