Low-Temperature Plasma: Advancements and Applications
A special issue of Applied Sciences (ISSN 2076-3417). This special issue belongs to the section "Applied Physics General".
Deadline for manuscript submissions: 10 January 2025 | Viewed by 25
Special Issue Editor
Interests: gas discharge; discharge in liquid; plasma source; plasma diagnostics; biomedical application of plasma
Special Issues, Collections and Topics in MDPI journals
Special Issue Information
Dear Colleagues,
Low-temperature plasma is a unique state of matter in which most particles are neutral or weakly ionized, making it an attractive candidate for a wide range of applications. Our daily lives are increasingly reliant on low-temperature plasma. For example, the production and testing of computer chips require plasma, and materials used in artificial joints and dental implants also need plasma treatment to enhance their biocompatibility.
As research advances, existing low-temperature plasma applications are being improved while new areas of usage, such as nitrogen fixation, are emerging. This has led to numerous international conferences dedicated to low-temperature plasma, including the Gaseous Electronics Conference, IEEE International Conference on Plasma Science (ICOPS), International Symposium on High Pressure, Low-Temperature Plasma Chemistry (HAKONE), and the International Symposium on Plasma Chemistry.
Unlike high-temperature plasma research, which requires expensive and complex equipment and large teams, low-temperature plasma research is more accessible, requiring relatively simple equipment and allowing small teams to conduct research. This has resulted in a large and diverse community of researchers, each contributing their expertise, fueling the vibrant and flourishing development of low-temperature plasma research.
Due to this ongoing progress, researchers in the field are continuously achieving breakthroughs. Therefore, we are launching this Special Issue to report on the latest findings in the field of low-temperature plasma.
We invite scientists and engineers in this field to submit manuscripts to the Special Issue dedicated to this topic. This Special Issue aims to present new results, developments, novel methods, and studies in this exciting and technologically important area with significant industrial relevance. Contributions are encouraged, but not limited to, the following topics:
- Low-Temperature Plasma sources
- Low-Temperature Plasma diagnostics
- Physics of Low-Temperature Plasma
- Low-Temperature Plasma chemistry
- Applications of Low-Temperature Plasma
Prof. Dr. Xinpei Lu
Guest Editor
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Applied Sciences is an international peer-reviewed open access semimonthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
Keywords
- low-temperature plasma sources
- plasma diagnostics
- pulsed-power technology
