Plasma Physics: Theory, Methods and Applications

A special issue of Applied Sciences (ISSN 2076-3417). This special issue belongs to the section "Applied Physics General".

Deadline for manuscript submissions: 20 September 2024 | Viewed by 1312

Special Issue Editor


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Guest Editor
School of Physics, Dalian University of Technology, Dalian 116024, China
Interests: to investigate the plasma with the simulation, experiment and theory

Special Issue Information

Dear Colleagues,

Plasma is the fourth type of mass, besides solid, liquid, and gas. It is composed of a mixture of electrons, anions, cations, neutrals, photons, etc. Electromagnetic interactions exists among plasma, e.g., the ambi-polar diffusion potential, which leads to quasi-neutral plasma. This is a weak coupling interaction. In addition, plasma has the ability to shield any charge inserted into it, i.e., the famous Debye’s shielding, which embodies the collective interaction of plasma. Moreover, when the translational speed of certain plasma species exceeds over Bolm’s velocity, the electrical neutrality is broken, and the net charge evolves self-consistently from plasma, giving the double layer, soliton, shock, and sheath structure. This is the nonlinear behavior of plasma which forms due to the strong coupling interaction.

There are two types of plasma: gaseous discharge plasma in the laboratory and astrophysics plasma in cosmic space. Many methods can be used to generate discharging plasma, e.g., direct current power source, radio frequency power source, pulse power source, hollow cathode structure, glow or arc, micro-discharge, atmospheric or low pressure, plasma jet and torch filament, dielectric barrier discharge, etc. The generated plasma is either in thermal and chemical equilibrium or not. The plasma of thermal and chemical equilibrium, i.e., arc plasma, has a high entropy value and can be used in chemical synthesis. The plasma of non-thermal and chemical equilibrium, i.e., glow plasma, has low dielectric damage and can be used as film in the deposition and etching process. Most laboratory plasmas of gaseous discharge are low-temperature plasma, except for nuclear fusion plasma. Nuclear fusion can be achieved by two means, i.e., magnetic confinement and inertial confinement, and, hence, the plasma formed is called high-temperature plasma (100 million degree Celsius). Cosmic plasma pays attention to the double layer nonlinear structure and wave dynamics of plasma and its coupling to the magnetic field.         

This Special Issue related to plasma physics is focused on the theory, method, and application of plasma. Therefore, we welcome the submission of any type of works that report on the generation of laboratory plasma, the investigation of its property by means of numerical simulation and experimental diagnostics, and the application of plasma, including both low-temperature and high-temperature plasmas. Moreover, this Special Issue is also suited for the submission of works that attempt to build relations between laboratory plasma and astrophysics plasma.

Dr. Shuxia Zhao
Guest Editor

Manuscript Submission Information

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Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Applied Sciences is an international peer-reviewed open access semimonthly journal published by MDPI.

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Keywords

  • low-temperature plasma
  • thermal nuclear fusion plasma
  • film deposition and etching process
  • numerical simulation and experimental diagnostic
  • astrophysics plasma
  • thermal and chemical equilibrium

Published Papers (2 papers)

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Research

27 pages, 9989 KiB  
Article
Numerical Analysis of the Breakdown Process of CF3I at Low Pressure
by Yifan Wu, Zhijiang Wang, Hao Wu and Wei Jiang
Appl. Sci. 2024, 14(13), 5554; https://doi.org/10.3390/app14135554 - 26 Jun 2024
Viewed by 683
Abstract
The breakdown of CF3I gas at low pressure is of significant importance for applications in fields such as aerospace and microelectronics. However, the DC low-pressure breakdown characteristics of CF3I remain underexplored. In this work, we utilize a one-dimensional implicit [...] Read more.
The breakdown of CF3I gas at low pressure is of significant importance for applications in fields such as aerospace and microelectronics. However, the DC low-pressure breakdown characteristics of CF3I remain underexplored. In this work, we utilize a one-dimensional implicit particle-in-cell/Monte Carlo collision (PIC/MCC) algorithm to investigate the complete DC breakdown process of low-pressure CF3I. Our model accounts for ion–molecule collisions, recombination reactions, and external circuit influences. The breakdown process is delineated into three stages: before breakdown, breakdown, and after breakdown. In the before-breakdown stage, both the density and energy of particles are low. In the breakdown stage, the rapid increase in electron density and energy accelerates ionization reactions, leading to successful breakdown. The circuit behavior transitions from capacitive to resistive, sharing voltage with the external resistance. In the after-breakdown stage, continued positive ion growth leads to the formation of a thin anode sheath and a negative plasma potential. Energy production, including heating power and secondary electron emission (SEE) power, balances with energy loss through collision and boundary absorption. Specifically, 62% of the total heating power comes from positive ions, 1.5% from negative ions, and approximately 85% of electron energy is lost via boundary absorption. Finally, we compare the Paschen curves of CF3I with those of SF6, providing insights that are beneficial for the application of CF3I as an SF6 alternative. Full article
(This article belongs to the Special Issue Plasma Physics: Theory, Methods and Applications)
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15 pages, 2099 KiB  
Article
X-ray Line-Intensity Ratios in Neon-like Xenon: Significantly Reducing the Discrepancy between Measurements and Simulations
by Shihan Huang, Zhiming Tang, Yang Yang, Hongming Zhang, Ziqiang Tian, Shaokun Ma, Jinyu Li, Chao Zeng, Huajian Ji, Ke Yao and Yaming Zou
Appl. Sci. 2024, 14(11), 4381; https://doi.org/10.3390/app14114381 - 22 May 2024
Viewed by 416
Abstract
The X-ray spectra of L-shell transitions in Neon-like Xenon ion (Xe44+) have been precisely measured at the Shanghai Electron-Beam Ion Trap using a high-resolution crystal spectrometer. Focusing on the line-intensity ratio of the 3F {2p6-(2p51/23s1/2 [...] Read more.
The X-ray spectra of L-shell transitions in Neon-like Xenon ion (Xe44+) have been precisely measured at the Shanghai Electron-Beam Ion Trap using a high-resolution crystal spectrometer. Focusing on the line-intensity ratio of the 3F {2p6-(2p51/23s1/2)J=1} and 3D {2p6-(2p53/23d5/2)J=1} lines (3F/3D), our measurements have achieved remarkable precision improvements over the previous studies. These spectra have been simulated using the collisional-radiative model (CRM) within the Flexible Atomic Code, showing good agreement with the measurements. The previously reported discrepancies, approximately ranging from 10% to 20%, have been significantly reduced in this work to below 1.4% for electron-beam energies exceeding 6 keV and to around 7% for lower energies. Furthermore, our analysis of population fluxes of the involved levels reveals a very high sensitivity of the 3F line to radiation cascades. This suggests that the current CRM, which conventionally excludes interionic population transfer processes, may underestimate the population of the upper level of the 3F line and the cascade-related higher levels, thus explaining the remaining discrepancies. These findings provide a solid foundation for further minimizing these discrepancies and are crucial for understanding the atomic structure and plasma model of these ions. Full article
(This article belongs to the Special Issue Plasma Physics: Theory, Methods and Applications)
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