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Journal: Coatings, 2019
Volume: 9
Number: 442

Article: RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate
Authors: by Octavian-Gabriel Simionescu, Cosmin Romanițan, Oana Tutunaru, Valentin Ion, Octavian Buiu and Andrei Avram
Link: https://www.mdpi.com/2079-6412/9/7/442

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