Functional Thin Film and Plasma Electrolytic Oxidation

Dear Colleagues,

Functional thin film technology features a wide range of materials with thickness from a fraction of a nanometre to several micrometres. An innovative branch of thin film techniques, known as plasma electrolytic oxidation (PEO), has emerged. PEO facilitates the simultaneous growth of coatings both inward and outward from the original substrate surface. Nevertheless, functional thin film technology has applications across a spectrum of disciplines, including the enhancement of protective properties, such as corrosion resistance and thermal control, as well as contributions to energy-related fields (catalytic, photoactive, and magnetic) and medical applications (bioactive, biosensing, and microbial resistance).

With growing emphasis on the concept of sustainable processes, the combination of thin film technology with sustainable practices has gained substantial interest in both the fabrication and the application aspect. This Special Issue on “Functional Thin Film and Plasma Electrolytic Oxidation” aims to present the current state of the art in the multi-disciplinary advancement of processes or tools to understand both the fundamentals of thin film formation and its subsequent applications.

For this Special Issue, original research articles and reviews are welcome. Research areas may include (but are not limited to) the following:

• Fundamental insights into the thin film fabrication process;
• Integration of thin film technology with sustainable green processes;
• Simulation techniques, software or other means for modelling and simulation in thin film applications;
• Thin film devices including innovative concepts for fabrication, processes and application in renewable energy sector;
• Medical applications of thin films.

Prof. Dr. Te-Wei Chiu
Dr. Wing Kiu Yeung
Prof. Dr. Chen Jui Liang
Dr. Subramanian Sakthinathan
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Processes is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

• sustainable process
• fabrication system
• plasma electrolytic oxidation 
• inorganic
• modelling
• analysis system