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Keywords = GaN on Si

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18 pages, 3355 KB  
Article
Characterizations of Semiconductive W-Doped Ga2O3 Thin Films and Application in Heterojunction Diode Fabrication
by Chia-Te Liao, Yi-Wen Wang, Cheng-Fu Yang and Kao-Wei Min
Inorganics 2025, 13(10), 329; https://doi.org/10.3390/inorganics13100329 (registering DOI) - 1 Oct 2025
Abstract
In this study, high-conductivity W-doped Ga2O3 thin films were successfully fabricated by directly depositing a composition of Ga2O3 with 10.7 at% WO3 (W:Ga = 12:100) using electron beam evaporation. The resulting thin films were found to [...] Read more.
In this study, high-conductivity W-doped Ga2O3 thin films were successfully fabricated by directly depositing a composition of Ga2O3 with 10.7 at% WO3 (W:Ga = 12:100) using electron beam evaporation. The resulting thin films were found to be amorphous. Due to the ohmic contact behavior observed between the W-doped Ga2O3 film and platinum (Pt), Pt was used as the contact electrode. Current-voltage (J-V) measurements of the W-doped Ga2O3 thin films demonstrated that the samples exhibited significant current density even without any post-deposition annealing treatment. To further validate the excellent charge transport characteristics, Hall effect measurements were conducted. Compared to undoped Ga2O3 thin films, which showed non-conductive characteristics, the W-doped thin films showed an increased carrier concentration and enhanced electron mobility, along with a substantial decrease in resistivity. The measured Hall coefficient of the W-doped Ga2O3 thin films was negative, indicating that these thin films were n-type semiconductors. Energy-Dispersive X-ray Spectroscopy was employed to verify the elemental ratios of Ga, O, and W in the W-doped Ga2O3 thin films, while X-ray photoelectron spectroscopy analysis further confirmed these ratios and demonstrated their variation with the depth of the deposited thin films. Furthermore, the W-doped Ga2O3 thin films were deposited onto both p-type and heavily doped p+-type silicon (Si) substrates to fabricate heterojunction diodes. All resulting devices exhibited good rectifying behavior, highlighting the promising potential of W-doped Ga2O3 thin films for use in rectifying electronic components. Full article
(This article belongs to the Special Issue Advanced Inorganic Semiconductor Materials, 3rd Edition)
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38 pages, 14848 KB  
Article
Image Sand–Dust Removal Using Reinforced Multiscale Image Pair Training
by Dong-Min Son, Jun-Ru Huang and Sung-Hak Lee
Sensors 2025, 25(19), 5981; https://doi.org/10.3390/s25195981 - 26 Sep 2025
Abstract
This study proposes an image-enhancement method to address the challenges of low visibility and color distortion in images captured during yellow sandstorms for an image sensor based outdoor surveillance system. The technique combines traditional image processing with deep learning to improve image quality [...] Read more.
This study proposes an image-enhancement method to address the challenges of low visibility and color distortion in images captured during yellow sandstorms for an image sensor based outdoor surveillance system. The technique combines traditional image processing with deep learning to improve image quality while preserving color consistency during transformation. Conventional methods can partially improve color representation and reduce blurriness in sand–dust environments. However, they are limited in their ability to restore fine details and sharp object boundaries effectively. In contrast, the proposed method incorporates Retinex-based processing into the training phase, enabling enhanced clarity and sharpness in the restored images. The proposed framework comprises three main steps. First, a cycle-consistent generative adversarial network (CycleGAN) is trained with unpaired images to generate synthetically paired data. Second, CycleGAN is retrained using these generated images along with clear images obtained through multiscale image decomposition, allowing the model to transform dust-interfered images into clear ones. Finally, color preservation is achieved by selecting the A and B chrominance channels from the small-scale model to maintain the original color characteristics. The experimental results confirmed that the proposed method effectively restores image color and removes sand–dust-related interference, thereby providing enhanced visual quality under sandstorm conditions. Specifically, it outperformed algorithm-based dust removal methods such as Sand-Dust Image Enhancement (SDIE), Chromatic Variance Consistency Gamma and Correction-Based Dehazing (CVCGCBD), and Rank-One Prior (ROP+), as well as machine learning-based methods including Fusion strategy and Two-in-One Low-Visibility Enhancement Network (TOENet), achieving a Blind/Referenceless Image Spatial Quality Evaluator (BRISQUE) score of 17.238, which demonstrates improved perceptual quality, and an Local Phase Coherence-Sharpness Index (LPC-SI) value of 0.973, indicating enhanced sharpness. Both metrics showed superior performance compared to conventional methods. When applied to Closed-Circuit Television (CCTV) systems, the proposed method is expected to mitigate the adverse effects of color distortion and image blurring caused by sand–dust, thereby effectively improving visual clarity in practical surveillance applications. Full article
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22 pages, 3275 KB  
Review
Permanent Magnet Synchronous Motor Drive System for Agricultural Equipment: A Review
by Chao Zhang, Xiongwei Xia, Hong Zheng and Hongping Jia
Agriculture 2025, 15(19), 2007; https://doi.org/10.3390/agriculture15192007 - 25 Sep 2025
Abstract
The electrification of agricultural equipment is a critical pathway to address the dual challenges of increasing global food production and ensuring sustainable agricultural development. As the core power unit, the permanent magnet synchronous motor (PMSM) drive system faces severe challenges in achieving high [...] Read more.
The electrification of agricultural equipment is a critical pathway to address the dual challenges of increasing global food production and ensuring sustainable agricultural development. As the core power unit, the permanent magnet synchronous motor (PMSM) drive system faces severe challenges in achieving high performance, robustness, and reliable control in complex farmland environments characterized by sudden load changes, extreme operating conditions, and strong interference. This paper provides a comprehensive review of key technological advancements in PMSM drive systems for agricultural electrification. First, it analyzes solutions to enhance the reliability of power converters, including high-frequency silicon carbide (SiC)/gallium nitride (GaN) power device packaging, thermal management, and electromagnetic compatibility (EMC) design. Second, it systematically elaborates on high-performance motor control algorithms such as Direct Torque Control (DTC) and Model Predictive Control (MPC) for improving dynamic response; robust control strategies like Sliding Mode Control (SMC) and Active Disturbance Rejection Control (ADRC) for enhancing resilience; and the latest progress in fault-tolerant control architectures incorporating sensorless technology. Furthermore, the paper identifies core challenges in large-scale applications, including environmental adaptability, real-time multi-machine coordination, and high reliability requirements. Innovatively, this review proposes a closed-loop intelligent control paradigm encompassing environmental disturbance prediction, control parameter self-tuning, and actuator dynamic response. This paradigm provides theoretical support for enhancing the autonomous adaptability and operational quality of agricultural machinery in unstructured environments. Finally, future trends involving deep AI integration, collaborative hardware innovation, and agricultural ecosystem construction are outlined. Full article
(This article belongs to the Section Agricultural Technology)
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11 pages, 2075 KB  
Article
Highly Selective Isotropic Etching of Si to SiGe Using CF4/O2/N2 Plasma for Advanced GAA Nanosheet Transistor
by Jiayang Li, Xin Sun, Ziqiang Huang and David Wei Zhang
Nanomaterials 2025, 15(19), 1469; https://doi.org/10.3390/nano15191469 - 25 Sep 2025
Abstract
The paradigm shift from FinFET to gate-all-around nanosheet (GAA-NS) transistor architectures necessitates fundamental innovations in channel material engineering. This work addresses the critical challenge of pFET performance degradation in GAA-NS technologies through the development of an advanced selective etching process for strain-engineered SiGe [...] Read more.
The paradigm shift from FinFET to gate-all-around nanosheet (GAA-NS) transistor architectures necessitates fundamental innovations in channel material engineering. This work addresses the critical challenge of pFET performance degradation in GAA-NS technologies through the development of an advanced selective etching process for strain-engineered SiGe channel formation. We present a systematic investigation of Si selective etching using CF4/O2/N2 gas mixture in a remote plasma source reactor. It is demonstrated that the addition of N2 to CF4/O2 plasmas significantly improves the selectivity of Si to SiGe (up to 58), by promoting NO* radical-induced passivation layer disruption on Si surfaces. Furthermore, an increase in the F:O ratio has been shown to mitigate stress-induced lateral micro-trenching (“Si-tip”), achieving near-zero tip length at high CF4 flow (500 sccm) while retaining selectivity (>40). Transmission electron microscopy and energy-dispersive X-ray spectroscopy confirm the complete removal of the Si sacrificial layer with minimal SiGe channel loss, validating the process for high-performance SiGe GAA-NS FET integration. These findings provide critical insights into strain-engineered SiGe channel fabrication, enabling balanced NFET/PFET performance in next-generation semiconductor technologies. Full article
(This article belongs to the Section Nanoelectronics, Nanosensors and Devices)
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18 pages, 2289 KB  
Article
GaN/InN HEMT-Based UV Photodetector on SiC with Hexagonal Boron Nitride Passivation
by Mustafa Kilin and Firat Yasar
Photonics 2025, 12(10), 950; https://doi.org/10.3390/photonics12100950 - 24 Sep 2025
Viewed by 90
Abstract
This work presents a novel Gallium Nitride (GaN) high-electron-mobility transistor (HEMT)-based ultraviolet (UV) photodetector architecture that integrates advanced material and structural design strategies to enhance detection performance and stability under room-temperature operation. This study is conducted as a fully numerical simulation using the [...] Read more.
This work presents a novel Gallium Nitride (GaN) high-electron-mobility transistor (HEMT)-based ultraviolet (UV) photodetector architecture that integrates advanced material and structural design strategies to enhance detection performance and stability under room-temperature operation. This study is conducted as a fully numerical simulation using the Silvaco Atlas platform, providing detailed electrothermal and optoelectronic analysis of the proposed device. The device is constructed on a high-thermal-conductivity silicon carbide (SiC) substrate and incorporates an n-GaN buffer, an indium nitride (InN) channel layer for improved electron mobility and two-dimensional electron gas (2DEG) confinement, and a dual-passivation scheme combining silicon nitride (SiN) and hexagonal boron nitride (h-BN). A p-GaN layer is embedded between the passivation interfaces to deplete the 2DEG in dark conditions. In the device architecture, the metal contacts consist of a 2 nm Nickel (Ni) adhesion layer followed by Gold (Au), employed as source and drain electrodes, while a recessed gate embedded within the substrate ensures improved electric field control and effective noise suppression. Numerical simulations demonstrate that the integration of a hexagonal boron nitride (h-BN) interlayer within the dual passivation stack effectively suppresses the gate leakage current from the typical literature values of the order of 108 A to approximately 1010 A, highlighting its critical role in enhancing interfacial insulation. In addition, consistent with previous reports, the use of a SiC substrate offers significantly improved thermal management over sapphire, enabling more stable operation under UV illumination. The device demonstrates strong photoresponse under 360 nm ultraviolet (UV) illumination, a high photo-to-dark current ratio (PDCR) found at approximately 106, and tunable performance via structural optimization of p-GaN width between 0.40 μm and 1.60 μm, doping concentration from 5×1016 cm3 to 5×1018 cm3, and embedding depth between 0.060 μm and 0.068 μm. The results underscore the proposed structure’s notable effectiveness in passivation quality, suppression of gate leakage, and thermal management, collectively establishing it as a robust and reliable platform for next-generation UV photodetectors operating under harsh environmental conditions. Full article
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14 pages, 3363 KB  
Article
Selective Etching of Multi-Stacked Epitaxial Si1-xGex on Si Using CF4/N2 and CF4/O2 Plasma Chemistries for 3D Device Applications
by Jihye Kim, Joosung Kang, Dongmin Yoon, U-in Chung and Dae-Hong Ko
Materials 2025, 18(18), 4417; https://doi.org/10.3390/ma18184417 - 22 Sep 2025
Viewed by 167
Abstract
The SiGe/Si multilayer is a critical component for fabricating stacked Si channel structures for next-generation three-dimensional (3D) logic and 3D dynamic random-access memory (3D-DRAM) devices. Achieving these structures necessitates highly selective SiGe etching. Herein, CF4/O2 and CF4/N2 [...] Read more.
The SiGe/Si multilayer is a critical component for fabricating stacked Si channel structures for next-generation three-dimensional (3D) logic and 3D dynamic random-access memory (3D-DRAM) devices. Achieving these structures necessitates highly selective SiGe etching. Herein, CF4/O2 and CF4/N2 gas chemistries were employed to elucidate and enhance the selective etching mechanism. To clarify the contribution of radicals to the etching process, a nonconducting plate (roof) was placed just above the samples in the plasma chamber to block ion bombardment on the sample surface. The CF4/N2 gas chemistries demonstrated superior etch selectivity and profile performance compared with the CF4/O2 gas chemistries. When etching was performed using CF4/O2 chemistry, the SiGe etch rate decreased compared to that obtained with pure CF4. This reduction is attributed to surface oxidation induced by O2, which suppressed the etch rate. By minimizing the ion collisions on the samples with the roof, higher selectivity, and a better etch profile were obtained even in the CF4/N2 gas chemistries. Under high-N2-flow conditions, X-ray photoelectron spectroscopy revealed increased surface concentrations of GeFx species and confirmed the presence of Si–N bond, which inhibited Si etching by fluorine radicals. A higher concentration of GeFx species enhanced SiGe layer etching, whereas Si–N bonds inhibited etching on the Si layer. The passivation of the Si layer and the promotion of adhesion of etching species such as F on the SiGe layer are crucial for highly selective etching in addition to etching with pure radicals. This study provides valuable insights into the mechanisms governing selective SiGe etching, offering practical guidance for optimizing fabrication processes of next-generation Si channel and complementary field-effect transistor (CFET) devices. Full article
(This article belongs to the Section Materials Physics)
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9 pages, 2176 KB  
Article
High Power Density X-Band GaN-on-Si HEMTs with 10.2 W/mm Used by Low Parasitic Gold-Free Ohmic Contact
by Jiale Du, Hao Lu, Bin Hou, Ling Yang, Meng Zhang, Mei Wu, Kaiwen Chen, Tianqi Pan, Yifan Chen, Hailin Liu, Qingyuan Chang, Xiaohua Ma and Yue Hao
Micromachines 2025, 16(9), 1067; https://doi.org/10.3390/mi16091067 - 22 Sep 2025
Viewed by 186
Abstract
To enhance the RF power properties of CMOS-compatible gold-free GaN devices, this work introduces a kind of GaN-on-Si HEMT with a low parasitic regrown ohmic contact technology. Attributed to the highly doped n+ InGaN regrown layer and smooth morphology of gold-free ohmic [...] Read more.
To enhance the RF power properties of CMOS-compatible gold-free GaN devices, this work introduces a kind of GaN-on-Si HEMT with a low parasitic regrown ohmic contact technology. Attributed to the highly doped n+ InGaN regrown layer and smooth morphology of gold-free ohmic stacks, the lowest ohmic contact resistance (Rc) was presented as 0.072 Ω·mm. More importantly, low RF loss and low total dislocation density (TDD) of the Si-based GaN epitaxy were achieved by a designed two-step-graded (TSG) transition structure for the use of scaling-down devices in high-frequency applications. Finally, the fabricated GaN HEMTs on the Si substrate presented a maximum drain current (Idrain) of 1206 mA/mm, a peak transconductance (Gm) of 391 mS/mm, and a breakdown voltage (VBR) of 169 V. The outstanding material and DC performances strongly encourage a maximum output power density (Pout) of 10.2 W/mm at 8 GHz and drain voltage (Vdrain) of 50 V in active pulse mode, which, to our best knowledge, updates the highest power level for gold-free GaN devices on Si substrates. The power results reflect the reliable potential of low parasitic regrown ohmic contact technology for future large-scale CMOS-integrated circuits in RF applications. Full article
(This article belongs to the Section D:Materials and Processing)
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46 pages, 3434 KB  
Review
System-Level Compact Review of On-Board Charging Technologies for Electrified Vehicles: Architectures, Components, and Industrial Trends
by Pierpaolo Dini, Sergio Saponara, Sajib Chakraborty and Omar Hegazy
Batteries 2025, 11(9), 341; https://doi.org/10.3390/batteries11090341 - 17 Sep 2025
Viewed by 408
Abstract
The increasing penetration of electrified vehicles is accelerating the evolution of on-board and off-board charging systems, which must deliver higher efficiency, power density, safety, and bidirectionality under increasingly demanding constraints. This article presents a system-level review of state-of-the-art charging architectures, with a focus [...] Read more.
The increasing penetration of electrified vehicles is accelerating the evolution of on-board and off-board charging systems, which must deliver higher efficiency, power density, safety, and bidirectionality under increasingly demanding constraints. This article presents a system-level review of state-of-the-art charging architectures, with a focus on galvanically isolated power conversion stages, wide-bandgap-based switching devices, battery pack design, and real-world implementation trends. The analysis spans the full energy path—from grid interface to battery terminals—highlighting key aspects such as AC/DC front-end topologies (Boost, Totem-Pole, Vienna, T-Type), high-frequency isolated DC/DC converters (LLC, PSFB, DAB), transformer modeling and optimization, and the functional integration of the Battery Management System (BMS). Attention is also given to electrochemical cell characteristics, pack architecture, and their impact on OBC design constraints, including voltage range, ripple sensitivity, and control bandwidth. Commercial solutions are examined across Tier 1–3 suppliers, illustrating how technical enablers such as SiC/GaN semiconductors, planar magnetics, and high-resolution BMS coordination are shaping production-grade OBCs. A system perspective is maintained throughout, emphasizing co-design approaches across hardware, firmware, and vehicle-level integration. The review concludes with a discussion of emerging trends in multi-functional power stages, V2G-enabled interfaces, predictive control, and platform-level convergence, positioning the on-board charger as a key node in the energy and information architecture of future electric vehicles. Full article
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14 pages, 1618 KB  
Article
Microstructure, Mechanical, and Tribological Properties of Mo2N/Ag-SiNx Nanomultilayers with Varying Modulation Periods
by Jing Luan, Lei Wang, Songtao Dong, Fábio Ferreira, Filipe Fernandes, Changpan Mo, Albano Cavaleiro and Hongbo Ju
Coatings 2025, 15(9), 1080; https://doi.org/10.3390/coatings15091080 - 15 Sep 2025
Viewed by 307
Abstract
The multilayered Mo2N/Ag-SiNx self-lubricant films were designed and deposited using a DC (Direct Current) magnetron sputtering system under mixed gas atmosphere of N2 and Ar. The modulation ratio (thickness ratio of Mo2N to Ag-SiNx) was [...] Read more.
The multilayered Mo2N/Ag-SiNx self-lubricant films were designed and deposited using a DC (Direct Current) magnetron sputtering system under mixed gas atmosphere of N2 and Ar. The modulation ratio (thickness ratio of Mo2N to Ag-SiNx) was fixed at 2:1, while the modulation periods (thickness of Mo2N and its adjacent Ag-SiNx layer) were set at 20, 40, and 60 nm. The results indicated that all multilayer films, regardless of modulation period, exhibited a combination of face-centered cubic (fcc) and amorphous phases. Specifically, fcc-Mo2N was detected in the Mo2N layers, while fcc-Ag and amorphous SiNx co-existed in the Ag-SiNx layers. The multilayered architecture induced residual stress and interface strengthening, resulting in hardness values exceeding 21 GPa for all films. Compared to Mo2N and Ag-SiNx monolayer films, the multilayer structure significantly enhanced tribological properties at room temperature, particularly in terms of wear resistance. The Mo2N/Ag-SiNx multilayer films exhibit ~25% lower friction than Ag-SiNx, ~3% lower than Mo2N, and achieve remarkable wear rate reductions of ~71% and ~85% compared to Ag-SiNx and Mo2N, respectively, demonstrating superior tribological performance. The synergistic effects of both modulation layers and relative high hardness were key factors contributing to the enhanced tribological behavior. Full article
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20 pages, 2734 KB  
Article
Development and Characterization of High-Strength Coalbed Fracturing Proppant Based on Activated Carbon Skeleton
by Kai Wang, Chenye Guo, Qisen Gong, Gen Li, Xiaoyue Zhuo, Peng Zhuo and Chaoxian Chen
Energies 2025, 18(18), 4854; https://doi.org/10.3390/en18184854 - 12 Sep 2025
Viewed by 274
Abstract
To address the challenges of low permeability, high gas adsorption, and a fragile structure in coalbed methane reservoirs, this study developed a high-strength composite proppant with an activated carbon skeleton via nitric acid pretreatment, silica–alumina sol coating, and calcination. Orthogonal experiments optimized the [...] Read more.
To address the challenges of low permeability, high gas adsorption, and a fragile structure in coalbed methane reservoirs, this study developed a high-strength composite proppant with an activated carbon skeleton via nitric acid pretreatment, silica–alumina sol coating, and calcination. Orthogonal experiments optimized the preparation conditions: 30–40 mesh activated carbon, Si/Al molar ratio of 4:1, calcination at 650 °C for 2 h. The resulting proppant exhibited an excellent performance: a single-particle compressive strength of 55.5 N, porosity of 33.2%, crushing rate of only 2.3% under 50 MPa closure pressure, and permeability 48.5% higher than quartz sand. In simulated acidic coalbed environments (pH 3–5), its acid corrosion rate was <2.8%, and it enhanced methane desorption by 16.2% compared to pure coal. Additionally, the proppant showed a superior transport performance in fracturing fluids, with better distribution uniformity in fractures than ceramsite, and its hydrophobic surface (contact angle 115.32°) improved fracturing fluid flowback efficiency. This proppant integrates high strength, good conductivity, gas desorption promotion, and corrosion resistance, offering a novel material solution for efficient coalbed methane extraction. Full article
(This article belongs to the Special Issue Advances in Unconventional Reservoirs and Enhanced Oil Recovery)
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5 pages, 1412 KB  
Abstract
Thermal Diffusivity Imaging of CFRP: Spatial Correlation Between Lock-In Thermography-Based Measurement and Synchrotron X-Ray CT Simulation on Identical Region
by Ryohei Fujita, Song Boxi and Hosei Nagano
Proceedings 2025, 129(1), 57; https://doi.org/10.3390/proceedings2025129057 - 12 Sep 2025
Viewed by 192
Abstract
With the increasing adoption of wide-bandgap semiconductors such as SiC and GaN in high-power electronics, the thermal management of semiconductor devices has become critical [...] Full article
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14 pages, 828 KB  
Article
The Impact of Cast Walker Design on Metabolic Costs of Walking and Perceived Exertion
by Emily Standage, Dylan Tookey, Uchechukwu Ukachukwu, Marco Avalos, Ryan T. Crews and Noah J. Rosenblatt
Diabetology 2025, 6(9), 98; https://doi.org/10.3390/diabetology6090098 - 9 Sep 2025
Viewed by 330
Abstract
Background/Objectives: Cast walkers (CWs) are often prescribed to offload diabetic foot ulcers (DFUs). However, their mass, the degree of ankle immobilization and the limb length discrepancy they induce may increase the energetic demands of walking, contributing to lower adherence and poorer healing. The [...] Read more.
Background/Objectives: Cast walkers (CWs) are often prescribed to offload diabetic foot ulcers (DFUs). However, their mass, the degree of ankle immobilization and the limb length discrepancy they induce may increase the energetic demands of walking, contributing to lower adherence and poorer healing. The purpose of this study was to evaluate the effects of different commercially available CW options on the metabolic costs and perceived exertion of walking, and on related spatiotemporal kinematics, in healthy young participants as an initial step to understanding factors that impact adherence in patients with DFUs. Methods: Participants walked on an instrumented treadmill at a standardized speed for six minutes under five footwear conditions: (1) athletic shoes only (control); (2) ankle-high CW on the dominant limb with athletic shoe on the contralateral limb; (3) condition two with an external lift on the athletic shoe; (4 and 5) conditions two and three with a knee-high CW. Condition 1 was performed first, after which the CW conditions were randomized. During all conditions, a portable calorimeter recorded gas exchange on a breath-by-breath basis. The metabolic cost of transport (MCoT) was quantified as the mean oxygen consumed per meter walked per kilogram body mass, after accounting for standing. After walking, participants reported perceived exertion using the Borg Rating of Perceived Exertion scale (RPE). From the treadmill data, we extracted the mean step width (SW) as well as absolute values for symmetry indices (SIs) for step length (SL) and step time (ST), all of which have associations with MCoT. For each outcome, linear mixed models compared each CW condition with the control and tested for effects of CW height (ankle-high vs. knee-high) and of the lift. Results: A total of 14 healthy young adults without diabetes participated. MCoT, RPE and SW were significantly higher for all CW conditions compared to the control, with less consistent results for asymmetry measures. MCoT was not significantly different across CW height or lift condition although an unexpected interaction between limb and CW height n was observed; MCoT was lower in the knee-high CW with vs. without a lift but did not change in the ankle-high CW based on lift status. Similarly, neither SW nor SIs changed in expected fashions across conditions. In contrast, RPE was significantly lower using the ankle- vs. knee-high CW and when using a lift vs no lift, with no significant interaction. Conclusions: Although metabolic costs were unaffected by CW design changes, which may reflect the absence of anticipated changes in kinematics that impact MCoT, perceived exertion was reduced through such changes. Unanticipated biomechanical changes may reflect a complex interaction among a number of competing factors that dictate behavior and MCoT. The differing results in perception of exertion and metabolic costs might be due to participants’ perceived exertion being sensitive to the collective impact of interacting biomechanical factors, including those not quantified in this study. Future work should seek to directly evaluate the impact of CW design changes in patients with DFU and the relationship to adherence. Full article
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16 pages, 2644 KB  
Article
Prototypes of Highly Effective Stress Balancing AlN Interlayers in MOVPE GaN-on-Si (111)
by Cai Liu, Gaomin Li, Hassanet Sodabanlu, Masakazu Sugiyama and Yoshiaki Nakano
Inorganics 2025, 13(9), 302; https://doi.org/10.3390/inorganics13090302 - 7 Sep 2025
Viewed by 662
Abstract
The GaN-on-Si virtual substrate is now an indispensable platform for the application of GaN in the fields of power devices, radio frequency, light-emitting devices, etc. Such applications are still in need of more effective stress balancing techniques to achieve higher quality and stress [...] Read more.
The GaN-on-Si virtual substrate is now an indispensable platform for the application of GaN in the fields of power devices, radio frequency, light-emitting devices, etc. Such applications are still in need of more effective stress balancing techniques to achieve higher quality and stress balance in GaN-on-Si at a lower thickness. In this study, three promising practical prototypes of highly effective stress-balancing structures are proposed to realize the concept of an ideal AlN interlayer (AlN-IL) featuring a completely relaxed lower AlN/GaN interface and a fully strained upper GaN/AlN interface. The first is a single-layer AlN interlayer grown via precursor pulsed-injection (PI-AlN-IL). The second combines a low-temperature AlN (LT-AlN) underlayer with a PI-AlN-IL. The third integrates LT-AlN with a high-temperature AlN cap. Compared with optimal conventional single-layer AlN interlayer references, all these designs more effectively induced compressive stress and strain in overlying GaN layers. This study opens new technical paths to balancing stress in GaN-on-Si systems at a reduced thickness more efficiently. Full article
(This article belongs to the Special Issue Advances in Calcium-Ion Batteries)
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15 pages, 2923 KB  
Article
VCSEL Light Coupling to a Waveguide to Interconnect XPUs and HBMs on Interposer Chips
by Sahnggi Park, Kyungeun Kim, Hyun-Woo Rhee, Jae-Yong Kim, Namki Kim, Hyunjong Park and Hyo-Hoon Park
Photonics 2025, 12(9), 873; https://doi.org/10.3390/photonics12090873 - 29 Aug 2025
Viewed by 504
Abstract
Multimode VCSELs coupled into waveguides can be a practical path toward realizing commercially viable photonic interposer chips. The experimental coupling of multimode VCSEL light to a non-silicon waveguide fabricated using a CMOS-compatible process is demonstrated. The GaP prism was tested and adopted as [...] Read more.
Multimode VCSELs coupled into waveguides can be a practical path toward realizing commercially viable photonic interposer chips. The experimental coupling of multimode VCSEL light to a non-silicon waveguide fabricated using a CMOS-compatible process is demonstrated. The GaP prism was tested and adopted as a coupling method. Both conventional and cavity-type optical waveguides, fabricated from CMOS-compatible PECVD SiO2, Si3N4, and SiOxNy materials, were evaluated. The average propagation loss transmitted through the cavity-type waveguide was measured as 0.444 dB/cm. A polyimide micro-lens, cavity-type waveguide, and a GaP prism coupler are developed to inject the multimode VCSEL light into the waveguide measuring the net coupling loss of 0.762 dB. The packaged size of VCSEL has an area of 0.4 mm2 and a height of 0.64 mm. MUX/DeMUX was designed on the bottom of the prism. A light source, a modulator, and MUX/DeMUX are all located in the same area of the prism bottom in VCSEL-based interconnections. Full article
(This article belongs to the Special Issue Advanced Photonic Integration Technology and Devices)
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10 pages, 1879 KB  
Article
Design of a High-Power, High-Efficiency GaN Power Amplifier for W-Band Applications
by Shuai Liu, Xiaohua Ma, Yi Zhang and Chunliang Xu
Micromachines 2025, 16(9), 985; https://doi.org/10.3390/mi16090985 - 28 Aug 2025
Viewed by 671
Abstract
This paper presents a W-band high-efficiency and high-output-power power amplifier (PA) based on a 130 nm AlGaN/GaN-on-SiC HEMT process. The PA is designed to deliver optimal output power and gain performance across the entire W-band. A balanced architecture is adopted, combining two amplifier [...] Read more.
This paper presents a W-band high-efficiency and high-output-power power amplifier (PA) based on a 130 nm AlGaN/GaN-on-SiC HEMT process. The PA is designed to deliver optimal output power and gain performance across the entire W-band. A balanced architecture is adopted, combining two amplifier units through Lange couplers. High- and low-impedance microstrip lines are employed for input, output, and inter-stage matching. Each amplifier core adopts a three-stage configuration with gate width ratios of 1:2:4 to enhance gain. The bias network incorporates MIM capacitors and thin-film resistors to improve stability. Measured results indicate a small signal gain exceeding 17 dB under a gate voltage of −2.2 V and a drain voltage of +20 V. Within the 80–86 GHz frequency range, the PA achieves an output power above 34 dBm with a 22 dBm input power, corresponding to a power gain above 12 dB and a power-added efficiency (PAE) greater than 20%. The chip occupies a compact area of 2.65 mm × 3.75 mm. Compared with previously reported works, the proposed PA demonstrates the highest PAE within the 80–86 GHz band. Full article
(This article belongs to the Special Issue RF and Power Electronic Devices and Applications)
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