Yumoto, H.; Inubushi, Y.; Osaka, T.; Inoue, I.; Koyama, T.; Tono, K.; Yabashi, M.; Ohashi, H.
Nanofocusing Optics for an X-Ray Free-Electron Laser Generating an Extreme Intensity of 100 EW/cm2 Using Total Reflection Mirrors. Appl. Sci. 2020, 10, 2611.
https://doi.org/10.3390/app10072611
AMA Style
Yumoto H, Inubushi Y, Osaka T, Inoue I, Koyama T, Tono K, Yabashi M, Ohashi H.
Nanofocusing Optics for an X-Ray Free-Electron Laser Generating an Extreme Intensity of 100 EW/cm2 Using Total Reflection Mirrors. Applied Sciences. 2020; 10(7):2611.
https://doi.org/10.3390/app10072611
Chicago/Turabian Style
Yumoto, Hirokatsu, Yuichi Inubushi, Taito Osaka, Ichiro Inoue, Takahisa Koyama, Kensuke Tono, Makina Yabashi, and Haruhiko Ohashi.
2020. "Nanofocusing Optics for an X-Ray Free-Electron Laser Generating an Extreme Intensity of 100 EW/cm2 Using Total Reflection Mirrors" Applied Sciences 10, no. 7: 2611.
https://doi.org/10.3390/app10072611
APA Style
Yumoto, H., Inubushi, Y., Osaka, T., Inoue, I., Koyama, T., Tono, K., Yabashi, M., & Ohashi, H.
(2020). Nanofocusing Optics for an X-Ray Free-Electron Laser Generating an Extreme Intensity of 100 EW/cm2 Using Total Reflection Mirrors. Applied Sciences, 10(7), 2611.
https://doi.org/10.3390/app10072611