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Interfaces in Memristor

A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Thin Films and Interfaces".

Deadline for manuscript submissions: closed (20 October 2022) | Viewed by 2372

Special Issue Editor


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Guest Editor
i3N/CENIMAT, Department of Materials Science, Faculdade de Ciências e Tecnologia, Universidade Nova de Lisboa, Caparica, Portugal
Interests: photoelectron spectroscopy; surface science; oxide semiconductors; optoelectronics; nanotechnology; renewable energies; resistive switching

Special Issue Information

Dear Colleagues,

Memristor properties are often governed by their interfaces to electrodes. These interfaces determine built-in electrical potentials and barriers, the fundamentals of electrical transport. Resistive switching involves modification of barriers, mainly by changes in intrinsic defect concentrations (valence change mechanism) or by the transport of material from the contacts (electrochemical mechanism). The lack of industrial applications of memristors shows that we are still far from effective memristor design rules. Since “The interface is the device” (Nobel laureate Herbert Kroemer), this Special Issue is focused on novel experimental and theoretic insight into the chemical and electronic nature of interfaces in memristors.

Dr. Jonas Deuermeier
Guest Editor

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Keywords

  • resistive switching
  • memristors
  • oxides
  • interface analysis
  • photoelectron spectroscopy (XPS)
  • transmission electron microscopy (TEM)
  • scanning tunneling microscopy (STM)
  • atomic force microscopy (AFM)
  • In situ/in operando

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Published Papers (1 paper)

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Research

11 pages, 5833 KiB  
Article
MAPbI3 Microrods-Based Photo Resistor Switches: Fabrication and Electrical Characterization
by Ehsan Raza, Fakhra Aziz, Arti Mishra, Noora Jabor Al-Thani and Zubair Ahmad
Materials 2021, 14(16), 4385; https://doi.org/10.3390/ma14164385 - 5 Aug 2021
Cited by 2 | Viewed by 1739
Abstract
The current work proposed the application of methylammonium lead iodide (MAPbI3) perovskite microrods toward photo resistor switches. A metal-semiconductor-metal (MSM) configuration with a structure of silver-MAPbI3(rods)-silver (Ag/MAPbI3/Ag) based photo-resistor was fabricated. The MAPbI3 microrods were prepared [...] Read more.
The current work proposed the application of methylammonium lead iodide (MAPbI3) perovskite microrods toward photo resistor switches. A metal-semiconductor-metal (MSM) configuration with a structure of silver-MAPbI3(rods)-silver (Ag/MAPbI3/Ag) based photo-resistor was fabricated. The MAPbI3 microrods were prepared by adopting a facile low-temperature solution process, and then an independent MAPbI3 microrod was employed to the two-terminal device. The morphological and elemental compositional studies of the fabricated MAPbI3 microrods were performed using FESEM and EDS, respectively. The voltage-dependent electrical behavior and electronic conduction mechanisms of the fabricated photo-resistors were studied using current–voltage (I–V) characteristics. Different conduction mechanisms were observed at different voltage ranges in dark and under illumination. In dark conditions, the conduction behavior was dominated by typical trap-controlled charge transport mechanisms within the investigated voltage range. However, under illumination, the carrier transport is dominated by the current photogenerated mechanism. This study could extend the promising application of perovskite microrods in photo-induced resistor switches and beyond. Full article
(This article belongs to the Special Issue Interfaces in Memristor)
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