The Influence of Annealing Temperature on the Microstructure and Electrical Properties of Sputtered ZnO Thin Films
Abstract
:1. Introduction
2. Results and Discussion
2.1. Surface Morphology
2.1.1. Atomic Force Microscopy (AFM) Analysis
2.1.2. Scanning Electron Microscopy (SEM) Analysis
2.2. Structural Analysis
2.3. Electrical Properties
3. Conclusions
4. Experimental
4.1. Films Deposition
4.1.1. Substrate Preparation
4.1.2. Sputtering System and Film Deposition Process
4.2. Characterization Tools
Funding
Data Availability Statement
Conflicts of Interest
References
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S. No. | Thin Film | Average Particle Size |
---|---|---|
1 | As deposited | 74.41 ± 1.75 nm |
2 | 100 °C | 78.08 ± 1.83 nm |
3 | 200 °C | 66.85 ± 1.62 nm |
4 | 300 °C | 54.46 ± 1.23 nm |
5 | 400 °C | 50.67 ± 1.02 nm |
6 | 500 °C | 163.00 ± 2.51 nm |
S. No. | Thin Film | Electrical Conductivity (S/m) | Electrical Resistivity (Ω.m) |
---|---|---|---|
1 | As deposited | 0.0095 | 105 |
2 | 100 °C | 4.637 | 0.2157 |
3 | 200 °C | 7.292 | 0.1371 |
4 | 300 °C | 9.49 | 0.105 |
5 | 400 °C | 18.79 | 0.05321 |
6 | 500 °C | 0.187 | 5.348 |
Deposition Parameters | ZnO | Zn | ZnO | |
---|---|---|---|---|
Pressure (mTorr) | 25 | 50 | 50 | |
Power (Watt) | 300 | 300 | 300 | |
Thickness | 1.5 µm | 30 nm | 75 nm | |
Annealing Temperature (°C) | ||||
100 | 200 | 300 | 400 | 500 |
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Alshoaibi, A. The Influence of Annealing Temperature on the Microstructure and Electrical Properties of Sputtered ZnO Thin Films. Inorganics 2024, 12, 236. https://doi.org/10.3390/inorganics12090236
Alshoaibi A. The Influence of Annealing Temperature on the Microstructure and Electrical Properties of Sputtered ZnO Thin Films. Inorganics. 2024; 12(9):236. https://doi.org/10.3390/inorganics12090236
Chicago/Turabian StyleAlshoaibi, Adil. 2024. "The Influence of Annealing Temperature on the Microstructure and Electrical Properties of Sputtered ZnO Thin Films" Inorganics 12, no. 9: 236. https://doi.org/10.3390/inorganics12090236