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Photonics
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Recent Advances in Optical Thin Films
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Recent Advances in Optical Thin Films

A special issue of Photonics (ISSN 2304-6732). This special issue belongs to the section "Optoelectronics and Optical Materials".

Deadline for manuscript submissions: closed (20 October 2022) | Viewed by 4331

Special Issue Editors

Prof. Dr. Zhanshan Wang

E-Mail Website
Chief Guest Editor
Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
Interests: extreme ultraviolet; laser-induced damage; thin films; silicon; X-ray optic
Prof. Dr. Jinlong Zhang

E-Mail Website
Guest Editor
1. Institute of Precision Optical Engineering (IPOE) School of Physics Sciences and Engineering Tongji University, Shanghai 200092, China
2. Key Laboratory of Advanced Microstructure Materials of Ministry of Education, Shanghai, China
Interests: optical coatings for lasers; nanostructural optical coatings; optical fabrication and measurements of ultra high quality optical components

Special Issue Information

Dear Colleagues,

This Special Issue will present results of state-of-the-art research in the field of optical coatings. Optical coatings are one of the core technologies in modern optical fields. Recent progress in the field of materials, design theory, instruments, and techniques of optical coatings opens up a new avenue for developing advanced thin-film optical filters, low-loss coatings, high-power laser coatings, and novel functional optical coatings that are capable of solving numerous complex problems in areas, such as biomedical, laser systems, security, remote sensing, astronomy, and aerospace. Considering this rapid progress, Photonics intends to publish a special section to capture the most recent advances of optical coatings.

Prof. Dr. Zhanshan Wang
Chief Guest Editor
Prof. Dr. Jinlong Zhang
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Photonics is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • Novel coating materials
  • Design
  • Deposition Process Technologies
  • Characterization of optical coatings
  • Coatings for advanced application.

Published Papers (3 papers)

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Research

9 pages, 1788 KiB  
Communication
Design and Fabrication of Highly Selective Polarizers Using Metallic–Dielectric Gratings
by Jingyuan Zhu, Yi Ning, Liang Liu, Siyu Dong, Yifang Chen, Zhanshan Wang and Xinbin Cheng
Photonics 2023, 10(1), 52; https://doi.org/10.3390/photonics10010052 - 3 Jan 2023
Cited by 1 | Viewed by 1375
Abstract
Polarization imaging has been proven as an important technique for obtaining multi-dimensional information in complex environments. As the prevalent polarizers, metal gratings are widely used especially for focal-plane detection due to their flexibility and easy integration. However, high-performance polarization gratings with high transmittance [...] Read more.
Polarization imaging has been proven as an important technique for obtaining multi-dimensional information in complex environments. As the prevalent polarizers, metal gratings are widely used especially for focal-plane detection due to their flexibility and easy integration. However, high-performance polarization gratings with high transmittance and large extinction ratios typically need a large aspect ratio in design, resulting in more difficulties in fabrication with limited practical performances. In this study, we designed and fabricated a high-performance polarizer using metallic–dielectric gratings (MDGs). Through a single CMOS-compatible procedure that included electron-beam lithography (EBL) and a collimated thermal evaporation deposition process, we achieved a high TM transmittance (~90%) and a high extinction ratio (~100:1) in the experiment. We believe that our work provides an effective approach to high-performance polarization gratings, which could contribute to the development of on-chip integrated polarization imaging. Full article
(This article belongs to the Special Issue Recent Advances in Optical Thin Films)
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9 pages, 1845 KiB  
Communication
Research on Optical and Mechanical Compatible Design Technology of Multilayer Films
by Jinlin Bai, Huasong Liu, Ziyang Li, Peng Sun, Xiao Yang, Shida Li and Jianzhong Su
Photonics 2022, 9(12), 897; https://doi.org/10.3390/photonics9120897 - 24 Nov 2022
Viewed by 1010
Abstract
The stress’s accumulation will critically affect optical device stability, leading to components’ deviation and film peeling. Stress control techniques based on strain cancelation cannot precisely match film stress, and it is difficult to reduce the total stress of multilayer film to ultra-low levels. [...] Read more.
The stress’s accumulation will critically affect optical device stability, leading to components’ deviation and film peeling. Stress control techniques based on strain cancelation cannot precisely match film stress, and it is difficult to reduce the total stress of multilayer film to ultra-low levels. Existing software for film system design is mainly based on 2D design concepts such as wavelength-spectrum and does not consider 3D design concepts such as wavelength-spectrum-stress, but the stress parameter plays an essential role in film performance, and it is necessary to use it as an optimization index for film design. In this paper, we introduce mechanical synchronization design into film system design. The multilayer film’s optimal structure is precisely matched by the genetic algorithm, and an ultra-low stress and wide-spectrum optical film element is developed under the dual requirements of optical performance and mechanical performance. This technique incorporates computer-aided design and automatically seeks an optimal combination of layered film nanostructures through self-compiled optical and mechanical compatible design software. While ensuring invariant optical properties, it can effectively reduce the total stress of multilayer film. This can provide a new idea for film stress control. Full article
(This article belongs to the Special Issue Recent Advances in Optical Thin Films)
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12 pages, 6050 KiB  
Article
Sub-5 nm AFM Tip Characterizer Based on Multilayer Deposition Technology
by Ziruo Wu, Yingfan Xiong, Lihua Lei, Wen Tan, Zhaohui Tang, Xiao Deng, Xinbin Cheng and Tongbao Li
Photonics 2022, 9(9), 665; https://doi.org/10.3390/photonics9090665 - 17 Sep 2022
Cited by 2 | Viewed by 1334
Abstract
Atomic force microscope (AFM) is commonly used for three-dimensional characterization of the surface morphology of structures at nanoscale, but the “Inflation effect” of the tip is an important factor affecting the accuracy. A tip characterizer has the advantages of in situ measurement, higher [...] Read more.
Atomic force microscope (AFM) is commonly used for three-dimensional characterization of the surface morphology of structures at nanoscale, but the “Inflation effect” of the tip is an important factor affecting the accuracy. A tip characterizer has the advantages of in situ measurement, higher accuracy of probe inversion results, and relatively simple fabrication process. In this paper, we developed a rectangular tip characterizer based on multilayer film deposition technology with protruding critical dimension parts and grooves parts. And the tip characterization is highly consistent across the line widths and grooves, and still performs well even in the sub-5 nm line width tip characterizer. This indicates that tip characterizers produced by this method can synergistically meet the combined requirements of standard rectangular structure, very small line edge roughness, very small geometry dimension, and traceable measurements. Full article
(This article belongs to the Special Issue Recent Advances in Optical Thin Films)
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