Structural and Electrical Parameters of ZnO Thin Films Grown by ALD with either Water or Ozone as Oxygen Precursors
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Seweryn, A.; Pietruszka, R.; Witkowski, B.S.; Wierzbicka, A.; Jakiela, R.; Sybilski, P.; Godlewski, M. Structural and Electrical Parameters of ZnO Thin Films Grown by ALD with either Water or Ozone as Oxygen Precursors. Crystals 2019, 9, 554. https://doi.org/10.3390/cryst9110554
Seweryn A, Pietruszka R, Witkowski BS, Wierzbicka A, Jakiela R, Sybilski P, Godlewski M. Structural and Electrical Parameters of ZnO Thin Films Grown by ALD with either Water or Ozone as Oxygen Precursors. Crystals. 2019; 9(11):554. https://doi.org/10.3390/cryst9110554
Chicago/Turabian StyleSeweryn, Aleksandra, Rafal Pietruszka, Bartlomiej S. Witkowski, Aleksandra Wierzbicka, Rafal Jakiela, Piotr Sybilski, and Marek Godlewski. 2019. "Structural and Electrical Parameters of ZnO Thin Films Grown by ALD with either Water or Ozone as Oxygen Precursors" Crystals 9, no. 11: 554. https://doi.org/10.3390/cryst9110554
APA StyleSeweryn, A., Pietruszka, R., Witkowski, B. S., Wierzbicka, A., Jakiela, R., Sybilski, P., & Godlewski, M. (2019). Structural and Electrical Parameters of ZnO Thin Films Grown by ALD with either Water or Ozone as Oxygen Precursors. Crystals, 9(11), 554. https://doi.org/10.3390/cryst9110554