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Micromachines 2013, 4(2), 157-167; doi:10.3390/mi4020157

Fabrication of a Polymer High-Aspect-Ratio Pillar Array Using UV Imprinting

1,* , 1
1 Nano Processing System Division, Toshiba Machine Co., Ltd., 2068-3, Ooka, Numazu, Shizuoka 410-8510, Japan 2 Institutes for Nanoscience and Nanotechnology, Waseda University, 513 Wasedatsurumaki-cho, Shinjyuku, Tokyo 162-0041, Japan
* Author to whom correspondence should be addressed.
Received: 30 January 2013 / Revised: 3 March 2013 / Accepted: 7 April 2013 / Published: 17 April 2013
(This article belongs to the Special Issue Micromachined Tools for Nanoscale Science and Technology)
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This paper presents UV imprinting methods for fabricating a high-aspect-ratio pillar array. A polydimethylsiloxane (PDMS) mold was selected as the UV imprinting mold. The pillar pattern was formed on a 50 × 50 mm2 area on a polyethylene terephthalate (PET) film without remarkable deformation. The aspect ratios of the pillar and space were about four and ten, respectively. The mold was placed into contact with a UV-curable resin under a reduced pressure, and the resin was cured by UV light irradiation after exposure to atmospheric pressure. The PDMS mold showed good mold releasability and high flexibility. By moderately pressing the mold before UV-curing, the thickness of the residual layer of the imprinted resin was reduced and the pattern was precisely imprinted. Both batch pressing and roll pressing are available.
Keywords: high-aspect-ratio; UV imprinting; resin mold; polydimethylsiloxane high-aspect-ratio; UV imprinting; resin mold; polydimethylsiloxane
This is an open access article distributed under the Creative Commons Attribution License (CC BY) which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Shinohara, H.; Goto, H.; Kasahara, T.; Mizuno, J. Fabrication of a Polymer High-Aspect-Ratio Pillar Array Using UV Imprinting. Micromachines 2013, 4, 157-167.

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