High-Quality Single Crystalline Sc0.37Al0.63N Thin Films Enabled by Precise Tuning of III/N Atomic Flux Ratio during Molecular Beam Epitaxy
Abstract
:1. Introduction
2. Experimental Details
3. Results and Discussion
3.1. Effect of III/N Atomic Flux Ratio on Sc0.18Al0.82N Growth
3.2. Characterization of Sc Composition and Crystal Quality of ScxAl1−xN Films
3.3. High Sc-Content ScxAl1−xN Films and Phase Separation
4. Conclusions
Supplementary Materials
Author Contributions
Funding
Data Availability Statement
Acknowledgments
Conflicts of Interest
References
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Yin, Y.; Liu, R.; Zhao, H.; Fan, S.; Zhang, J.; Li, S.; Sun, Q.; Yang, H. High-Quality Single Crystalline Sc0.37Al0.63N Thin Films Enabled by Precise Tuning of III/N Atomic Flux Ratio during Molecular Beam Epitaxy. Nanomaterials 2024, 14, 1459. https://doi.org/10.3390/nano14171459
Yin Y, Liu R, Zhao H, Fan S, Zhang J, Li S, Sun Q, Yang H. High-Quality Single Crystalline Sc0.37Al0.63N Thin Films Enabled by Precise Tuning of III/N Atomic Flux Ratio during Molecular Beam Epitaxy. Nanomaterials. 2024; 14(17):1459. https://doi.org/10.3390/nano14171459
Chicago/Turabian StyleYin, Yuhao, Rong Liu, Haiyang Zhao, Shizhao Fan, Jianming Zhang, Shun Li, Qian Sun, and Hui Yang. 2024. "High-Quality Single Crystalline Sc0.37Al0.63N Thin Films Enabled by Precise Tuning of III/N Atomic Flux Ratio during Molecular Beam Epitaxy" Nanomaterials 14, no. 17: 1459. https://doi.org/10.3390/nano14171459