Dynamic Polarization Patterning Technique for High-Quality Liquid Crystal Planar Optics
and Linsen Chen 1,2Round 1
Reviewer 1 Report
Comments and Suggestions for AuthorsThe comments are in the pdf file.
Comments for author File: 
Comments.pdf
Author Response
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Author Response File: Author Response.pdf
Reviewer 2 Report
Comments and Suggestions for AuthorsThis study introduces the implementation of a planar lens utilizing liquid crystals and presents a novel technique for device fabrication known as dynamic polarization pattern exposure. It is asserted that the splicing error in this method falls within the range of 100-200 nanometers, indicating exceptional precision. To establish the efficacy of this process and technology, the following additions are necessary:
* Provide a quantitative comparison of the performance of lenses produced with this technology against results from previous studies.
* Demonstrate the relationship between lens performance and the degree of splicing error.
* Offer a tabular comparison of splicing error levels among various processing methods.
* Clearly identify the magnified section in Figure 4.
* Present a comprehensive depiction of the entire lens array structure in Figure 7, highlighting the enlarged portions.
* Compare the performance of the theoretical lens structure with the actual constructed lens.
Comments on the Quality of English LanguageI don't have a strong opinion
Author Response
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Author Response File: Author Response.pdf
Reviewer 3 Report
Comments and Suggestions for AuthorsThe production of high-quality liquid crystal photonic devices is a hot topic. Based on experimental reports, the author proposes a dynamic patterning polarization exposure method to effectively reduce splicing errors in the production of high-quality liquid crystal optical devices. And experiment in lab was used to validate the method. The improvement is indeed reasonable and worth publishing. However, there are some changes required before the manuscript can be considered for publication.
1) In the manuscript, how is the theoretical value of the edge band of the lens produced calculated?
2) In Figure 5 (c) and Figure 8 (b), what are the units for the X-axis and Y-axis?
3) In Figures 5 (d) -5 (e) and Figures 8 (c) - (d), how are the X-axis and Y-axis data obtained?
4) In lab experiment, why is it not necessary to magnify the focusing spot when performing optical characterization on a single lens in the lens array?
Author Response
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Author Response File: Author Response.pdf
Reviewer 4 Report
Comments and Suggestions for AuthorsThe authors have developed a novel method aimed at improving the quality and accuracy of arbitrary polarization patterning. This method essentially combines DMD-based and laser direct writing patterning techniques. Through experimentation, the feasibility of the proposed method has been demonstrated. I recommend the manuscript for publication. However, I have a few questions and suggestions:
1. It is suggested to quantify the percentage of improvement in splicing error achieved by the proposed method compared to traditional direct writing patterning. This addition will enhance the significance of the authors' work.
2. Is there any potential tradeoff between the resolution and size of the pattern arising from the utilization of DMD technology?
3. Please print the measure scale on the legend of Fig. 6.
Author Response
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Author Response File: Author Response.pdf
Round 2
Reviewer 1 Report
Comments and Suggestions for AuthorsAuthors have responded all my comments.
