Electrochemical Deposition of Copper on Epitaxial Graphene

Round 1

Reviewer 1 Report

The manuscript reports the combined experimental and theoretical studies concerning the copper electrodeposition onto epitaxial graphene on 4H‐SiC.

In my opinion, the results are important and will be of significant interest to the wide audience of Applied Sciences.  The methods and conclusions are carefully described, along with references to related works. I see no objection to the publication of the work in its present form.

There are a few misprints to be corrected:

line 71: traceCu2+ -> space missing

line 146: [89,90].The -> space missing

line 206: missing unit of charge +0.601 ?

line 252: in Fig. 3 (c) Expetiment -> Experiment

line 296: electro reduced -> electro-reduced

Author Response

Dear Reviewer #1

We use the opportunity to thank the referee for the careful review of our paper and the valuable comments. We provide a new version of our manuscript which accounts for all advices and comments of the referee. We made all required changes.

Reviewer 2 Report

The manuscript by Shtepliuk et al. aims at understanding Cu electrochemical deposition over epitaxial graphene. This works reads very well and provides a comprehensive literature overview. Experience and related description provides a clear scientific storyline. 

I have only a few minor comments:

Make sure to use coherent units. See e.g. mV/s or mV*s-1. In Fig. 1, in addition to the colors of both curves I propose to change the format of e.g. black curve from solid to dash. This will facilitate reading and understanding of black and white print-outs.  Line 262, number 34 is a non-formated reference.  Line 275, unit for +0.29 is missing. 

Author Response

Dear Reviewer #2,

We use the opportunity to thank the referee for the careful review of our paper and the valuable comments. We provide a new version of our manuscript which accounts for all advices and comments of the referee. We have changed the Figure 1.