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Keywords = pulsed electron beam deposition

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17 pages, 9258 KB  
Article
Synergistic Suppression of Secondary Electron Yield from Al2O3 Ceramic Windows by TiN Film and Laser Surface Texturing
by Baolong Ma, Shixi Chen, Chen Chen, Fanxi Zhang, Yaru Wang, Yixin Si, Jinglun Li, Jinghe Yang, Haipeng Li, Sheng Wang and Yupeng Xie
Nanomaterials 2026, 16(9), 513; https://doi.org/10.3390/nano16090513 - 24 Apr 2026
Viewed by 698
Abstract
To suppress the Secondary Electron Yield (SEY) of Al2O3 ceramic surfaces for accelerator ceramic windows, a synergistic strategy integrating TiN film deposition and laser surface texturing was developed. TiN films were first deposited on Al2O3 substrates by [...] Read more.
To suppress the Secondary Electron Yield (SEY) of Al2O3 ceramic surfaces for accelerator ceramic windows, a synergistic strategy integrating TiN film deposition and laser surface texturing was developed. TiN films were first deposited on Al2O3 substrates by pulsed DC magnetron sputtering, and the sputtering power was optimized through systematic characterization of the film morphology and chemical states, with 300 W identified as the optimal deposition condition. Laser surface texturing was then introduced to construct micro-structured Al2O3 surfaces with different geometrical features. Among the investigated laser powers, the 12 W-treated surface exhibited the most developed surface morphology and the highest roughness, indicating the most favorable topography for electron trapping. SEY measurements showed that the maximum SEY decreased from 8.2 for the as-received Al2O3 to 5.5 after deposition of a 10 nm TiN film, and was further reduced to 2.1, 1.0, and 1.7 for the textured TiN/Al2O3 surfaces prepared at 6, 12, and 18 W, respectively, with the best suppression for the 12 W textured TiN/Al2O3. The enhanced performance is attributed to the synergistic effect of low-SEY TiN surface chemistry and geometrical electron trapping induced by laser texturing. This work provides an effective route for constructing low-SEY Al2O3 ceramic surfaces for beam-window-related applications. Full article
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20 pages, 6734 KB  
Article
Time-Scale Mismatch as a Fundamental Constraint in Quantum Beam–Matter Interactions
by Abbas Alshehabi
Quantum Beam Sci. 2026, 10(2), 10; https://doi.org/10.3390/qubs10020010 - 8 Apr 2026
Viewed by 371
Abstract
Quantum beams-including X-rays, synchrotron radiation, electrons, neutrons, ions, and ultrafast photon sources-are indispensable tools for probing the structure, dynamics, and electronic properties of matter. The excitation time scale τexc is defined operationally as the characteristic temporal interval governing externally imposed [...] Read more.
Quantum beams-including X-rays, synchrotron radiation, electrons, neutrons, ions, and ultrafast photon sources-are indispensable tools for probing the structure, dynamics, and electronic properties of matter. The excitation time scale τexc is defined operationally as the characteristic temporal interval governing externally imposed energy deposition events within the interaction volume, such as pulse duration, bunch spacing, or beam dwell time. Interpretation of beam–matter interactions has traditionally relied on steady-state or quasi-equilibrium assumptions, implicitly presuming that intrinsic material relaxation processes can accommodate externally imposed excitation. Recent advances in high-brightness synchrotron sources, X-ray free-electron lasers (XFELs), and pulsed electron beams increasingly operate in regimes where this assumption is strained, and systematic nonequilibrium effects, radiation damage, and irreversible transformations are reported even under routine experimental conditions. This work examines the role of time-scale mismatch between beam-driven energy deposition and intrinsic material relaxation as a governing constraint in beam–matter interactions. Analyzing the hierarchy of excitation, electronic relaxation, phonon coupling, and thermal diffusion time scales, the analysis introduces a dimensionless mismatch parameter Λ=τrelτexc, which quantifies the competition between externally imposed excitation and intrinsic relaxation processes in beam–matter interactions. The resulting framework provides a unified physical interpretation of beam-induced damage, signal distortion, dose dependence, and nonlinear response across quantum beam modalities, framing these effects as consequences of forced nonequilibrium dynamics rather than technique-specific artifacts. Full article
(This article belongs to the Section Radiation Scattering Fundamentals and Theory)
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32 pages, 2048 KB  
Review
Biocompatible Thin Films Deposited by Laser Techniques
by Andrei Teodor Matei and Anita Ioana Visan
Materials 2026, 19(5), 925; https://doi.org/10.3390/ma19050925 - 28 Feb 2026
Viewed by 503
Abstract
Biocompatible thin films are essential for advancing biomedical devices, as they enhance integration with biological tissues, improve device longevity, and reduce complications. The rapid evolution of both medical needs and materials science has led to a diverse array of deposition techniques, each offering [...] Read more.
Biocompatible thin films are essential for advancing biomedical devices, as they enhance integration with biological tissues, improve device longevity, and reduce complications. The rapid evolution of both medical needs and materials science has led to a diverse array of deposition techniques, each offering unique advantages and challenges for tailoring surface properties without compromising the bulk characteristics of implants and sensors. While laser-based methods—such as pulsed laser deposition (PLD) and Matrix-Assisted Pulsed Laser Evaporation (MAPLE)—are renowned for their precision, ability to preserve complex material stoichiometry, and suitability for low-temperature processing, the broader landscape includes several other important approaches. Physical Vapor Deposition (PVD) techniques, including magnetron sputtering and pulsed electron deposition, are widely used for their ability to create uniform, adherent coatings with controlled thickness and composition, making them suitable for both hard and soft biomedical substrates. Chemical Vapor Deposition (CVD) and its plasma-enhanced variant (PECVD) offer conformal coatings and excellent control over film chemistry, which is particularly valuable for functional polymer and ceramic films. Other methods, such as sol–gel processing, ion beam deposition, and electrophoretic deposition, provide additional flexibility in terms of coating composition, adhesion, and processing temperature, allowing for the fabrication of films with tailored mechanical, chemical, and biological properties. Despite these advances, the field faces ongoing challenges in optimizing film properties for specific clinical applications, ensuring reproducibility, and scaling up production for widespread use. The necessity of this review lies in its comprehensive comparison of laser-based techniques with alternative deposition methods, providing critical insights into their respective strengths, limitations, and suitability for different biomedical scenarios. By synthesizing recent developments and highlighting current gaps, this review aims to guide researchers and clinicians in selecting the most appropriate thin-film deposition strategies to meet the evolving demands of next-generation biomedical devices. Full article
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16 pages, 2494 KB  
Article
Sub-Ablative Femtosecond Laser Modification of the Nonlinear Optical Response of Amorphous TiO2 Thin Films
by Victoria Atanassova, Georgi Yankov, Krum Shumanov, Stefan Karatodorov, Ilko Miloushev, Tihomir Tenev, Ekaterina Iordanova, Velichka Strijkova, Vesela Katrova and Ivan Zahariev
Coatings 2026, 16(2), 220; https://doi.org/10.3390/coatings16020220 - 8 Feb 2026
Viewed by 631
Abstract
Femtosecond laser processing has emerged as a promising post-deposition method for tailoring the properties of dielectric thin films, offering localized modification without thermal damage. This study investigates the effect of sub-ablative femtosecond laser irradiation on the nonlinear optical response of a TiO2 [...] Read more.
Femtosecond laser processing has emerged as a promising post-deposition method for tailoring the properties of dielectric thin films, offering localized modification without thermal damage. This study investigates the effect of sub-ablative femtosecond laser irradiation on the nonlinear optical response of a TiO2 single-layer coating deposited on soda-lime glass by electron-beam evaporation. The coating was modified using 35 fs pulses at 800 nm delivered at a repetition rate of 1 kHz and a fluence of 0.083 J/cm2 while varying the number of pulses per spot. The effective nonlinear refractive index (n2,eff) and effective nonlinear absorption coefficient (βeff) were measured using the z-scan technique with femtosecond excitation. The as-deposited TiO2 coating exhibited a negative effective nonlinear refractive index, signifying a self-defocusing nonlinear response, while femtosecond laser irradiation leads to pronounced changes in the effective nonlinear parameters. An increase in the magnitude of both effective nonlinear coefficients and a reversal of the sign of the effective nonlinear refractive index are experimentally observed after irradiation with higher pulse numbers. These findings provide experimental evidence that sub-ablative femtosecond laser processing can be used as a post-deposition tool to control the nonlinear optical response of TiO2 thin films. Full article
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16 pages, 4776 KB  
Article
Modification of taC:H Films via λ = 266 nm Picosecond Pulsed Laser Irradiation
by Teodor I. Milenov, Desislava Karaivanova, Anna Dikovska, Dimitar A. Dimov, Ivalina Avramova, Kiril Mladenov Kirilov, Kaloyan Genkov and Stefan K. Kolev
Coatings 2026, 16(1), 67; https://doi.org/10.3390/coatings16010067 - 7 Jan 2026
Viewed by 933
Abstract
Hydrogenated tetrahedral amorphous carbon (ta-C:H) thin films were modified using 266 nm picosecond laser pulses to investigate structural transformations at low and moderate fluences. Nitrogen-doped hydrogenated tetrahedral amorphous carbon layers 20–40 nm thick were deposited on silicon (Si) and silicon dioxide on silicon [...] Read more.
Hydrogenated tetrahedral amorphous carbon (ta-C:H) thin films were modified using 266 nm picosecond laser pulses to investigate structural transformations at low and moderate fluences. Nitrogen-doped hydrogenated tetrahedral amorphous carbon layers 20–40 nm thick were deposited on silicon (Si) and silicon dioxide on silicon (SiO2/Si) substrates and irradiated with picosecond pulses at 0.5–1.6 J cm−2 using a raster-scanned beam. Structural changes in morphology, composition, and bonding were evaluated via optical microscopy, atomic force microscopy (AFM), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and Raman spectroscopy. Even below 1.0 J cm−2, localized color shifts and slight swelling indicated early structural rearrangements without significant material removal. Above 1.0–1.2 J cm−2, the films were largely ablated, although a persistent 3–6 nm carbon layer remained on both substrate types. XPS showed an increase in sp2-bonded carbon by roughly 15%–20% in optimally modified regions, and Raman spectroscopy revealed defect-activated D-bands and the formation of multilayer defective graphene or reduced-graphene-oxide-like flakes at ablation boundaries. These results indicate that picosecond ultraviolet irradiation enables controllable graphitization and thinning of ta-C:H films while maintaining uniform processing over centimeter-scale areas, providing a route to thin, conductive, partially graphitized carbon coatings for optical and electronic applications. Full article
(This article belongs to the Section High-Energy Beam Surface Engineering and Coatings)
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33 pages, 4350 KB  
Review
Laser Processing Methods in Precision Silicon Carbide Wafer Exfoliation: A Review
by Tuğrul Özel and Faik Derya Ince
J. Manuf. Mater. Process. 2026, 10(1), 2; https://doi.org/10.3390/jmmp10010002 - 19 Dec 2025
Cited by 2 | Viewed by 2333
Abstract
The rapid advancement of high-performance electronics has intensified the demand for wide-bandgap semiconductor materials capable of operating under high-power and high-temperature conditions. Among these, silicon carbide (SiC) has emerged as a leading candidate due to its superior thermal conductivity, chemical stability, and mechanical [...] Read more.
The rapid advancement of high-performance electronics has intensified the demand for wide-bandgap semiconductor materials capable of operating under high-power and high-temperature conditions. Among these, silicon carbide (SiC) has emerged as a leading candidate due to its superior thermal conductivity, chemical stability, and mechanical strength. However, the high cost and complexity of SiC wafer fabrication, particularly in slicing and exfoliation, remain significant barriers to its widespread adoption. Conventional methods such as wire sawing suffer from considerable kerf loss, surface damage, and residual stress, reducing material yield and compromising wafer quality. Additionally, techniques like smart-cut ion implantation, though capable of enabling thin-layer transfer, are limited by long thermal annealing durations and implantation-induced defects. To overcome these limitations, ultrafast laser-based processing methods, including laser slicing and stealth dicing (SD), have gained prominence as non-contact, high-precision alternatives for SiC wafer exfoliation. This review presents the current state of the art and recent advances in laser-based precision SiC wafer exfoliation processes. Laser slicing involves focusing femtosecond or picosecond pulses at a controlled depth parallel to the beam path, creating internal damage layers that facilitate kerf-free wafer separation. In contrast, stealth dicing employs laser-induced damage tracks perpendicular to the laser propagation direction for chip separation. These techniques significantly reduce material waste and enable precise control over wafer thickness. The review also reports that recent studies have further elucidated the mechanisms of laser–SiC interaction, revealing that femtosecond pulses offer high machining accuracy due to localized energy deposition, while picosecond lasers provide greater processing efficiency through multipoint refocusing but at the cost of increased amorphous defect formation. The review identifies multiphoton ionization, internal phase explosion, and thermal diffusion key phenomena that play critical roles in microcrack formation and structural modification during precision SiC wafer laser processing. Typical ultrafast-laser operating ranges include pulse durations from 120–450 fs (and up to 10 ps), pulse energies spanning 5–50 µJ, focal depths of 100–350 µm below the surface, scan speeds ranging from 0.05–10 mm/s, and track pitches commonly between 5–20 µm. In addition, the review provides quantitative anchors including representative wafer thicknesses (250–350 µm), typical laser-induced crack or modified-layer depths (10–40 µm and extending up to 400–488 µm for deep subsurface focusing), and slicing efficiencies derived from multi-layer scanning. The review concludes that these advancements, combined with ongoing progress in ultrafast laser technology, represent research opportunities and challenges in transformative shifts in SiC wafer fabrication, offering pathways to high-throughput, low-damage, and cost-effective production. This review highlights the comparative advantages of laser-based methods, identifies the research gaps, and outlines the challenges and opportunities for future research in laser processing for semiconductor applications. Full article
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13 pages, 4860 KB  
Article
Numerical Investigation of Enhanced High-Intensity Laser–Matter Interactions in Nanowire-Coated Conical Targets
by Laura Ionel and Cristian Viespe
Nanomaterials 2025, 15(23), 1763; https://doi.org/10.3390/nano15231763 - 24 Nov 2025
Cited by 1 | Viewed by 603
Abstract
Nanostructured targets are increasingly used as key components in high-power laser–matter interaction experiments due to their ability to substantially enhance laser absorption, increase ion/electron generation, or boost the secondary radiation (THz, X-ray, etc.) in accordance with the actual scientific requirements in ultraintense regimes. [...] Read more.
Nanostructured targets are increasingly used as key components in high-power laser–matter interaction experiments due to their ability to substantially enhance laser absorption, increase ion/electron generation, or boost the secondary radiation (THz, X-ray, etc.) in accordance with the actual scientific requirements in ultraintense regimes. Their tailored surface features influence the way the energy is deposited in the material, leading to significantly enhanced interaction effects compared to the flat conventional targets. In this study, we numerically investigate the mechanisms of laser field intensification occurring in the interaction between an ultraintense laser pulse and a nanostructured conical target. In order to provide a complex spatio-temporal description of the laser intensity evolution in the interaction area, we developed a 2D finite-difference time-domain model in accordance with the relative spatial extension of the pulse. The laser field intensification is numerically investigated in the vicinity of the laser matter interaction point considering four different materials of the nanopatterned conical targets and variable laser beam parameters in order to determine the optimum conditions to streamline the laser field enrichment in the laser solid targets interaction area. The numerical results show that the designed nanostructured profile of the internal cone target walls under imposed particular conditions induces a highly controllable increase in laser field intensity. Consequently, this enhanced field localization highlights the essential role of nanostructured design in advancing ultraintense laser applications that require efficient energy coupling and extreme field concentrations. Full article
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32 pages, 1741 KB  
Review
Advances and Prospects of Nanomaterial Coatings in Optical Fiber Sensors
by Wenwen Qu, Yanxia Chen, Shuangqiang Liu and Le Luo
Coatings 2025, 15(9), 1008; https://doi.org/10.3390/coatings15091008 - 1 Sep 2025
Cited by 11 | Viewed by 3665
Abstract
This review summarizes the recent advances in the application of nanomaterial coatings in optical fiber sensors, with a particular focus on deposition techniques and the research progress over the past five years in humidity sensing, gas detection, and biosensing. Benefiting from the high [...] Read more.
This review summarizes the recent advances in the application of nanomaterial coatings in optical fiber sensors, with a particular focus on deposition techniques and the research progress over the past five years in humidity sensing, gas detection, and biosensing. Benefiting from the high specific surface area, abundant surface active sites, and quantum confinement effects of nanomaterials, advanced thin-film fabrication techniques—including spin coating, dip coating, self-assembly, physical/chemical vapor deposition, atomic layer deposition (ALD), electrochemical deposition (ECD), electron beam evaporation (E-beam evaporation), pulsed laser deposition (PLD) and electrospinning, and other techniques—have been widely employed in the construction of functional layers for optical fiber sensors, significantly enhancing their sensitivity, response speed, and environmental stability. Studies have demonstrated that nanocoatings can achieve high-sensitivity detection of targets such as humidity, volatile organic compounds (VOCs), and biomarkers by enhancing evanescent field coupling and enabling optical effects such as surface plasmon resonance (SPR), localized surface plasmon resonance (LSPR), and lossy mode resonance (LMR). This paper first analyzes the principles and optimization strategies of nanocoating fabrication techniques, then explores the mechanisms by which nanomaterials enhance sensor performance across various application domains, and finally presents future research directions in material performance optimization, cost control, and the development of novel nanocomposites. These insights provide a theoretical foundation for the functional design and practical implementation of nanomaterial-based optical fiber sensors. Full article
(This article belongs to the Special Issue Advanced Optical Film Coating)
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21 pages, 9876 KB  
Article
Laser-Induced Ablation of Hemp Seed-Derived Biomaterials for Transdermal Drug Delivery
by Alexandru Cocean, Georgiana Cocean, Silvia Garofalide, Nicanor Cimpoesu, Daniel Alexa, Iuliana Cocean and Silviu Gurlui
Int. J. Mol. Sci. 2025, 26(16), 7852; https://doi.org/10.3390/ijms26167852 - 14 Aug 2025
Viewed by 1287
Abstract
Numerous studies on specific cannabis compounds (cannabinoids and phenolic acids) have demonstrated their therapeutic potential, with their administration methods remaining a key research focus. Transdermal drug delivery (TDD) systems are gaining attention due to their advantages, such as painless administration, controlled release, direct [...] Read more.
Numerous studies on specific cannabis compounds (cannabinoids and phenolic acids) have demonstrated their therapeutic potential, with their administration methods remaining a key research focus. Transdermal drug delivery (TDD) systems are gaining attention due to their advantages, such as painless administration, controlled release, direct absorption into the bloodstream, and its ability to bypass hepatic metabolism. The thin films obtained via pulsed laser deposition consist of micro- and nanoparticles capable of migrating through skin pores upon contact. This study investigates the interaction of phenolic compounds in hemp seeds with pulsed laser beams. The main goal is to achieve the ablation and deposition of these compounds as thin films suitable for TDD applications. The other key objective is optimizing laser energy to enhance the industrial feasibility of this method. Thin layers were deposited on glass and hemp fabric using dual pulsed laser (DPL) ablation on a compressed hemp seed target held in a stainless steel ring. The target was irradiated for 30 min with two synchronized pulsed laser beams, each with parameters of 30 mJ, 532 nm, pulse width of 10 ns, and a repetition rate of 10 Hz. Each beam had an angle of incidence with the target surface of 45°, and the angle between the two beams was also 45°. To improve laser absorption, two approaches were used: (1) HS-DPL/glass and HS-DPL/hemp fabric, in which a portion of the stainless steel ring was included in the irradiated area, and (2) HST-DPL/glass and HST-DPL/hemp fabric—hemp seeds were mixed with turmeric powder, which is known to improve laser interaction and biocompatibility. The FTIR and Micro-FTIR spectroscopy (ATR) performed on thin films compared to the target material confirmed the presence of hemp-derived phenolic compounds, including tetrahydrocannabinol (THC), cannabidiol (CBD), ferulic acid, and coumaric acid, along with other functional groups such as amides. The ATR spectra have been validated against Gaussian 6 numerical simulations. Scanning electron microscopy (SEM) and substance transfer tests revealed the microgranular structure of thin films. Through the analyzes carried out, the following were highlighted: spherical structures (0.3–2 μm) for HS-DPL/glass, HS-DPL/hemp fabric, HST-DPL/glass, and HST-DPL/hemp fabric; larger spherical structures (8–13 μm) for HS-DPL/glass and HST-DPL/glass; angular, amorphous-like structures (~3.5 μm) for HS-DPL/glass; and crystalline-like structures (0.6–1.3 μm) for HST-DPL/glass. Microparticle transfer from thin films on the hemp fabric to the filter paper at a human body temperature (37 °C) confirmed their suitability for TDD applications, aligning with the “whole plant medicine” or “entourage effect” concept. Granular, composite, thin films were successfully developed, capable of releasing microparticles upon contact with a surface whose temperature is 37 °C, specific to the human body. Each of the microparticles in the thin films obtained with the DPL technique contains phenolic compounds (cannabinoids and phenolic acids) comparable to those in hemp seeds, effectively acting as “microseeds.” The obtained films are viable for TDD applications, while the DPL technique ensures industrial scalability due to its low laser energy requirements. Full article
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13 pages, 4277 KB  
Article
Advancing Nanoscale Copper Deposition Through Ultrafast-Laser-Activated Surface Chemistry
by Modestas Sadauskas, Romualdas Trusovas, Evaldas Kvietkauskas, Viktorija Vrubliauskaitė, Ina Stankevičienė, Aldona Jagminienė, Tomas Murauskas, Dainius Balkauskas, Alexandr Belosludtsev and Karolis Ratautas
Nanomaterials 2025, 15(11), 830; https://doi.org/10.3390/nano15110830 - 30 May 2025
Cited by 1 | Viewed by 1801
Abstract
Direct-writing submicron copper circuits on glass with laser precision—without lithography, vacuum deposition, or etching—represents a transformative step in next-generation microfabrication. We present a high-resolution, maskless method for metallizing glass using ultrashort pulse Bessel beam laser processing, followed by silver ion activation and electroless [...] Read more.
Direct-writing submicron copper circuits on glass with laser precision—without lithography, vacuum deposition, or etching—represents a transformative step in next-generation microfabrication. We present a high-resolution, maskless method for metallizing glass using ultrashort pulse Bessel beam laser processing, followed by silver ion activation and electroless copper plating. The laser-modified glass surface hosts nanoscale chemical defects that promote the in situ reduction of Ag+ to metallic Ag0 upon exposure to AgNO3 solution. These silver seeds act as robust catalytic and adhesion sites for subsequent copper growth. Using this approach, we demonstrate circuit traces as narrow as 0.7 µm, featuring excellent uniformity and adhesion. Compared to conventional redistribution-layer (RDL) and under-bump-metallization (UBM) techniques, this process eliminates multiple lithographic and vacuum-based steps, significantly reducing process complexity and production time. The method is scalable and adaptable for applications in transparent electronics, fan-out packaging, and high-density interconnects. Full article
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14 pages, 4136 KB  
Article
Morphology of Coatings Deposited by Pulsed Electron Deposition Method from Polytetrafluoroethylene-Carbon Composites
by Agata Niemczyk, Sebastian Fryska, Dariusz Moszyński, Daniel Deacu, Paweł Kochmański and Jolanta Baranowska
Molecules 2025, 30(7), 1474; https://doi.org/10.3390/molecules30071474 - 26 Mar 2025
Viewed by 1017
Abstract
PTFE/C composite targets were ablated using a pulsed electron beam of different energies to evaluate the suitability of this technique for composite coating deposition. Composite materials with two different carbon fillers and their contents (graphite—10 wt.% and coal coke—35 wt.%) were used. A [...] Read more.
PTFE/C composite targets were ablated using a pulsed electron beam of different energies to evaluate the suitability of this technique for composite coating deposition. Composite materials with two different carbon fillers and their contents (graphite—10 wt.% and coal coke—35 wt.%) were used. A PTFE target was used as reference material. The chemical and physical structure of the coatings was investigated using FTIR, XPS, and XRD. The topography was investigated using optical microscopy, SEM, and AFM. In addition, the contact angle and surface energy of the coatings were evaluated. It was shown that the presence of carbon particles in the polymer matrix decreased the deposition rate but greatly reduced the degradation of PTFE. It is hypothesized that the high content of conductive particles reduces the capability of the pulsed electron beam process to maintain the integrity of the filler particles during the coating deposition process. Full article
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19 pages, 33574 KB  
Article
Mechanical and Thermal Contributions to the Damage Suffered by an Aeronautical Structure Subjected to an Intense and Sudden Electrical Discharge
by Bryan Better, Aboulghit El Malki Alaoui, Christine Espinosa, Michel Arrigoni, Nathan Menetrier, Chabouh Yazidjian, Serge Guetta, Frédéric Lachaud, Christian Jochum, Michel Boustie and Didier Zagouri
Aerospace 2025, 12(3), 235; https://doi.org/10.3390/aerospace12030235 - 14 Mar 2025
Cited by 2 | Viewed by 1485
Abstract
Lightweight aeronautical structures and power generation structures such as wind turbines are fitted with protected external layers designed and certified to withstand severe climatic events such as lightning strikes. During these events, high currents flow through the structural protection but are likely to [...] Read more.
Lightweight aeronautical structures and power generation structures such as wind turbines are fitted with protected external layers designed and certified to withstand severe climatic events such as lightning strikes. During these events, high currents flow through the structural protection but are likely to induce effects deeper in the supporting composite material and could even reach or perforate pressurized tanks. In situ measurements are hard to achieve during current delivery due to the severe electromagnetic conditions, and the lightning strike phenomenon on these structures is not yet fully investigated. To gain a better understanding of the physics involved, similarities in direct damage between lightning-struck samples and those subjected to pulsed lasers and an electron gun are analyzed. These analyses show the inability of a pure mechanical contribution to fully reproduce the shape of the delamination distribution of lightning strikes. Conversely, the similarities in effect and damage with the thermomechanical contribution of electron beam deposition are highlighted, particularly the increase in core delamination due to the paint and the apparent similarities in delamination distribution. Full article
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12 pages, 7162 KB  
Article
Comparative Study on Structural Differences in Monosaccharide Layers Using PLD and PED Techniques
by Agata Niemczyk, Agata Goszczyńska, Dariusz Moszyński, Paweł Figiel, Sebastian Fryska and Jolanta Baranowska
Molecules 2024, 29(21), 5095; https://doi.org/10.3390/molecules29215095 - 28 Oct 2024
Viewed by 1453
Abstract
To demonstrate the feasibility of obtaining low-molecular-weight organic films (below 200 Da) using non-solvent PVD processes, glucose layers were produced via pulsed laser deposition (PLD) and pulsed electron beam deposition (PED) methods. Glucose was chosen due to its fundamental role in various biological [...] Read more.
To demonstrate the feasibility of obtaining low-molecular-weight organic films (below 200 Da) using non-solvent PVD processes, glucose layers were produced via pulsed laser deposition (PLD) and pulsed electron beam deposition (PED) methods. Glucose was chosen due to its fundamental role in various biological processes, and because this low-molecular-weight compound is a solid at room temperature, which is required for both techniques. The physical and chemical structures of the deposited glucose layers were characterized by optical, scanning electron, and atomic force microscopy, as well as by X-ray diffraction, X-ray photoelectron, and infrared spectroscopy. Both PLD and PED methods resulted in glucose layers with good chemical structure preservation (with minor oxidation observed in PED) while yielding films with distinct physical properties. This opens up the possibility of tailoring organic layers with specific characteristics depending on the application, by choosing the deposition method. Full article
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18 pages, 4621 KB  
Article
Development of a Miniaturized 2-Joule Pulsed Plasma Source Based on Plasma Focus Technology: Applications in Extreme Condition Materials and Nanosatellite Orientation
by Leopoldo Soto, Cristian Pavez, José Pedreros, Jalaj Jain, José Moreno, Patricio San Martín, Fermín Castillo, Daniel Zanelli and Luis Altamirano
Micromachines 2024, 15(9), 1123; https://doi.org/10.3390/mi15091123 - 1 Sep 2024
Cited by 1 | Viewed by 3518
Abstract
Plasma focus devices represent a class of hot and dense plasma sources that serve a dual role in fundamental plasma research and practical applications. These devices allow the observation of various phenomena, including the z-pinch effect, nuclear fusion reactions, plasma filaments, bursts, shocks, [...] Read more.
Plasma focus devices represent a class of hot and dense plasma sources that serve a dual role in fundamental plasma research and practical applications. These devices allow the observation of various phenomena, including the z-pinch effect, nuclear fusion reactions, plasma filaments, bursts, shocks, jets, X-rays, neutron pulses, ions, and electron beams. In recent years, considerable efforts have been directed toward miniaturizing plasma focus devices, driven by the pursuit of both basic studies and technological advancements. In this paper, we present the design and construction of a compact, portable pulsed plasma source based on plasma focus technology, operating at the ~2–4 Joule energy range for versatile applications (PF-2J: 120 nF capacitance, 6–9 kV charging voltage, 40 nH inductance, 2.16–4.86 J stored energy, and 10–15 kA maximum current at short circuit). The components of the device, including capacitors, spark gaps, discharge chambers, and power supplies, are transportable within hand luggage. The electrical characteristics of the discharge were thoroughly characterized using voltage and current derivative monitoring techniques. A peak current of 15 kiloamperes was achieved within 110 nanoseconds in a short-circuit configuration at a 9 kV charging voltage. Plasma dynamics were captured through optical refractive diagnostics employing a pulsed Nd-YAG laser with a 170-picosecond pulse duration. Clear evidence of the z-pinch effect was observed during discharges in a deuterium atmosphere at 4 millibars and 6 kilovolts. The measured pinch length and radius were approximately 0.8 mm and less than 100 μm, respectively. Additionally, we explore the potential applications of this compact pulsed plasma source. These include its use as a plasma shock irradiation device for analyzing materials intended for the first wall of nuclear fusion reactors, its capability in material film deposition, and its utility as an educational tool in experimental plasma physics. We also show its potential as a pulsed plasma thruster for nanosatellites, showcasing the advantages of miniaturized plasma focus technology. Full article
(This article belongs to the Special Issue Microreactors and Their Applications)
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62 pages, 16763 KB  
Review
Epitaxial Growth of Ga2O3: A Review
by Imteaz Rahaman, Hunter D. Ellis, Cheng Chang, Dinusha Herath Mudiyanselage, Mingfei Xu, Bingcheng Da, Houqiang Fu, Yuji Zhao and Kai Fu
Materials 2024, 17(17), 4261; https://doi.org/10.3390/ma17174261 - 28 Aug 2024
Cited by 33 | Viewed by 12121
Abstract
Beta-phase gallium oxide (β-Ga2O3) is a cutting-edge ultrawide bandgap (UWBG) semiconductor, featuring a bandgap energy of around 4.8 eV and a highly critical electric field strength of about 8 MV/cm. These properties make it highly suitable for next-generation power [...] Read more.
Beta-phase gallium oxide (β-Ga2O3) is a cutting-edge ultrawide bandgap (UWBG) semiconductor, featuring a bandgap energy of around 4.8 eV and a highly critical electric field strength of about 8 MV/cm. These properties make it highly suitable for next-generation power electronics and deep ultraviolet optoelectronics. Key advantages of β-Ga2O3 include the availability of large-size single-crystal bulk native substrates produced from melt and the precise control of n-type doping during both bulk growth and thin-film epitaxy. A comprehensive understanding of the fundamental growth processes, control parameters, and underlying mechanisms is essential to enable scalable manufacturing of high-performance epitaxial structures. This review highlights recent advancements in the epitaxial growth of β-Ga2O3 through various techniques, including Molecular Beam Epitaxy (MBE), Metal-Organic Chemical Vapor Deposition (MOCVD), Hydride Vapor Phase Epitaxy (HVPE), Mist Chemical Vapor Deposition (Mist CVD), Pulsed Laser Deposition (PLD), and Low-Pressure Chemical Vapor Deposition (LPCVD). This review concentrates on the progress of Ga2O3 growth in achieving high growth rates, low defect densities, excellent crystalline quality, and high carrier mobilities through different approaches. It aims to advance the development of device-grade epitaxial Ga2O3 thin films and serves as a crucial resource for researchers and engineers focused on UWBG semiconductors and the future of power electronics. Full article
(This article belongs to the Section Electronic Materials)
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