Search Results (328)

LiNbO₃ plays a significant role in modern integrated photonics because of its unique properties. One of the challenges in modern integrated photonics is reducing chip production cost. Today, the most widespread yet expensive method to fabricate thin films of LiNbO₃ is the smart cut method. The high production cost of smart-cut chips is caused by the use of expensive equipment for helium implantation. A prospective method to reduce the cost of photonic integrated circuits is to use sputtered thin films of lithium niobite, since sputtering technology does not require helium implantation equipment. The purpose of this review is to assess the feasibility of applying sputtered LiNbO₃ thin films in integrated photonics. This work compares sputtered LiNbO₃ thin films and those fabricated by widespread methods, including the smart cut method, liquid-phase epitaxy, chemical vapor deposition, pulsed laser deposition, and molecular-beam epitaxy. Full article

In two-dimensional (2D) materials research, exfoliating 2D transition metal dichalcogenides (TMDs) from their growth substrates for device fabrication remains a significant challenge. Current methods, such as those involving polymers, metals, or chemical etchants, suffer from limitations like contamination, defect introduction, and a lack of scalability. Here, we demonstrate a selenium capping-based exfoliation technique. Its advantage lies in its ability to enable the clean, contamination-free exfoliation and transfer of TMD films. We successfully exfoliated and transferred monolayer and multilayer TMD films, including WSe₂ and MoSe₂. The selenium capping layer not only enables seamless exfoliation but also protects the film from oxidation, as confirmed by X-ray photoelectron spectroscopy and Raman spectroscopy. This approach is versatile and applicable to a range of TMDs and thicknesses, paving the way for the high-quality, scalable integration of 2D materials into nanoelectronic devices. Full article

Exchange-biased specimens were produced by molecular beam epitaxy (MBE) of ferromagnetic (FM) Co-on-CoO substrates after the substrates had been irradiated by heavy ions to induce defects in the antiferromagnet (AFM). Measurements were obtained at different temperatures for different sample orientations with respect to the external magnetic field. While the EB was relatively small, measurements of the bulk magnetization at low temperatures revealed unusually shaped hysteresis loops. The surface magnetization, however, showed simple, nearly rectangular hysteresis loops. This study focuses on the advantage of complementary information on surface and bulk magnetization from optical and non-optical measurement methods. Full article

We studied specially designed InAs/GaSb/AlSb/GaSb M-structures, a type-II superlattice (T2SL), that can serve as active materials for short-wavelength infrared (SWIR) applications. To obtain the dispersion relation of the investigated M-structures, k·p perturbation theory based on the eight-band model implemented in the nextnano++ v1.18.1 (nextnano GmbH, Munich, Germany) software was used. Numerical band-gap engineering and dispersion calculations for the investigated M-structures (composed of 6/1/5/1 monolayers, with InSb interfaces included) revealed the presence of an additional energy level within the energy gap. This energy level originates from the InSb-like interfaces and does not appear in structures with different layer or interface thicknesses. Its properties strongly depend on interface thickness, temperature, and strain. Numerical calculations of the probability density function ${|\Psi |}^2$, absorption coefficients, and optical absorption spectra at varying temperatures demonstrate that, under specific conditions, such as an optimised interface thickness and temperature, optical absorption increases significantly. These theoretical results are based on structures fabricated using molecular-beam epitaxy (MBE) technology. High-resolution X-ray diffraction (HRXRD) measurements confirm the high crystallographic quality of these M-structures. Full article

Lithium niobate (LiNbO₃) has remarkable ferroelectric properties, and its unique crystal structure allows it to undergo significant spontaneous polarization. Lithium niobate plays an important role in the fields of electro-optic modulation, sensing and acoustics due to its excellent electro-optic and piezoelectric properties. Thin-film LiNbO₃ (TFLN) has attracted much attention due to its unique physical properties, stable properties and easy processing. This review introduces several main preparation methods for TFLN, including chemical vapor deposition (CVD), molecular beam epitaxy (MBE), pulsed laser deposition (PLD), magnetron sputtering and Smartcut technology. The development of TFLN devices, especially the recent research on sensors, memories, optical waveguides and EO modulators, is introduced. With the continuous advancement of manufacturing technology and integration technology, TFLN devices are expected to occupy a more important position in future photonic integrated circuits. Full article

The narrow bandgap InN material, with exceptional physical properties, has recently gained considerable attention, encouraging many scientists/engineers to design infrared photodetectors, light-emitting diodes, laser diodes, solar cells, and high-power electronic devices. The InN/Sapphire samples of different film thicknesses that we have used in our methodical experimental and theoretical studies are grown by plasma-assisted molecular-beam epitaxy. Hall effect measurements on these samples have revealed high-electron-charge carrier concentration, η. The preparation of InN epifilms is quite sensitive to the growth temperature T, plasma power, N/In ratio, and pressure, P. Due to the reduced distance between N atoms at a higher P, one expects the N-flow kinetics, diffusion, surface components, and scattering rates to change in the growth chamber which might impact the quality of InN films. We believe that the ionized N, rather than molecular, or neutral species are responsible for controlling the growth of InN/Sapphire epifilms. Temperature- and power-dependent photoluminescence measurements are performed, validating the bandgap variation (~0.60–0.80 eV) of all the samples. High-resolution X-ray diffraction studies have indicated that the increase in growth temperature caused the perceived narrow peaks in the X-ray-rocking curves, leading to better-quality films with well-ordered crystalline structures. Careful simulations of the infrared reflectivity spectra provided values of η and mobility μ, in good accordance with the Hall measurements. Our first-order Raman scattering spectroscopy study has not only identified the accurate phonon values of InN samples but also revealed the low-frequency longitudinal optical phonon plasmon-coupled mode in excellent agreement with theoretical calculations. Full article

{CdO/ZnO}_m superlattices (SLs) have been grown on c-plane sapphire substrates by plasma-assisted molecular beam epitaxy (PA-MBE). The observation of satellite peaks in the XRD studies of the as-grown and annealed samples confirms the presence of a periodic superlattice structure. The properties of as-grown and annealed SLs deposited on c-oriented sapphire were investigated by transmission electron microscopy, X-ray diffraction and temperature dependent PL studies. The deformation of the SLs structure was observed after rapid thermal annealing. As the thermal annealing temperature increases, the diffusion of Cd ions from the quantum well layers into the ZnO barrier increases. The formation of CdZnO layers causes changes in the luminescence spectrum in the form of peak shifts, broadening and changes in the spacing of the satellite peaks visible in X-ray analysis. Full article

Indium Arsenide is a III–V semiconductor with low electron effective mass, a small band gap, strong spin–orbit coupling, and a large g-factor. These properties and its surface Fermi level pinned in the conduction band make InAs a good candidate for developing superconducting solid-state quantum devices. Here, we report the epitaxial growth of very thin InAs layers with thicknesses ranging from 12.5 nm to 500 nm grown by Molecular Beam Epitaxy on In_xAl_1−xAs metamorphic buffers. Differently than InAs substrates, these buffers have the advantage of being insulating at cryogenic temperatures, which allows for multiple device operations on the same wafer and thus making the approach scalable. The structural properties of the InAs layers were investigated by high-resolution X-ray diffraction, demonstrating the high crystal quality of the InAs layers. Furthermore, their transport properties, such as total and sheet carrier concentration, sheet resistance, and carrier mobility, were measured in the van der Pauw configuration at room temperature. A simple conduction model was employed to quantify the surface, bulk, and interface contributions to the overall carrier concentration and mobility. Full article

Quantum dot (QD)-based single-photon emitter devices today are based on self-assembled random position nucleated QDs emitting at random wavelengths. Deterministic QD growth in position and emitter wavelength would be highly appreciated for industry-scale high-yield device manufacturing from wafers. Local droplet etching during molecular beam epitaxy is an all in situ method that allows excellent density control and predetermines the nucleation site of quantum dots. This method can produce strain-free GaAs QDs with excellent photonic and spin properties. Here, we focus on the emitter wavelength homogeneity. By wafer rotation-synchronized shutter opening time and adapted growth parameters, we grow QDs with a narrow peak emission wavelength homogeneity with no more than 1.2 nm shifts on a 45 mm diameter area and a narrow inhomogeneous ensemble broadening of only 2 nm at 4 K. The emission wavelength of these strain-free GaAs QDs is <800 nm, attractive for quantum optics experiments and quantum memory applications. We can use a similar random local droplet nucleation, nanohole drilling, and now, InAs infilling to produce QDs emitting in the telecommunication optical fiber transparency window around 1.3 µm, the so-called O-band. For this approach, we demonstrate good wavelength homogeneity and excellent density homogeneity beyond the possibilities of standard Stranski–Krastanov self-assembly. We discuss our methodology, structural and optical properties, and limitations set by our current setup capabilities. Full article

Antimonide laser diodes, with their high performance above room temperature, exhibit significant potential for widespread applications in the mid-infrared spectral region. However, the laser’s performance significantly degrades as the emission wavelength increases, primarily due to severe quantum-well hole leakage and significant non-radiative recombination. In this paper, we put up an active region with a high valence band offset and excellent crystalline quality with high luminescence to improve the laser’s performance. The miscibility gap of the InGaAsSb alloy was systematically investigated by calculating the critical temperatures based on the delta lattice parameter model. As the calculation results show, In_0.54Ga_0.46As_0.23Sb_0.77, with a compressive strain of 1.74%, used as the quantum well, is out of the miscibility gap with no spinodal decomposition. The quantum wells exhibit high crystalline quality, as evidenced by distinct satellite peaks in XRD curves with a full width at half maximum (FWHM) of 56 arcseconds for the zeroth-order peak, a smooth surface with a root mean square (RMS) roughness of 0.19 nm, room-temperature photoluminescence with high luminous efficiency and narrow FHWM of 35 meV, and well-defined interfaces. These attributes effectively suppress non-radiative recombination, thereby enhancing internal quantum efficiency in the antimonide laser. Furthermore, a novel epitaxial laser structure was designed to acquire low optical absorption loss by decreasing the optical confinement factor in the cladding layer and implementing gradient doping in the p-type cladding layer. The continuous-wave output power of 310 mW was obtained at an injection current of 4.6 A and a heatsink temperature of 15 °C from a 1500 × 100 μm² single emitter. The external quantum efficiency of 53% was calculated with a slope efficiency of 0.226 W/A considering both of the uncoated facets. More importantly, the lasing wavelength of our laser exhibited a significant blue shift from 3.4 μm to 2.9 μm, which agrees with our calculated results when modeling the interdiffusion process in a quantum well. Therefore, the interdiffusion process must be considered for proper design and epitaxy to achieve mid-infrared high-power and high-efficiency antimonide laser diodes. Full article

Hybrid systems consisting of highly transparent channels of low-dimensional semiconductors between superconducting elements allow the formation of quantum electronic circuits. Therefore, they are among the novel material platforms that could pave the way for scalable quantum computation. To this aim, InAs two-dimensional electron gases are among the ideal semiconductor systems due to their vanishing Schottky barrier; however, their exploitation is limited by the unavailability of commercial lattice-matched substrates. We show that in situ growth of superconducting aluminum on two-dimensional electron gases forming in metamorphic near-surface InAs quantum wells can be performed by molecular beam epitaxy on GaAs substrates with state-of-the-art quality. Adaptation of the metamorphic growth protocol has allowed us to reach low-temperature electron mobilities up to 1.3 × 10⁵ cm²/Vs in Si-doped InAs/In_0.81Ga_0.19As two-dimensional electron gases placed 10 nm from the surface with charge density up to 1 × 10¹²/cm². Shubnikov-de Haas oscillations on Hall bar structures show well-developed quantum Hall plateaus, including the Zeeman split features. X-ray diffraction and cross-sectional transmission electron microscopy experiments demonstrate the coexistence of (011) and (111) crystal domains in the Al layers. The resistivity of 10-nm-thick Al films as a function of temperature was comparable to the best Al layers on GaAs, and a superconducting proximity effect was observed in a Josephson junction. Full article

InAs/GaAs quantum dots (QDs) appear promising for optoelectronic applications. However, the inhomogeneous broadening caused by natural strain and the non-uniform size distribution deteriorates the device performance based on multi-stacked QD layers. In this study, In-flush was incorporated during the epitaxy, and the photoluminescence (PL) linewidth was significantly narrowed to 26.1 meV for the flushed sample and maintained to 27.3 meV for the unflushed sample. The flushed sample shows better device performance in threshold current (0.229 to 0.334 A at 15 °C), power (1.142 to 1.113 W at 15 °C), and characteristic temperature (51 to 39 K in the range of 55~80 °C) compared with the unflushed sample. Full article

In this paper, we review our work on the manipulation of magnetization in ferromagnetic semiconductors (FMSs) using electric-current-induced spin-orbit torque (SOT). Our review focuses on FMS layers from the (Ga,Mn)As zinc-blende family grown by molecular beam epitaxy. We describe the processes used to obtain spin polarization of the current that is required to achieve SOT, and we briefly discuss methods of specimen preparation and of measuring the state of magnetization. Using specific examples, we then discuss experiments for switching the magnetization in FMS layers with either out-of-plane or in-plane easy axes. We compare the efficiency of SOT manipulation in single-layer FMS structures to that observed in heavy-metal/ferromagnet bilayers that are commonly used in magnetization switching by SOT. We then provide examples of prototype devices made possible by manipulation of magnetization by SOT in FMSs, such as read-write devices. Finally, based on our experimental results, we discuss future directions which need to be explored to achieve practical magnetic memories and related applications based on SOT switching. Full article

Bow-tie diodes on the base of modulation-doped semiconductor structures are often used to detect radiation in GHz to THz frequency range. The operation of the bow-tie microwave diodes is based on carrier heating phenomena in an epitaxial semiconductor structure with broken geometrical symmetry. However, the electrical properties of bow-tie diodes are highly dependent on the purity of the grown epitaxial layer—specifically, the minimal number of defects—and the quality of the ohmic contacts. The quality of MBE-grown semiconductor structure depends on the presence of a buffer layer between a semiconductor substrate and an epitaxial layer. In this paper, we present an investigation of the electrical and optical properties of planar bow-tie microwave diodes fabricated using modulation-doped semiconductor structures grown via the MBE technique, incorporating either a GaAs buffer layer or a GaAs–AlGaAs super-lattice buffer between the semi-insulating substrate and the active epitaxial layer. These properties include voltage sensitivity, electrical resistance, I–V characteristic asymmetry, nonlinearity coefficient, and photoluminescence. The investigation revealed that the buffer layer, as well as the illumination with visible light, strongly influences the properties of the bow-tie diodes. Full article

Narrow-gap InN is a desirable candidate for near-infrared (NIR) optical communication applications. However, the absence of lattice-matched substrates impedes the fabrication of high-quality InN. In this paper, we employed Molecular Beam Epitaxy (MBE) to grow nanostructured InN with distinct growth mechanisms. Morphological and quality analysis showed that the liquid phase epitaxial (LPE) growth of hexagonal InN nanopillar could be realized by depositing molten In layer on large lattice-mismatched sapphire substrate; nevertheless, InN nanonetworks were formed on nitrided sapphire and GaN substrates through the vapor-solid process under the same conditions. The supersaturated precipitation of InN grains from the molten In layer effectively reduced the defects caused by lattice mismatch and suppressed the introduction of non-stoichiometric metal In in the epitaxial InN. Photoluminescence and electrical characterizations demonstrated that high-carrier concentration InN prepared by vapor-solid mechanism showed much stronger band-filling effect at room temperature, which significantly shifted its PL peak to higher energy. LPE InN displayed the strongest PL intensity and the smallest wavelength shift with increasing temperature from 10 K to 300 K. These results showed enhanced optical properties of InN nanostructures prepared on large lattice mismatch substrates, which will play a crucial role in near-infrared optoelectronic devices. Full article