Lin, S.-H.; Chang, Y.-H.; Huang, Y.-J.; Chen, Y.-T.; Dong, S.-H.
Annealing Temperature Effect on the Properties of CoCe Thin Films Prepared by Magnetron Sputtering at Si(100) and Glass Substrates. Processes 2024, 12, 2806.
https://doi.org/10.3390/pr12122806
AMA Style
Lin S-H, Chang Y-H, Huang Y-J, Chen Y-T, Dong S-H.
Annealing Temperature Effect on the Properties of CoCe Thin Films Prepared by Magnetron Sputtering at Si(100) and Glass Substrates. Processes. 2024; 12(12):2806.
https://doi.org/10.3390/pr12122806
Chicago/Turabian Style
Lin, Shih-Hung, Yung-Huang Chang, Yu-Jie Huang, Yuan-Tsung Chen, and Shu-Huan Dong.
2024. "Annealing Temperature Effect on the Properties of CoCe Thin Films Prepared by Magnetron Sputtering at Si(100) and Glass Substrates" Processes 12, no. 12: 2806.
https://doi.org/10.3390/pr12122806
APA Style
Lin, S.-H., Chang, Y.-H., Huang, Y.-J., Chen, Y.-T., & Dong, S.-H.
(2024). Annealing Temperature Effect on the Properties of CoCe Thin Films Prepared by Magnetron Sputtering at Si(100) and Glass Substrates. Processes, 12(12), 2806.
https://doi.org/10.3390/pr12122806