Advances in Properties of Thin Film Materials
A special issue of Applied Sciences (ISSN 2076-3417). This special issue belongs to the section "Materials Science and Engineering".
Deadline for manuscript submissions: closed (30 October 2024) | Viewed by 2262
Special Issue Editor
Special Issue Information
Dear Colleagues,
The idea of thin film deposition emerged to solve the problem of cutting the weight and cost of bulk materials. Thin films deposited on solids can improve their surface properties such as optical, mechanical, electrical, and magnetic properties. Thin films are used to form chemical and thermal surface barriers. Depositing the thin film makes it possible to achieve properties that are not easily attainable in bulk solid states. One recent fruitful idea in thin film technology was the concept of a multilayer thin film of different materials. This approach allows us to obtain multiple properties in one thin film simultaneously, for example, in optical and mechanical applications. Another recent advance of thin film and coating technology is the synthesis of high-entropy alloys possessing five or more elements. The main feature of high-entropy alloys is the formation of single-phase thermodynamically stable and high-strength solid solutions. High mixing entropy results in the stability of solid solutions and the prevention of intermetallic phases during the crystallization process. The diversity of high-entropy alloy element composition endows it with many useful properties such as high-temperature strength, wear and corrosion resistance, high hardness, and ductility. These characteristics greatly expand the application range of compound thin film and coatings.
Dr. Vasiliy Pelenovich
Guest Editor
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Keywords
- thin solid films
- thin film deposition
- physical vapor deposition
- chemical vapor deposition
- nanocomposites
- multilayered thin films
- high-entropy alloys
- optical filters
- hard coatings
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