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Photonics
Special Issues
Optical Precision Manufacturing and Testing: Technologies and Trends
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Optical Precision Manufacturing and Testing: Technologies and Trends

A special issue of Photonics (ISSN 2304-6732).

Deadline for manuscript submissions: 15 August 2024 | Viewed by 873

Special Issue Editor

Prof. Dr. Xiaokun Wang

E-Mail Website
Guest Editor
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, China
Interests: optical high precision manufacturing and testing; optical measurement and analysis; optical components defect detection and evaluation
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

Advanced optical manufacturing technology is the key technology in the fields of space remote sensing, space situational awareness and deep space exploration—all areas of study related to national security, national defense construction and national economy. In recent years, the scope of research in the field of technology has been continuously expanding, and it is developing in the direction of higher accuracy, higher efficiency, greater complexity and speed, and lower cost. This Special Issue aims to reflect the latest research achievements and development trends of optical high-precision manufacturing and testing, optical components defect detection and evaluate, etc. In this Special Issue, original research articles and reviews are welcome. Research areas may include (but is not limited to) the following areas:

  • Precision Machining Technology for Optical Components
  • High-Precision Testing Technology for Optical Components
  • Precision Machining and Testing Technology for Special Optical Parts
  • Advanced Optical Manufacturing Processes and Equipment
  • Measurement Methods for Geometric Parameters and Physical Characteristics of Optical Components
  • Detection and Control Technology for Surface and Subsurface Defects in Optical Components

We look forward to receiving your contributions.

Prof. Dr. Xiaokun Wang
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Photonics is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • optical high-precision manufacturing and testing
  • optical instruments
  • optical system
  • surface defect detection and evaluation
  • subsurface defect detection

Published Papers (1 paper)

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Research

9 pages, 2616 KiB  
Article
A Study on Length Traceability and Diffraction Efficiency of Chromium Gratings
by Lihua Lei, Lijie Liang, Liqin Liu, Yaoqiong Shen, Yuqing Guan, Yujie Zhang, Wenzhe Zou, Chuangwei Guo and Yunxia Fu
Photonics 2024, 11(3), 233; https://doi.org/10.3390/photonics11030233 - 4 Mar 2024
Viewed by 714
Abstract
Measurement traceability is a prerequisite for achieving accurate and reliable results as well as technical standardization. The period of Chromium (Cr) gratings fabricated by atomic lithography can be directly traced back to natural constants. Applying the Cr grating to grating interferometry can achieve [...] Read more.
Measurement traceability is a prerequisite for achieving accurate and reliable results as well as technical standardization. The period of Chromium (Cr) gratings fabricated by atomic lithography can be directly traced back to natural constants. Applying the Cr grating to grating interferometry can achieve nanometer measurement traceability. This research aims to analyze the diffraction efficiency characteristics of self-traceable Cr gratings to provide a theoretical basis for the fabrication and application of Cr gratings. In this regard, we establish the theoretical model of the laser beam incident angle and grating diffraction efficiency using the rigorous coupled-wave method. Then, we analyze the influence of the laser beam incident angle on grating diffraction efficiency by simulation, verify the accuracy of the theoretical model, and finally build a measurement system for grating diffraction efficiency. Through experiments, we find that the diffraction efficiency of the grating shows a rapid increase to reach a stable maximum value followed by a decrease, when a laser beam with a wavelength of 405 nm is incident on the surface of a self-traceable grating in Transverse Magnetic (TM) polarization and the incident angle changes within an effective range. The experimental results are consistent with the trend of theoretical calculation results. Full article
(This article belongs to the Special Issue Optical Precision Manufacturing and Testing: Technologies and Trends)
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