Ambient Pressure Chemical Vapor Deposition (AP-CVD): Technology and Applications

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Surface Characterization, Deposition and Modification".

Deadline for manuscript submissions: closed (30 June 2023) | Viewed by 406

Special Issue Editor


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Guest Editor
CNR-IMM, Research National Council of Italy - Institute for Microelectronics and Microsystems, UoS Agrate Brianza, Via C. Olivetti, 2, I-20864 Agrate Brianza, MB, Italy
Interests: AP-CVD; thin films; 2D materials; transition metal dichalcogenides; functional coatings

Special Issue Information

Dear Colleagues,

Ambient-pressure chemical vapor deposition (AP-CVD) is a well-established and widespread synthesis method both at research labs and industrial facilities, in which a substrate is exposed to one or more volatile precursors at atmospheric pressure, leading to its reaction or decomposition on the surface to produce a deposit. Typically, a layer several nano- to micrometers-thick is deposited onto wafers or other types of substrates to obtain, for instance, epitaxial films, compound semiconductors, doped and undoped oxides, antireflection coatings, or transparent conductive oxide coatings. Recently, AP-CVD has become popular for the synthesis of 2D materials, such as graphene and transition-metal dichalcogenides. AP-CVD is also used as a surface-finishing process in several fields for tools and turbine blades, among others, to improve lifetime and performance.

This Special Issue aims to collect contributions from academic researchers and industrial specialists on advancements in AP-CVD technology and applications. Under this scope, original articles and reviews on the following and related topics are welcome:

  • Innovative solutions in AP-CVD equipment;
  • Optimization of AP-CVD processes in industrial environments;
  • Development of new AP-CVD process at the academic research;
  • AP-CVD-based processes for the growth of 2D materials.

Dr. Alessio Lamperti
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

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Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • AP-CVD
  • thin films
  • layered materials
  • 2D materials
  • functional coatings
  • protective coatings

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Published Papers

There is no accepted submissions to this special issue at this moment.
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