Optical and Photonic Devices: From Design to Nanofabrication

A special issue of Photonics (ISSN 2304-6732).

Deadline for manuscript submissions: 28 February 2025 | Viewed by 492

Special Issue Editors


E-Mail Website
Guest Editor
Department of Electrical and Systems Engineering, Washington University in St. Louis 1 Brookings Drive, St. Louis 63130, MO, USA
Interests: integrated photonics; microresonators; nonlinear optics; non-Hermitian physics; optical sensing

E-Mail Website
Guest Editor
School of Physics, Nankai University, 94 Weijin Road, Tianjin 300071, China
Interests: integrated photonics; nonlinear optics; electro-optic modulation; microresonators; nanofabrication

Special Issue Information

Dear Colleagues,

In recent decades, with the development of advanced design and nanofabrication technology, optical and photonic devices have catalyzed revolutionary progress in scientific and industrial research. These devices underpin crucial fundamentals of modern technology, ranging from telecommunication to computing, renewable energy to medical diagnostics. Researchers delve into the modeling, design, and practical realization of various devices, exploring intriguing areas such as photonic integrated circuits, metamaterials, photonic crystals, two-dimensional materials, hybrid/heterogeneous integration methods, as well as advanced nanofabrication techniques. These studies not only underscore the pivotal role of optical and photonic devices in shaping our technological landscape but also guide the path toward future innovations.

We are pleased to invite contributions to this Special Issue of Photonics, entitled “Optical and Photonic Devices: From Design to Nanofabrication.” This Special Issue aims to highlight recent progress for optical/photonic devices, focusing on innovative design methods, advanced manufacturing technologies, and evaluations of system performance. In this Special Issue, both original research articles and reviews are welcome. Research areas may include (but are not limited to) the following:

  • Photonic integrated circuits (PICs), including diverse material platforms (Si, Si3N4, LiNbO3, LiTaO3, AlN, InP, AlGaAs, ITO, polymer, Ge-Sb-Te, etc.) and intriguing applications (light source, modulator, detector, etc.);
  • Nanodevices in optics/photonics, such as metamaterials, photonic crystals, and nanoplasmonic structures;
  • Two-dimensional (2D) or thin-film materials in optics or photonics;
  • Hybrid or heterogenous photonic integration techniques;
  • Advanced manufacturing technologies or instruments, such as lithography, dry/wet processes, deposition, and metrology;
  • Inverse design or optimization algorithms for optics or photonics;
  • Optical components for augmented reality (AR), virtual reality (VR), and mixed reality (MR).

Dr. Wenbo Mao
Dr. Zhenzhong Hao
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Photonics is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • photonic integrated circuits
  • metamaterials
  • 2D photonics
  • hybrid/heterogenous integration
  • advanced manufacturing
  • nanofabrication
  • optical design

Benefits of Publishing in a Special Issue

  • Ease of navigation: Grouping papers by topic helps scholars navigate broad scope journals more efficiently.
  • Greater discoverability: Special Issues support the reach and impact of scientific research. Articles in Special Issues are more discoverable and cited more frequently.
  • Expansion of research network: Special Issues facilitate connections among authors, fostering scientific collaborations.
  • External promotion: Articles in Special Issues are often promoted through the journal's social media, increasing their visibility.
  • e-Book format: Special Issues with more than 10 articles can be published as dedicated e-books, ensuring wide and rapid dissemination.

Further information on MDPI's Special Issue polices can be found here.

Published Papers (1 paper)

Order results
Result details
Select all
Export citation of selected articles as:

Research

13 pages, 3151 KiB  
Article
SuperNANO: Enabling Nanoscale Laser Anti-Counterfeiting Marking and Precision Cutting with Super-Resolution Imaging
by Yiduo Chen, Bing Yan, Liyang Yue, Charlotte L. Jones and Zengbo Wang
Photonics 2024, 11(9), 846; https://doi.org/10.3390/photonics11090846 - 5 Sep 2024
Viewed by 317
Abstract
In this paper, we present a unique multi-functional super-resolution instrument, the SuperNANO system, which integrates real-time super-resolution imaging with direct laser nanofabrication capabilities. Central to the functionality of the SuperNANO system is its capacity for simultaneous nanoimaging and nanopatterning, enabling the creation of [...] Read more.
In this paper, we present a unique multi-functional super-resolution instrument, the SuperNANO system, which integrates real-time super-resolution imaging with direct laser nanofabrication capabilities. Central to the functionality of the SuperNANO system is its capacity for simultaneous nanoimaging and nanopatterning, enabling the creation of anti-counterfeiting markings and precision cutting with exceptional accuracy. The SuperNANO system, featuring a unibody superlens objective, achieves a resolution ranging from 50 to 320 nm. We showcase the instrument’s versatility through its application in generating high-security anti-counterfeiting features on an aluminum film. These ‘invisible’ security features, which are nanoscale in dimension, can be crafted with arbitrary shapes at designated locations. Moreover, the system’s precision is further evidenced by its ability to cut silver nanowires to a minimum width of 50 nm. The integrated imaging and fabricating functions of the SuperNANO make it a pivotal tool for a variety of applications, including nanotrapping, sensing, cutting, welding, drilling, signal enhancement, detection, and nanoscale laser treatment. Full article
(This article belongs to the Special Issue Optical and Photonic Devices: From Design to Nanofabrication)
Show Figures

Figure 1

Back to TopTop