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Photonics
Special Issues
Optoelectronic Detection Technologies and Applications
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Optoelectronic Detection Technologies and Applications

A special issue of Photonics (ISSN 2304-6732). This special issue belongs to the section "Optoelectronics and Optical Materials".

Deadline for manuscript submissions: 10 April 2025 | Viewed by 2404

Special Issue Editors

Prof. Dr. Bincheng Li

E-Mail Website
Guest Editor
School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, China
Interests: photoelectronic detection; optical testing; laser technology and applications
Prof. Dr. Dawei Zhang

E-Mail Website
Guest Editor
Engineering Research Center of Optical Instrument and System, The Ministry of Education, Shanghai Key Laboratory of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China
Interests: photoelectronic information; nano-optics; optical thin films
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

Photoelectronic detection technology, as one of the major means of acquiring information, has the advantages of high precision, fast response, remote detection, and so on. Photoelectronic detection technology is a comprehensive subject based on optics, mechanics, electronics, computers, etc. In the last few decades, enormous progress has been made in photoelectronic detection technology, due to the rapid development of laser technology, optical waveguide technology, optical fiber technology, photo-detection technology, computer technology, as well as the continuous emergence of new materials, new devices, and new processes. Photoelectronic detection technology has a wide range of applications and plays an increasingly important role in both military and civilian fields.

This Special Issue invites manuscripts that introduce the recent advances in “Optoelectronic Detection Technologies and Applications”. All theoretical, numerical, and experimental papers are welcomed. Topics include, but are not limited to, the following:

  • UV/VIS/IR detection technologies and applications;
  • Terahertz detection technologies and applications;
  • Low-level light detection technologies and applications;
  • Single-photon detection technologies and applications;
  • Laser detection technologies and applications;
  • Polarization detection technologies and applications;
  • Quantum detection technologies and applications;
  • Multi-spectral/high-spectral/hyper-spectral detection technologies and applications;
  • High dynamic imaging technologies and applications;
  • High-speed imaging technologies and applications;
  • 3D imaging technologies and applications;
  • Optoelectronic devices technologies and applications;
  • Novel Microwave detection technologies and applications;
  • Composite detection technologies and applications;
  • Space detection technologies and applications;
  • Intelligent optoelectronic detection technologies and applications.

Prof. Dr. Bincheng Li
Prof. Dr. Dawei Zhang
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Photonics is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • UV/VIS/IR detection
  • terahertz detection
  • single-photon detection
  • laser detection
  • quantum detection
  • multi-spectral/high-spectral/hyper-spectral detection
  • high dynamic imaging
  • 3D imaging
  • optoelectronic devices
  • intelligent optoelectronic detection

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Further information on MDPI's Special Issue polices can be found here.

Published Papers (2 papers)

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Research

13 pages, 2980 KiB  
Communication
Simulation Study of Localized, Multi-Directional Continuous Dynamic Tailoring for Optical Skyrmions
by Gao Tang, Chunyan Bai, Yuxing Zhang, Zhening Zhao and Dawei Zhang
Photonics 2024, 11(6), 499; https://doi.org/10.3390/photonics11060499 - 24 May 2024
Viewed by 800
Abstract
The topological properties of optical skyrmions have enormous application value in fields such as optical communication and polarization sensing. At present, research on optical skyrmions focuses primarily on the topological principles of skyrmions and their applications. Nonetheless, extant research devoted to skyrmion-array manipulation [...] Read more.
The topological properties of optical skyrmions have enormous application value in fields such as optical communication and polarization sensing. At present, research on optical skyrmions focuses primarily on the topological principles of skyrmions and their applications. Nonetheless, extant research devoted to skyrmion-array manipulation remains meager. The sole manipulation scheme has a limited effect on the movement direction of the whole skyrmion array. Based on the interference principle of the surface plasmon polariton (SPP) wave, we propose an upgraded scheme for the tailoring of electric-field optical skyrmions. A distributed Gaussian-focused spots array is deployed. Unlike the existing manipulation, we customize the phase of the light source to be more flexible, and we have discovered optical-skyrmion tailoring channels and shaping channels. Specifically, we move the skyrmions within the channel in both directions and manipulate the shape of the topological domain walls to achieve customized transformation. This work will evolve towards a more flexible regulatory plan for tailoring optical-skyrmion arrays, and this is of great significance for research in fields such as optical storage and super-resolution microimaging. Full article
(This article belongs to the Special Issue Optoelectronic Detection Technologies and Applications)
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11 pages, 2067 KiB  
Article
Accurate Determination of the Low-Light-Level Absorption of DUV-Fused Silica at 193 nm with Laser Calorimetry
by Fengting Li, Haojie Sun, Weijing Liu, Ruijin Hong and Chunxian Tao
Photonics 2024, 11(4), 305; https://doi.org/10.3390/photonics11040305 - 27 Mar 2024
Viewed by 996
Abstract
The low-light-level absorption coefficient of OH-contained and H2-impregnated synthetic fused silica material in 193 nm optical lithography application is determined via a laser calorimetry measurement. The fluence and repetition rate dependences of the absorptances of the deep ultraviolet (DUV)-fused silica samples [...] Read more.
The low-light-level absorption coefficient of OH-contained and H2-impregnated synthetic fused silica material in 193 nm optical lithography application is determined via a laser calorimetry measurement. The fluence and repetition rate dependences of the absorptances of the deep ultraviolet (DUV)-fused silica samples with different thickness are measured. The measured dependences are fitted to a theoretical model, taking into consideration the generation and annealing of laser irradiation induced defects. The surface absorption, the low-light-level linear absorption coefficient, as well as the nonlinear absorption coefficient of the fused silica material are accurately determined via the fitting. The low-light-level linear absorption coefficients determined via the fluence dependence and the repetition rate dependence are in good agreement, demonstrating the reliability of the measured low-light-level absorption coefficient, which is the key parameter to the determination of the internal transmission of the DUV-fused silica material used in the 193 nm optical lithography. Full article
(This article belongs to the Special Issue Optoelectronic Detection Technologies and Applications)
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