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Journal: MaterialsVolume: 16Number: 4077
Article: Atomic Layer Deposition of HfO2 Films Using TDMAH and Water or Ammonia Water
  • Authors:
  • Sylwia Gieraltowska *,
  • Lukasz Wachnicki and
  • Elzbieta Guziewicz
  • et al.
Link: https://www.mdpi.com/1996-1944/16/11/4077

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