EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology
Abstract
:Featured Application
Abstract
1. Introduction
EUV-Induced Plasma and Its Relation to Photolithography
2. EUV-Induced Plasma
2.1. Observation of a Peculiar Phenomenon: EUV-Induced Plasma
2.2. Key Parameters of EUV-Induced Plasma
2.2.1. Electron Density
2.2.2. Electron Temperature
2.3. Recent Numerical Work on EUV-Induced Bulk Plasmas
2.4. Recent Experimental Work on EUV-Induced Bulk Plasmas
Microwave Cavity Resonance Spectroscopy (MCRS)
2.5. Dynamics of EUV-Induced Plasmas
2.5.1. Phase I: Plasma Creation by Photoionization and Electron Impact Ionization
Photoionization
Electron Impact Ionization
2.5.2. Phase II: Strong Decrease of
2.5.3. Phase III: Exponential Decay of ne
2.6. Scaling Laws
- Influence of EUV spectrum
- Gas pressure scaling
- Pulse energy scaling
- Source repetition rate scaling
- Different gases
3. Bulk Materials Facing EUV Photon Induced Plasma
3.1. Observation of Cleaning and Degradation of Exposed Surfaces
3.2. Ionic Particle Fluxes
3.3. Identification of Reaction Mechanisms
3.3.1. Carbon Removal
3.3.2. Multilayer Delamination
4. Discussion, Conclusions, and Outlook
- Radical production
- Gas admixtures (e.g., N2)
- Interaction with nano- to micrometer sized particles
Funding
Conflicts of Interest
References
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Beckers, J.; van de Ven, T.; van der Horst, R.; Astakhov, D.; Banine, V. EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology. Appl. Sci. 2019, 9, 2827. https://doi.org/10.3390/app9142827
Beckers J, van de Ven T, van der Horst R, Astakhov D, Banine V. EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology. Applied Sciences. 2019; 9(14):2827. https://doi.org/10.3390/app9142827
Chicago/Turabian StyleBeckers, Job, Tijn van de Ven, Ruud van der Horst, Dmitry Astakhov, and Vadim Banine. 2019. "EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology" Applied Sciences 9, no. 14: 2827. https://doi.org/10.3390/app9142827