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Physical Vapor Deposition Multilayer Thin Films for Photoelectric Devices
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Physical Vapor Deposition Multilayer Thin Films for Photoelectric Devices

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Thin Films".

Deadline for manuscript submissions: closed (30 June 2022) | Viewed by 6470

Special Issue Editor

Prof. Dr. Chuen-Lin Tien

E-Mail Website
Guest Editor
Department of Electrical Engineering, Feng Chia University, Taichung 40724, Taiwan
Interests: optical design; optical thin film; residual stress; optical interferometry; fiber-optic sensors
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

We would like to invite you to submit your work to this Special Issue on “Physical Vapor Deposition Multilayer Thin Films for Photoelectric Devices.” Physical vapor deposition (PVD) is used for a thin-film or multilayer coating process which produces coatings of pure metals, metallic oxides, metallic alloys, and ceramics with a thickness usually in the range of a few nanometers to several micrometers. The two most common PVD processes are thermal evaporation and sputtering. Thermal evaporation is a kind of deposition technology that depends on heating the source material in vacuum with appropriate methods to make it evaporate. Sputtering is a plasma-assisted technique that produces vapor from a source target by accelerating the bombardment of gaseous ions (typically argon). PVD is used in a variety of applications, including the fabrication of photoelectronic devices, optical interference filters, thin film sensors, microelectronic devices, light-emitting devices, fuel cell electrodes, nanostructured smart window coatings, optical and conductive coatings, decorative coatings, deposition optimization, surface modifications, etc. The PVD multilayered film structure is beneficial for improving oxidation resistance, enhancing mechanical properties, reducing internal stress, inhibiting crack propagation, and improving fracture toughness.

This Special Issue is seeking original and review articles presented by the leading groups and scientists of the world scientific community in the field of PVD multilayer coating technologies. The novel PVD multilayer processes and the results of their application are intended to be covered in the Special Issue.

Prof. Dr. Chuen-Lin Tien
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • various PVD coating techniques
  • advanced sputtering coatings
  • nano-structured coatings
  • HiPIMS technique and applications
  • ultra-violet/Visible /Infrared coatings
  • novel coating techniques
  • optical interference coatings
  • functional coatings
  • decorative coatings
  • PVD coating applications
  • residual stress analysis in PVD coatings
  • simulation in PVD processes
  • uniformity simulation in PVD coatings
  • multi-layer thin film coatings
  • reviews on PVD coating techniques

Published Papers (2 papers)

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Research

11 pages, 11114 KiB  
Article
Design and Fabrication of a Cost-Effective Optical Notch Filter for Improving Visual Quality
by Chuen-Lin Tien, Hong-Yi Lin, Kuan-Sheng Cheng, Chun-Yu Chiang and Ching-Ying Cheng
Coatings 2022, 12(1), 19; https://doi.org/10.3390/coatings12010019 - 24 Dec 2021
Cited by 4 | Viewed by 3510
Abstract
This study presents a multilayer design and fabrication of an optical notch filter for enhancing visual quality. A cost-effective multilayer design of notch filter with low surface roughness and low residual stress is proposed. A 9-layer notch filter composed of SiO2 and [...] Read more.
This study presents a multilayer design and fabrication of an optical notch filter for enhancing visual quality. A cost-effective multilayer design of notch filter with low surface roughness and low residual stress is proposed. A 9-layer notch filter composed of SiO2 and Nb2O5 with a central wavelength of 480 nm is prepared by electron beam evaporation combined with ion-assisted deposition. The optical transmittance, residual stress, and surface morphology are measured by a UV/VIS/NIR spectrophotometer, Twyman-Green interferometer and field emission scanning electron microscopy (FE-SEM). The transmittance of the notch filter at the central wavelength is above 15%, and the average transmittance of the transmission band is about 80%. The residual stress of the notch filter is −0.235 GPa, and the root mean square surface roughness is 1.85 nm. For improving the visual quality, a good image contrast can be obtained by observing the microscopic image using the proposed notch filter. Full article
(This article belongs to the Special Issue Physical Vapor Deposition Multilayer Thin Films for Photoelectric Devices)
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10 pages, 3169 KiB  
Article
Design and Fabrication of Laser Protective Lenses Based on Multilayered Notch Filter with Low Residual Stress and Low Surface Roughness
by Chuen-Lin Tien, Hong-Yi Lin, Kuan-Sheng Cheng and Chih-Kai Chang
Coatings 2021, 11(12), 1513; https://doi.org/10.3390/coatings11121513 - 09 Dec 2021
Cited by 5 | Viewed by 2162
Abstract
We present a new laser protective lens based on a multilayered notch filter design with low residual stress and low surface roughness. An18-layer notch filter was prepared by electron beam evaporation with an ion-assisted deposition technique, which was composed of SiO2 and [...] Read more.
We present a new laser protective lens based on a multilayered notch filter design with low residual stress and low surface roughness. An18-layer notch filter was prepared by electron beam evaporation with an ion-assisted deposition technique, which was composed of SiO2 and Nb2O5 with a center wavelength of 532 nm. The optical transmittance, residual stress, surface roughness, and surface morphology were measured by a UV/VIS/NIR spectrophotometer, Twyman–Green interferometer, scanning probe microscope, Linnik microscopic interferometer, and field-emission scanning electron microscopy (FE-SEM). The transmittance of the notch filters at center wavelength is 0.2%, and the average transmittance of the transmission band is about 70%. The residual stress of the notch filter is −0.298 GPa, and the root mean square surface roughness is 1.88 nm. The experimental results show that the optical transmittance meets the design requirements. Full article
(This article belongs to the Special Issue Physical Vapor Deposition Multilayer Thin Films for Photoelectric Devices)
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