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Modification and Technology of Thin Films
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Modification and Technology of Thin Films

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Thin Films".

Deadline for manuscript submissions: 20 May 2026 | Viewed by 1019

Special Issue Editors

Prof. Dr. Choongik Kim

E-Mail Website
Guest Editor
Department of Chemical and Biomolecular Engineering, Sogang University, Seoul 04107, Republic of Korea
Interests: transistor; semiconductor; dielectric; memory; rad-hard electronics
Special Issues, Collections and Topics in MDPI journals
Dr. Dongil Ho

E-Mail Website
Guest Editor
Department of Chemical Engineering, Kongju National University, Cheonan 31080, Republic of Korea
Interests: semiconductor; transistor; crystallization; device stability; green electronics

Special Issue Information

Dear Colleagues,

Thin films play a pivotal role in advancing modern technologies, from electronics and energy systems to biomedical devices and protective coatings. The Special Issue, "Modification and Technology of Thin Films," aims to explore the latest developments in the design, synthesis, and functionalization of thin films to enhance their performance and applications. This interdisciplinary field encompasses innovative deposition techniques, surface modification strategies, and advanced characterization methods to tailor thin film properties such as mechanical strength, optical transparency, electrical conductivity, and chemical stability. We invite contributions that address various aspects of novel fabrication processes, including physical and chemical vapor deposition, atomic layer deposition, and plasma-enhanced techniques, as well as emerging approaches like nanostructuring and hybrid material integration. Research on thin film applications in areas such as renewable energy, sensors, microelectronics, and biomedicine is also encouraged. This Special Issue seeks to provide a platform for researchers to share cutting-edge findings, fostering collaboration and driving advancements in thin film technology.

Prof. Dr. Choongik Kim
Dr. Dongil Ho
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 250 words) can be sent to the Editorial Office for assessment.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • thin films
  • surface modification
  • deposition techniques
  • semiconductor
  • insulator
  • metal nanostructuring
  • functional coatings
  • sputtering
  • sol-gel processing
  • thin film morphology
  • multilayer films
  • self-assembled monolayers
  • physical vapor deposition
  • chemical vapor deposition
  • atomic layer deposition
  • plasma-enhanced deposition
  • thin film characterization
  • thin film stress
  • adhesion properties
  • hybrid materials
  • microelectronics
  • renewable energy
  • biomedical coatings
  • optical properties
  • transistor
  • flexible electronics
  • photovoltaics
  • battery
  • sensors

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Further information on MDPI's Special Issue policies can be found here.

Published Papers (2 papers)

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Research

14 pages, 4033 KB  
Article
Microstructural Evolution and Hardening Behavior of a Low-Activation Ti-Nb-Zr-O Film Under He+ Irradiation
by Wanmin Yu, Ranshang Guo, Tianyu Zhao, Guanzhi Wang, Yanhui Li, Youping Lu, Zhenjie Liu, Juan Du, Zhiqiang Cao and Li Jiang
Coatings 2026, 16(4), 480; https://doi.org/10.3390/coatings16040480 - 16 Apr 2026
Viewed by 244
Abstract
The development of accident-tolerant fuels has significantly enhanced the safety of fission reactors. The TiNbZrO alloy system has garnered considerable attention due to its excellent mechanical properties and outstanding irradiation resistance. Its unique compositional design enables effective suppression of irradiation-induced defect formation. In [...] Read more.
The development of accident-tolerant fuels has significantly enhanced the safety of fission reactors. The TiNbZrO alloy system has garnered considerable attention due to its excellent mechanical properties and outstanding irradiation resistance. Its unique compositional design enables effective suppression of irradiation-induced defect formation. In this study, TiNbZrO thin films are fabricated via radio-frequency magnetron sputtering and irradiated with 50 keV He ions to fluences of 5 × 1016, 1 × 1017, and 2 × 1017 ions/cm2. The microstructural evolution before and after irradiation is characterized by Transmission Electron Microscopy (TEM) and Grazing Incidence X-ray Diffraction (GIXRD), and the changes in mechanical properties are evaluated by nanoindentation. With increasing irradiation fluence, the average size of He bubbles increases from 1.10 nm to 2.06 nm, the number density decreases from 5.27 × 1024 m−3 to 1.39 × 1024 m−3, and the swelling rate rises from 0.37% to 0.64%. Although significant irradiation hardening is observed in all samples, the maximum hardening rate reaches only 31.91%, a value substantially lower than that reported for many conventional nuclear materials. This demonstrates the superior irradiation resistance of TiNbZrO thin films. The superior irradiation resistance of TiNbZrO thin films stems from two synergistic effects: high-entropy lattice distortion suppresses atomic diffusion, while oxygen complexes pin defects. Full article
(This article belongs to the Special Issue Modification and Technology of Thin Films)
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14 pages, 3491 KB  
Article
Microstructure and Soft Magnetic Properties of an FeGaYCo Film
by Haohao Deng, Zhibin Zhu, Zihao Zhao, Li Jiang, Yanhui Li, Zhiqiang Cao and Wei Zhang
Coatings 2026, 16(1), 77; https://doi.org/10.3390/coatings16010077 - 8 Jan 2026
Viewed by 444
Abstract
Soft magnetic materials are critical for efficient electromagnetic energy conversion, with their development evolving from traditional alloys like ferrites to amorphous/nanocrystalline materials and advanced multi-component alloys. While multi-component alloys address key limitations of prior materials (e.g., low resistivity, poor thermal stability), gaps remain [...] Read more.
Soft magnetic materials are critical for efficient electromagnetic energy conversion, with their development evolving from traditional alloys like ferrites to amorphous/nanocrystalline materials and advanced multi-component alloys. While multi-component alloys address key limitations of prior materials (e.g., low resistivity, poor thermal stability), gaps remain in understanding how preparation parameters regulate the microstructure and properties. This study systematically investigates the effects of sputtering power and substrate temperature on the microstructural evolution and soft magnetic properties of an FeGaYCo film. First, the sputtering power increases from 70 W to 160 W. This adjustment refines grains, promotes crystallization, and drives coercivity (HC) and saturation magnetization (MS) to first decrease then increase —with optimal soft magnetic properties (HC = 5.7 Oe, MS = 1164.3 emu/cm3) being achieved at 100 W. For substrate temperature, increasing the temperature from 25 °C to 100 °C enhances atomic migration (leading to larger grains) but exerts limited influence on the overall number of grains per unit volume; the lowest HC (3.8 Oe) and highest MS (1321.2 emu/cm3) occur at 75 °C. These findings provide theoretical and experimental support for developing a high-performance next-generation soft magnetic film. Full article
(This article belongs to the Special Issue Modification and Technology of Thin Films)
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