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Keywords = nanoscale field effect transistor (FET)

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34 pages, 11276 KB  
Review
State-of-the-Art Applications of Field-Effect Transistor Biosensors in Exosome Detection: A Comprehensive Review
by Xinyi Sheng, Guo-Jun Zhang and Jie Zhou
Biosensors 2026, 16(5), 294; https://doi.org/10.3390/bios16050294 - 18 May 2026
Viewed by 418
Abstract
Exosomes are a kind of nanoscale extracellular vesicle secreted by almost all cell types and considered promising biomarkers for disease diagnosis since they could carry abundant proteins, nucleic acids, and lipids that reflect parental cell states. However, conventional exosome detection methods suffer from [...] Read more.
Exosomes are a kind of nanoscale extracellular vesicle secreted by almost all cell types and considered promising biomarkers for disease diagnosis since they could carry abundant proteins, nucleic acids, and lipids that reflect parental cell states. However, conventional exosome detection methods suffer from several limitations including insufficient specificity, low throughput, high costs, and inadequate sensitivity for clinical applications. By contrast, field-effect transistor (FET) biosensors are a promising alternative by enabling label-free, real-time, and ultrasensitive detection of exosomes through direct transduction of biorecognition events into electrical signals. This review first introduces the fundamental principles and device structure of FET biosensors, as well as exosome isolation strategies. The recent advances in exosome analysis using FET-based biosensors are then presented, which are categorized into two primary strategies: (1) direct detection of intact exosomes based on surface markers, including tetraspanin proteins (CD9, CD63, CD81, etc.) and disease-specific biomarkers, and (2) detection of exosomal contents including microRNA and protein biomarkers following exosome lysis. Finally, we discuss current challenges of FET-based exosome detection and provide perspectives on future developments. Full article
(This article belongs to the Section Biosensors and Healthcare)
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11 pages, 1804 KB  
Article
Machine-Learning-Assisted Buried-Window FET Sensors for High-Reliability and High-Sensitivity Applications
by Mahsa Mehrad and Meysam Zareiee
Sensors 2026, 26(4), 1171; https://doi.org/10.3390/s26041171 - 11 Feb 2026
Viewed by 486
Abstract
This paper presents a novel Double Buried-Window Junctionless Field-Effect Transistor (DBW-FET) designed for high-sensitivity, label-free biosensing applications. The proposed device integrates two buried windows, one N-type and one P-type, beneath the active channel within the buried oxide layer, along with two nanocavities serving [...] Read more.
This paper presents a novel Double Buried-Window Junctionless Field-Effect Transistor (DBW-FET) designed for high-sensitivity, label-free biosensing applications. The proposed device integrates two buried windows, one N-type and one P-type, beneath the active channel within the buried oxide layer, along with two nanocavities serving as biomolecular recognition sites. The dual buried windows form two depletion regions that enhance electrostatic coupling, suppress short-channel effects, and improve biomolecular sensitivity. Numerical simulations using Silvaco TCAD Atlas were performed to investigate device performance under various biomolecular binding conditions. Results show that the DBW-FET exhibits higher drain current, lower subthreshold swing, and improved sensitivity compared with a conventional junctionless FET (C-FET). Furthermore, a machine-learning-assisted optimization framework employing Gaussian Process Regression (GPR) and Bayesian Optimization (BO) was implemented to identify optimal buried window parameters. The optimized design achieved a 20–25% improvement in current sensitivity while maintaining low leakage. These findings demonstrate that the proposed DBW-FET offers a promising and Complementary Metal-Oxide-Semiconductor (CMOS)-compatible architecture for next-generation nanoscale biosensors. Full article
(This article belongs to the Section Biosensors)
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17 pages, 3883 KB  
Article
Interaction of Organic Semiconductors and Graphene Materials in the Source-Drain Channel of Field-Effect Transistors
by Eugen Chiriac, Bianca Adiaconita, Tiberiu Burinaru, Catalin Marculescu, Marius Stoian, Catalin Parvulescu and Marioara Avram
Biosensors 2025, 15(9), 622; https://doi.org/10.3390/bios15090622 - 19 Sep 2025
Cited by 1 | Viewed by 1384
Abstract
This study investigates the interfacial interactions between two organic semiconductors (tetrathiafulvalene (TTF) and hexaazatriphenylene-hexacarbonitrile (HAT-CN)) and graphene-based materials (nanocrystalline graphite and vertically aligned graphene) used in Field-Effect Transistors (FETs). The interaction mechanisms, including π–π stacking, charge transfer, and dipole–dipole interactions, were explored through [...] Read more.
This study investigates the interfacial interactions between two organic semiconductors (tetrathiafulvalene (TTF) and hexaazatriphenylene-hexacarbonitrile (HAT-CN)) and graphene-based materials (nanocrystalline graphite and vertically aligned graphene) used in Field-Effect Transistors (FETs). The interaction mechanisms, including π–π stacking, charge transfer, and dipole–dipole interactions, were explored through SEM imaging, Raman and FTIR spectroscopy, and FET transfer characteristics. Spectroscopic data confirmed strong π–π and charge-transfer interactions, with distinct modifications in graphene structural and electronic features. Electrical measurements revealed significant modulation of channel conductivity, confirming effective surface functionalization. These findings provide a framework for engineering high-performance organic/graphene hybrid interfaces in electronic devices and biosensors. Importantly, the results demonstrate that molecular design and interfacial control at the nanoscale can be strategically used to modulate charge transport in graphene-based FETs. This approach opens new pathways for developing tunable, molecule-specific biosensors and nanoelectronic platforms with enhanced sensitivity and selectivity. Full article
(This article belongs to the Special Issue Transistor-Based Biosensors and Their Applications)
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11 pages, 2119 KB  
Article
Performance Assessment of Ultrascaled Vacuum Gate Dielectric MoS2 Field-Effect Transistors: Avoiding Oxide Instabilities in Radiation Environments
by Khalil Tamersit, Abdellah Kouzou, José Rodriguez and Mohamed Abdelrahem
Micromachines 2025, 16(1), 33; https://doi.org/10.3390/mi16010033 - 28 Dec 2024
Cited by 5 | Viewed by 1633
Abstract
Gate dielectrics are essential components in nanoscale field-effect transistors (FETs), but they often face significant instabilities when exposed to harsh environments, such as radioactive conditions, leading to unreliable device performance. In this paper, we evaluate the performance of ultrascaled transition metal dichalcogenide (TMD) [...] Read more.
Gate dielectrics are essential components in nanoscale field-effect transistors (FETs), but they often face significant instabilities when exposed to harsh environments, such as radioactive conditions, leading to unreliable device performance. In this paper, we evaluate the performance of ultrascaled transition metal dichalcogenide (TMD) FETs equipped with vacuum gate dielectric (VGD) as a means to circumvent oxide-related instabilities. The nanodevice is computationally assessed using a quantum simulation approach based on the self-consistent solutions of the Poisson equation and the quantum transport equation under the ballistic transport regime. The performance evaluation includes analysis of the transfer characteristics, subthreshold swing, on-state and off-state currents, current ratio, and scaling limits. Simulation results demonstrate that the investigated VGD TMD FET, featuring a gate-all-around (GAA) configuration, a TMD-based channel, and a thin vacuum gate dielectric, collectively compensates for the low dielectric constant of the VGD, enabling exceptional electrostatic control. This combination ensures superior switching performance in the ultrascaled regime, achieving a high current ratio and steep subthreshold characteristics. These findings position the GAA-VGD TMD FET as a promising candidate for advanced radiation-hardened nanoelectronics. Full article
(This article belongs to the Special Issue Two-Dimensional Materials for Electronic and Optoelectronic Devices)
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16 pages, 3331 KB  
Article
Piezo-VFETs: Vacuum Field Emission Transistors Controlled by Piezoelectric MEMS Sensors as an Artificial Mechanoreceptor with High Sensitivity and Low Power Consumption
by Chang Ge, Yuezhong Chen, Daolong Yu, Zhixia Liu and Ji Xu
Sensors 2024, 24(20), 6764; https://doi.org/10.3390/s24206764 - 21 Oct 2024
Cited by 3 | Viewed by 4721
Abstract
As one of the most promising electronic devices in the post-Moore era, nanoscale vacuum field emission transistors (VFETs) have garnered significant attention due to their unique electron transport mechanism featuring ballistic transport within vacuum channels. Existing research on these nanoscale vacuum channel devices [...] Read more.
As one of the most promising electronic devices in the post-Moore era, nanoscale vacuum field emission transistors (VFETs) have garnered significant attention due to their unique electron transport mechanism featuring ballistic transport within vacuum channels. Existing research on these nanoscale vacuum channel devices has primarily focused on structural design for logic circuits. Studies exploring their application potential in other vital fields, such as sensors based on VFET, are more limited. In this study, for the first time, the design of a vacuum field emission transistor (VFET) coupled with a piezoelectric microelectromechanical (MEMS) sensing unit is proposed as the artificial mechanoreceptor for sensing purposes. With a negative threshold voltage similar to an N-channel depletion-mode metal oxide silicon field effect transistor, the proposed VFET has its continuous current tuned by the piezoelectric potential generated by the sensing unit, amplifying the magnitude of signals resulting from electromechanical coupling. Simulations have been conducted to validate the feasibility of such a configuration. As indictable from the simulation results, the proposed piezoelectric VFET exhibits high sensitivity and an electrically adjustable measurement range. Compared to the traditional combination of piezoelectric MEMS sensors and solid-state field effect transistors (FETs), the piezoelectric VFET design has a significantly reduced power consumption thanks to its continuous current that is orders of magnitude smaller. These findings reveal the immense potential of piezoelectric VFET in sensing applications, building up the basis for using VFETs for simple, effective, and low-power pre-amplification of piezoelectric MEMS sensors and broadening the application scope of VFET in general. Full article
(This article belongs to the Special Issue Advanced Sensors in MEMS: 2nd Edition)
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16 pages, 3407 KB  
Article
Performance Projection of Vacuum Gate Dielectric Doping-Free Carbon Nanoribbon/Nanotube Field-Effect Transistors for Radiation-Immune Nanoelectronics
by Khalil Tamersit, Abdellah Kouzou, José Rodriguez and Mohamed Abdelrahem
Nanomaterials 2024, 14(11), 962; https://doi.org/10.3390/nano14110962 - 1 Jun 2024
Cited by 6 | Viewed by 2468
Abstract
This paper investigates the performance of vacuum gate dielectric doping-free carbon nanotube/nanoribbon field-effect transistors (VGD-DL CNT/GNRFETs) via computational analysis employing a quantum simulation approach. The methodology integrates the self-consistent solution of the Poisson solver with the mode space non-equilibrium Green’s function (NEGF) in [...] Read more.
This paper investigates the performance of vacuum gate dielectric doping-free carbon nanotube/nanoribbon field-effect transistors (VGD-DL CNT/GNRFETs) via computational analysis employing a quantum simulation approach. The methodology integrates the self-consistent solution of the Poisson solver with the mode space non-equilibrium Green’s function (NEGF) in the ballistic limit. Adopting the vacuum gate dielectric (VGD) paradigm ensures radiation-hardened functionality while avoiding radiation-induced trapped charge mechanisms, while the doping-free paradigm facilitates fabrication flexibility by avoiding the realization of a sharp doping gradient in the nanoscale regime. Electrostatic doping of the nanodevices is achieved via source and drain doping gates. The simulations encompass MOSFET and tunnel FET (TFET) modes. The numerical investigation comprehensively examines potential distribution, transfer characteristics, subthreshold swing, leakage current, on-state current, current ratio, and scaling capability. Results demonstrate the robustness of vacuum nanodevices for high-performance, radiation-hardened switching applications. Furthermore, a proposal for extrinsic enhancement via doping gate voltage adjustment to optimize band diagrams and improve switching performance at ultra-scaled regimes is successfully presented. These findings underscore the potential of vacuum gate dielectric carbon-based nanotransistors for ultrascaled, high-performance, energy-efficient, and radiation-immune nanoelectronics. Full article
(This article belongs to the Section Nanoelectronics, Nanosensors and Devices)
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11 pages, 5690 KB  
Article
Ballistic Performance of Quasi-One-Dimensional Hafnium Disulfide Field-Effect Transistors
by Mislav Matić and Mirko Poljak
Electronics 2024, 13(6), 1048; https://doi.org/10.3390/electronics13061048 - 11 Mar 2024
Cited by 9 | Viewed by 2181
Abstract
Hafnium disulfide (HfS2) monolayer is one of the most promising two-dimensional (2D) materials for future nanoscale electronic devices, and patterning it into quasi-one-dimensional HfS2 nanoribbons (HfS2NRs) enables multi-channel architectures for field-effect transistors (FETs). Electronic, transport and ballistic device characteristics [...] Read more.
Hafnium disulfide (HfS2) monolayer is one of the most promising two-dimensional (2D) materials for future nanoscale electronic devices, and patterning it into quasi-one-dimensional HfS2 nanoribbons (HfS2NRs) enables multi-channel architectures for field-effect transistors (FETs). Electronic, transport and ballistic device characteristics are studied for sub-7 nm-wide and ~15 nm-long zigzag HfS2NR FETs using non-equilibrium Green’s functions (NEGF) formalism with density functional theory (DFT) and maximally localized Wannier functions (MLWFs). We provide an in-depth analysis of quantum confinement effects on ON-state performance. We show that bandgap and hole transport mass are immune to downscaling effects, while the ON-state performance is boosted by up to 53% but only in n-type devices. Finally, we demonstrate that HfS2NR FETs can fulfill the industry requirements for future technology nodes, which makes them a promising solution for FET architectures based on multiple nanosheets or nanowires. Full article
(This article belongs to the Special Issue Feature Papers in Semiconductor Devices)
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14 pages, 9817 KB  
Article
Implementation of Gate-All-Around Gate-Engineered Charge Plasma Nanowire FET-Based Common Source Amplifier
by Sarabdeep Singh, Leo Raj Solay, Sunny Anand, Naveen Kumar, Ravi Ranjan and Amandeep Singh
Micromachines 2023, 14(7), 1357; https://doi.org/10.3390/mi14071357 - 30 Jun 2023
Cited by 13 | Viewed by 4002
Abstract
This paper examines the performance of a Gate-Engineered Gate-All-Around Charge Plasma Nanowire Field Effect Transistor (GAA-DMG-GS-CP NW-FET) and the implementation of a common source (CS) amplifier circuit. The proposed GAA-DMG-GS-CP NW-FET incorporates dual-material gate (DMG) and gate stack (GS) as gate engineering techniques [...] Read more.
This paper examines the performance of a Gate-Engineered Gate-All-Around Charge Plasma Nanowire Field Effect Transistor (GAA-DMG-GS-CP NW-FET) and the implementation of a common source (CS) amplifier circuit. The proposed GAA-DMG-GS-CP NW-FET incorporates dual-material gate (DMG) and gate stack (GS) as gate engineering techniques and its analog/RF performance parameters are compared to those of the Gate-All-Around Single-Material Gate Charge Plasma Nanowire Field Effect Transistor (GAA-SMG-CP NW-FET) device. Both Gate-All-Around (GAA) devices are designed using the Silvaco TCAD tool. GAA structures have demonstrated good gate control because the gate holds the channel, which is an inherent advantage for both devices discussed herein. The charge plasma dopingless technique is used, in which the source and drain regions are formed using metal contacts and necessary work functions rather than doping. This dopingless technique eliminates the need for doping, reducing fluctuations caused by random dopants and lowering the device’s thermal budget. Gate engineering techniques such as DMG and GS significantly improved the current characteristics which played a crucial role in obtaining maximum gain for circuit designs. The lookup table (LUT) approach is used in the implementation of the CS amplifier circuit with the proposed device. The transient response of the circuit is analyzed with both the device structures where the gain achieved for the CS amplifier circuit using the proposed GAA-DMG-GS-CP NW-FET is 15.06 dB. The superior performance showcased by the proposed GAA-DMG-GS-CP NW-FET device with analog, RF and circuit analysis proves its strong candidature for future nanoscale and low-power applications. Full article
(This article belongs to the Special Issue Recent Advances in Thin Film Electronic Devices and Circuits)
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16 pages, 4852 KB  
Article
Single-Charge Tunneling in Codoped Silicon Nanodevices
by Daniel Moraru, Tsutomu Kaneko, Yuta Tamura, Taruna Teja Jupalli, Rohitkumar Shailendra Singh, Chitra Pandy, Luminita Popa and Felicia Iacomi
Nanomaterials 2023, 13(13), 1911; https://doi.org/10.3390/nano13131911 - 22 Jun 2023
Cited by 9 | Viewed by 2812
Abstract
Silicon (Si) nano-electronics is advancing towards the end of the Moore’s Law, as gate lengths of just a few nanometers have been already reported in state-of-the-art transistors. In the nanostructures that act as channels in transistors or depletion layers in pn diodes, the [...] Read more.
Silicon (Si) nano-electronics is advancing towards the end of the Moore’s Law, as gate lengths of just a few nanometers have been already reported in state-of-the-art transistors. In the nanostructures that act as channels in transistors or depletion layers in pn diodes, the role of dopants becomes critical, since the transport properties depend on a small number of dopants and/or on their random distribution. Here, we present the possibility of single-charge tunneling in codoped Si nanodevices formed in silicon-on-insulator films, in which both phosphorus (P) donors and boron (B) acceptors are introduced intentionally. For highly doped pn diodes, we report band-to-band tunneling (BTBT) via energy states in the depletion layer. These energy states can be ascribed to quantum dots (QDs) formed by the random distribution of donors and acceptors in such a depletion layer. For nanoscale silicon-on-insulator field-effect transistors (SOI-FETs) doped heavily with P-donors and also counter-doped with B-acceptors, we report current peaks and Coulomb diamonds. These features are ascribed to single-electron tunneling (SET) via QDs in the codoped nanoscale channels. These reports provide new insights for utilizing codoped silicon nanostructures for fundamental applications, in which the interplay between donors and acceptors can enhance the functionalities of the devices. Full article
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15 pages, 6776 KB  
Communication
Graphene Nanoribbon Field Effect Transistor Simulations for the Detection of Sugar Molecules: Semi-Empirical Modeling
by Asma Wasfi, Ahmed Al Hamarna, Omar Mohammed Hasani Al Shehhi, Hazza Fahad Muhsen Al Ameri and Falah Awwad
Sensors 2023, 23(6), 3010; https://doi.org/10.3390/s23063010 - 10 Mar 2023
Cited by 10 | Viewed by 4063
Abstract
Graphene has remarkable characteristics that make it a potential candidate for optoelectronics and electronics applications. Graphene is a sensitive material that reacts to any physical variation in its environment. Due to its extremely low intrinsic electrical noise, graphene can detect even a single [...] Read more.
Graphene has remarkable characteristics that make it a potential candidate for optoelectronics and electronics applications. Graphene is a sensitive material that reacts to any physical variation in its environment. Due to its extremely low intrinsic electrical noise, graphene can detect even a single molecule in its proximity. This feature makes graphene a potential candidate for identifying a wide range of organic and inorganic compounds. Graphene and its derivatives are considered one of the best materials to detect sugar molecules due to their electronic properties. Graphene has low intrinsic noise, making it an ideal membrane for detecting low concentrations of sugar molecules. In this work, a graphene nanoribbon field effect transistor (GNR-FET) is designed and utilized to identify sugar molecules such as fructose, xylose, and glucose. The variation in the current of the GNR-FET in the presence of each of the sugar molecules is utilized as the detection signal. The designed GNR-FET shows a clear change in the device density of states, transmission spectrum, and current in the presence of each of the sugar molecules. The simulated sensor is made of a pair of metallic zigzag graphene nanoribbons (ZGNR) joint via a channel of armchair graphene nanoribbon (AGNR) and a gate. The Quantumwise Atomistix Toolkit (ATK) is used to design and conduct the nanoscale simulations of the GNR-FET. Semi-empirical modeling, along with non-equilibrium Green’s functional theory (SE + NEGF), is used to develop and study the designed sensor. This article suggests that the designed GNR transistor has the potential to identify each of the sugar molecules in real time with high accuracy. Full article
(This article belongs to the Section Chemical Sensors)
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38 pages, 8219 KB  
Review
A Mini Review on the Development of Conjugated Polymers: Steps towards the Commercialization of Organic Solar Cells
by Ahmed G. S. Al-Azzawi, Shujahadeen B. Aziz, Elham M. A. Dannoun, Ahmed Iraqi, Muaffaq M. Nofal, Ary R. Murad and Ahang M. Hussein
Polymers 2023, 15(1), 164; https://doi.org/10.3390/polym15010164 - 29 Dec 2022
Cited by 74 | Viewed by 10802
Abstract
This review article covers the synthesis and design of conjugated polymers for carefully adjusting energy levels and energy band gap (EBG) to achieve the desired photovoltaic performance. The formation of bonds and the delocalization of electrons over conjugated chains are both explained by [...] Read more.
This review article covers the synthesis and design of conjugated polymers for carefully adjusting energy levels and energy band gap (EBG) to achieve the desired photovoltaic performance. The formation of bonds and the delocalization of electrons over conjugated chains are both explained by the molecular orbital theory (MOT). The intrinsic characteristics that classify conjugated polymers as semiconducting materials come from the EBG of organic molecules. A quinoid mesomeric structure (D-A ↔ D+ = A) forms across the major backbones of the polymer as a result of alternating donor–acceptor segments contributing to the pull–push driving force between neighboring units, resulting in a smaller optical EBG. Furthermore, one of the most crucial factors in achieving excellent performance of the polymer is improving the morphology of the active layer. In order to improve exciton diffusion, dissociation, and charge transport, the nanoscale morphology ensures nanometer phase separation between donor and acceptor components in the active layer. It was demonstrated that because of the exciton’s short lifetime, only small diffusion distances (10–20 nm) are needed for all photo-generated excitons to reach the interfacial region where they can separate into free charge carriers. There is a comprehensive explanation of the architecture of organic solar cells using single layer, bilayer, and bulk heterojunction (BHJ) devices. The short circuit current density (Jsc), open circuit voltage (Voc), and fill factor (FF) all have a significant impact on the performance of organic solar cells (OSCs). Since the BHJ concept was first proposed, significant advancement and quick configuration development of these devices have been accomplished. Due to their ability to combine great optical and electronic properties with strong thermal and chemical stability, conjugated polymers are unique semiconducting materials that are used in a wide range of applications. According to the fundamental operating theories of OSCs, unlike inorganic semiconductors such as silicon solar cells, organic photovoltaic devices are unable to produce free carrier charges (holes and electrons). To overcome the Coulombic attraction and separate the excitons into free charges in the interfacial region, organic semiconductors require an additional thermodynamic driving force. From the molecular engineering of conjugated polymers, it was discovered that the most crucial obstacles to achieving the most desirable properties are the design and synthesis of conjugated polymers toward optimal p-type materials. Along with plastic solar cells (PSCs), these materials have extended to a number of different applications such as light-emitting diodes (LEDs) and field-effect transistors (FETs). Additionally, the topics of fluorene and carbazole as donor units in conjugated polymers are covered. The Stille, Suzuki, and Sonogashira coupling reactions widely used to synthesize alternating D–A copolymers are also presented. Moreover, conjugated polymers based on anthracene that can be used in solar cells are covered. Full article
(This article belongs to the Special Issue Advanced Polymers for Solar Cells Applications)
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16 pages, 4855 KB  
Review
Hot Carrier Injection Reliability in Nanoscale Field Effect Transistors: Modeling and Simulation Methods
by Yimin Wang, Yun Li, Yanbin Yang and Wenchao Chen
Electronics 2022, 11(21), 3601; https://doi.org/10.3390/electronics11213601 - 4 Nov 2022
Cited by 15 | Viewed by 9969
Abstract
Hot carrier injection (HCI) can generate interface traps or oxide traps mainly by dissociating the Si-H or Si-O bond, thus affecting device performances such as threshold voltage and saturation current. It is one of the most significant reliability issues for devices and circuits. [...] Read more.
Hot carrier injection (HCI) can generate interface traps or oxide traps mainly by dissociating the Si-H or Si-O bond, thus affecting device performances such as threshold voltage and saturation current. It is one of the most significant reliability issues for devices and circuits. Particularly, the increase in heat generation per unit volume due to high integration density of advanced integrated circuits leads to a severe self-heating effect (SHE) of nanoscale field effect transistors (FETs), and low thermal conductivity of materials in nanoscale FETs further aggravates the SHE. High temperature improves the HCI reliability in the conventional MOSFET with long channels in which the energy of carriers can be relaxed. However, high temperature due to severe SHE deteriorates HCI reliability in nanoscale FETs, which is a big concern in device and circuit design. In this paper, the modeling and simulation methods of HCI in FETs are reviewed. Particularly, some recently proposed HCI models with consideration of the SHE are reviewed and discussed in detail. Full article
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19 pages, 6455 KB  
Review
Challenges for Nanoscale CMOS Logic Based on Two-Dimensional Materials
by Theresia Knobloch, Siegfried Selberherr and Tibor Grasser
Nanomaterials 2022, 12(20), 3548; https://doi.org/10.3390/nano12203548 - 11 Oct 2022
Cited by 35 | Viewed by 7074
Abstract
For ultra-scaled technology nodes at channel lengths below 12 nm, two-dimensional (2D) materials are a potential replacement for silicon since even atomically thin 2D semiconductors can maintain sizable mobilities and provide enhanced gate control in a stacked channel nanosheet transistor geometry. While theoretical [...] Read more.
For ultra-scaled technology nodes at channel lengths below 12 nm, two-dimensional (2D) materials are a potential replacement for silicon since even atomically thin 2D semiconductors can maintain sizable mobilities and provide enhanced gate control in a stacked channel nanosheet transistor geometry. While theoretical projections and available experimental prototypes indicate great potential for 2D field effect transistors (FETs), several major challenges must be solved to realize CMOS logic circuits based on 2D materials at the wafer scale. This review discusses the most critical issues and benchmarks against the targets outlined for the 0.7 nm node in the International Roadmap for Devices and Systems scheduled for 2034. These issues are grouped into four areas; device scaling, the formation of low-resistive contacts to 2D semiconductors, gate stack design, and wafer-scale process integration. Here, we summarize recent developments in these areas and identify the most important future research questions which will have to be solved to allow for industrial adaptation of the 2D technology. Full article
(This article belongs to the Special Issue Abridging the CMOS Technology)
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14 pages, 6515 KB  
Article
Comprehensive Power Gain Assessment of GaN-SOI-FinFET for Improved RF/Wireless Performance Using TCAD
by Ajay Kumar, Neha Gupta, Amit Kumar Goyal and Yehia Massoud
Micromachines 2022, 13(9), 1418; https://doi.org/10.3390/mi13091418 - 28 Aug 2022
Cited by 15 | Viewed by 3207
Abstract
In this work, we present a radio frequency (RF) assessment of the nanoscale gallium nitride-silicon-on-insulator fin field-effect transistor (GaN-SOI-FinFET). All the performances of the device were compared with GaN-FinFET and conventional FinFET (Conv. FinFET) simultaneously. All the results show that the power gains [...] Read more.
In this work, we present a radio frequency (RF) assessment of the nanoscale gallium nitride-silicon-on-insulator fin field-effect transistor (GaN-SOI-FinFET). All the performances of the device were compared with GaN-FinFET and conventional FinFET (Conv. FinFET) simultaneously. All the results show that the power gains significantly improved in terms of Gma, Gms, Stern stability factor (SS), GMT, and intrinsic delay in comparison with conventional FinFET. Current gain and unilateral power gain were also evaluated for the extraction of fT (cut-off frequency) and fMAX, respectively. fT and fMAX were enhanced by 88.8% and 94.6%, respectively. This analysis was performed at several THz frequencies. Further, the parametric assessment was also performed in terms of gate length and oxide thickness to find the optimized value of gate length and oxide thickness. The implementation of GaN in the channel reduces the parasitic capacitance and paves the way for high-performance RF applications. Full article
(This article belongs to the Special Issue Advancements in MOSFET and Field Effect Devices)
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16 pages, 6070 KB  
Perspective
Plasmonic Field-Effect Transistors (TeraFETs) for 6G Communications
by Michael Shur, Gregory Aizin, Taiichi Otsuji and Victor Ryzhii
Sensors 2021, 21(23), 7907; https://doi.org/10.3390/s21237907 - 27 Nov 2021
Cited by 41 | Viewed by 6110
Abstract
Ever increasing demands of data traffic makes the transition to 6G communications in the 300 GHz band inevitable. Short-channel field-effect transistors (FETs) have demonstrated excellent potential for detection and generation of terahertz (THz) and sub-THz radiation. Such transistors (often referred to as TeraFETs) [...] Read more.
Ever increasing demands of data traffic makes the transition to 6G communications in the 300 GHz band inevitable. Short-channel field-effect transistors (FETs) have demonstrated excellent potential for detection and generation of terahertz (THz) and sub-THz radiation. Such transistors (often referred to as TeraFETs) include short-channel silicon complementary metal oxide (CMOS). The ballistic and quasi-ballistic electron transport in the TeraFET channels determine the TeraFET response at the sub-THz and THz frequencies. TeraFET arrays could form plasmonic crystals with nanoscale unit cells smaller or comparable to the electron mean free path but with the overall dimensions comparable with the radiation wavelength. Such plasmonic crystals have a potential of supporting the transition to 6G communications. The oscillations of the electron density (plasma waves) in the FET channels determine the phase relations between the unit cells of a FET plasmonic crystal. Excited by the impinging radiation and rectified by the device nonlinearities, the plasma waves could detect both the radiation intensity and the phase enabling the line-of-sight terahertz (THz) detection, spectrometry, amplification, and generation for 6G communication. Full article
(This article belongs to the Special Issue Terahertz and Millimeter Wave Sensing and Applications)
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