Nanoscale Multilayer Thin Films/Foils

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Thin Films".

Deadline for manuscript submissions: closed (10 June 2021) | Viewed by 8467

Special Issue Editor


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Guest Editor
CEMMPRE, Department of Mechanical Engineering, University of Coimbra, R. Luís Reis Santos, 3030-788 Coimbra, Portugal
Interests: nanomaterials; reactive multilayers; intermetallics; sputtering; joining; self-healing
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Special Issue Information

Dear Colleagues,

We invite researchers to submit original innovative research works to this Special Issue on “Nanoscale Multilayer Thin Films/Foils”. Nanomultilayers are composed of alternating layers of at least two materials, with a total thickness of between 0.1 and 300 mm, and with a nanometric modulation period (bilayer thickness). Nanomultilayers have been used for mechanical applications due to their improved mechanical behaviour. Multilayer thin films can also be used for preparing intermetallic coatings. In addition, when the alternating layers are constituted by materials characterized by a large heat of formation and high adiabatic reaction temperature—reactive multilayers—they can be used as highly localized heat sources for several applications, including joining, igniters, power sources, or car airbag initiators. Different combinations of metallic, polymeric, and ceramic materials can be found in the composition of nanoscale multilayer thin films/foils prepared by vapour deposition techniques, among which magnetron sputtering has stood out.

This Special Issue will cover the recent progresses and new developments regarding all aspects of nanoscale multilayer thin films/foils, including production, modelling, characterization, testing, and application. From the application perspective, contributions focusing the use of reactive nanomultilayers/nanofoils for joining purposes are welcome.

The topics of interest include, but are not limited to:

  • Nanomaterials and interfaces
  • Energetic materials
  • Magnetron sputtering
  • Phase transformations
  • Intermetallic compounds
  • Reactive multilayers
  • Self-propagating reactions
  • Modelling and numerical simulations
  • Stresses in multilayer thin films or foils
  • Size effects
  • Mechanical behaviour
  • Fracture and crack growth
  • Biomedical applications
  • Joining applications

Dr. Ana Sofia Ramos
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Published Papers (3 papers)

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Research

17 pages, 7540 KiB  
Article
Microstructure of High Temperature Oxidation Resistant Hf6B10Si31C2N50 and Hf7B10Si32C2N44 Films
by Yi Shen, Jiechao Jiang, Petr Zeman, Michaela Kotrlová, Veronika Šímová, Jaroslav Vlček and Efstathios I. Meletis
Coatings 2020, 10(12), 1170; https://doi.org/10.3390/coatings10121170 - 29 Nov 2020
Cited by 2 | Viewed by 2571
Abstract
High-temperature oxidation resistant amorphous Hf6B10Si31C2N50 and Hf7B10Si32C2N44 films were deposited by reactive pulsed dc magnetron sputtering. To investigate the oxidation mechanism, the films were annealed [...] Read more.
High-temperature oxidation resistant amorphous Hf6B10Si31C2N50 and Hf7B10Si32C2N44 films were deposited by reactive pulsed dc magnetron sputtering. To investigate the oxidation mechanism, the films were annealed up to 1500 °C in air. The evolved microstructures were studied by X-ray diffraction and transmission electron microscopy. A three-layered microstructure was developed upon exposure to high temperature. An oxidized layer formed at the top surface for both films consisting of monoclinic and/or orthorhombic m-/o-HfO2 nanoparticles embedded in an amorphous SiOx-based matrix. The as-deposited bottom layer of the films remained amorphous (Hf6B10Si31C2N50) or partially recrystallized (Hf7B10Si32C2N44) exhibiting a h-Si3N4 and HfCxN1−x distribution along with formation of t-HfO2 at its top section. The two layers were separated by a partially oxidized transition layer composed of nanocrystalline h-Si3N4 and tetragonal t-HfO2. The oxidation process initiates at the bottom/transition layer interface with oxidation of Hf-rich domains either in the amorphous structure or in HfCxN1−x nanoparticles resulting in t-HfO2 separated by Si3N4 domains. The second stage occurs at the oxidized/transition layer interface characterized by densely packed HfO2, Si3N4 and quartz SiO2 nanostructures that can act as a barrier for oxygen diffusion. The small t-HfO2 nanoparticles merge and transform into large m-/o-HfO2 while h-Si3N4 forms amorphous SiOx matrix. A similar oxidation mechanism was observed in both films despite the different microstructures developed. Full article
(This article belongs to the Special Issue Nanoscale Multilayer Thin Films/Foils)
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11 pages, 7780 KiB  
Article
Effect of Deposition Parameters on the Reactivity of Al/Ni Multilayer Thin Films
by Ana Sofia Ramos, Sónia Simões, Lukasz Maj, Jerzy Morgiel and Maria Teresa Vieira
Coatings 2020, 10(8), 721; https://doi.org/10.3390/coatings10080721 - 23 Jul 2020
Cited by 5 | Viewed by 2231
Abstract
Nanoscale multilayers can be used as highly localized heat sources, making them attractive for several applications, in particular for joining and as igniters. Over the last decades, academia and industry have given particular emphasis to nanoscale multilayers from the Ni–Al system. In this [...] Read more.
Nanoscale multilayers can be used as highly localized heat sources, making them attractive for several applications, in particular for joining and as igniters. Over the last decades, academia and industry have given particular emphasis to nanoscale multilayers from the Ni–Al system. In this study, Al/Ni (V) multilayer thin films with periods of nominally 25 and 50 nm (bilayer thickness) and near equiatomic average stoichiometry were produced by d.c. magnetron sputtering from Al (99.999% pure) and Ni (93 wt % Ni, 7 wt % V) targets (vanadium was added to the Ni target to make it non-magnetic). Deposition parameters such as the substrate rotation speed and substrate bias were varied in order to evaluate their effect on the reactivity of the multilayers. The influence of in situ ion bombardment of the multilayer thin films was also studied. Phase identification was carried out by X-ray diffraction, while the microstructure was analyzed in detail by transmission electron microscopy, distinguishing alternating layers throughout the entire thickness of the films. Although the films mainly consist of Al- and Ni-rich layers, the presence of the Al3Ni intermetallic phase was detected, except in the multilayers produced with the ion gun switched on during the deposition process. The ion bombardment, as well as the increase of the substrate bias, promote some microstructural disorder and thus affect the multilayers’ reactivity. Full article
(This article belongs to the Special Issue Nanoscale Multilayer Thin Films/Foils)
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11 pages, 3227 KiB  
Article
Microstructure and Wear of (CrN/CrAlN)/(CrAlN/VN) and (CrN/TiAlN)/(TiAlN/VN) Coatings for Molds Used in High Pressure Casting of Aluminum
by Aneta Wilczek, Jerzy Morgiel, Łukasz Rogal, Wojciech Maziarz and Jerzy Smolik
Coatings 2020, 10(3), 261; https://doi.org/10.3390/coatings10030261 - 11 Mar 2020
Cited by 10 | Viewed by 2951
Abstract
Molds made of tool steels used in aluminum high-pressure die casting should routinely withstand tens of thousands of injection cycles, but repeated loading and temperature spikes result in their frequent premature wear. Extending their lifetime could be sought by nitriding or application of [...] Read more.
Molds made of tool steels used in aluminum high-pressure die casting should routinely withstand tens of thousands of injection cycles, but repeated loading and temperature spikes result in their frequent premature wear. Extending their lifetime could be sought by nitriding or application of coatings of even higher hardness or both. Therefore, in the present experiment the arc-deposited Cr/(CrN)/nx(CrN/CrAlN)/mx(CrAlN/VN) or Cr/(CrN)/nx(CrN/TiAlN)/mx(TiAlN/VN) nano-multilayer stacks were deposited on glow discharge nitrided X40CrMoV5.1 steel. The scanning and transmission electron microscopy backed by Energy Dispersive X-ray Spectroscopy measurements of local chemical composition helped to confirm that the coatings are built of nanolayers of respective nitrides of period less than 10 nm. They also showed that droplets being characteristic for arc deposition method were enriched either in chromium, aluminum or vanadium but not in titanium. Both coatings presented comparable hardness of ~25 GPa, but the one covered with TiAlN/VN was roughly twice as wear resistant as the CrAlN/VN. Simultaneously, they were ~200 and ~100 more wear resistant than X40CrMoV5.1reference steel. Full article
(This article belongs to the Special Issue Nanoscale Multilayer Thin Films/Foils)
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