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Production and Characterization of Thin Hard Coatings

A special issue of Applied Sciences (ISSN 2076-3417). This special issue belongs to the section "Chemical and Molecular Sciences".

Deadline for manuscript submissions: closed (20 November 2021) | Viewed by 2472

Special Issue Editor


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Guest Editor
Assistant Professor, Department of Mechanical Engineering, University of Western Macedonia, 50100 Kozani, Greece
Interests: manufacturing technology; mechanical properties characterization; fatigue analysis; design and process analysis by finite elements method (FEM); stress-corrosion cracking; ultrafine polishing techniques; thin hard coating production methods; cutting performance optimization; application of coatings on cutting tools; nano-indentation technology; life-cycle assessment of materials and processes; design and development of cutting tools

Special Issue Information

Dear Colleagues,

“Thin-film technology is simultaneously one of the oldest arts and one of the newest sciences”*

Involvement with thin films dates to the metal ages of antiquity, when the ancient craftsmen were creating gold leaf of extraordinary thinness. Moreover, gold’s resistance to chemical degradation earmarked its use for durable ornamentation and protection purposes, generating the first gold-plated coatings.

However, the wider use of coatings, in applications beyond jewelry craftmanship, came much later. It was only in the twentieth century when the massive increase in our understanding of the fundamental nature of materials led to the development of materials science. This period witnessed the emergence of new roles for metals and ceramics, and the development of reliable methods to process them in thin films. The tooling industry is one of the industries that experienced great advancement due to the beneficial impact of coatings on material properties.

In recent years, the cutting performance of coated tools has been significantly improved by tailoring the coatings’ properties to application-specific requirements. To achieve this, optimized coating deposition processes have been developed alongside inspection techniques which guarantee the effectiveness of these methods.

This Special Issue focuses on but is not limited to:

Recent advances in the manufacture of coatings produced by plasma spraying, vapor deposition, and electrodeposition processes.

Contributions that highlight the recent advances in analytical methods, characterization techniques, and novel nano-mechanical testing methods for coating evaluation.

Analytical methods, including numerical evaluation and quantification procedures, to reveal the structure, chemical composition, residual stress, chemical states, and phases of coatings.

Micro- and nanomechanical methods including compression, bending, or toughness testing to determine coating behavior, particularly at room and elevated temperatures, and the relationship to coating performance and lifetime.

*Milton Ohring: The Materials Science of Thin Films

Dr. Stefanos Gerardis
Guest Editor

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Published Papers (1 paper)

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Research

12 pages, 6995 KiB  
Article
Activation of Zr, ZrVHf and TiZrV Non-Evaporative Getters Characterized by In Situ Synchrotron Radiation Photoemission Spectroscopy
by Yuchen Yang, Yongsheng Ma, Jia’ou Wang, Tao Huang, Baiqi Liu, Fei Sun, Xujian Wang, Shuangkai Chen, Zilin Chen, Xiaohua Peng, Haiyi Dong and Ping He
Appl. Sci. 2021, 11(11), 4844; https://doi.org/10.3390/app11114844 - 25 May 2021
Cited by 5 | Viewed by 1961
Abstract
The activation process of Zr, ZrVHf and TiZrV non-evaporative getter (NEG) thin films, prepared by direct current magnetron sputtering, is investigated by in situ synchrotron radiation photoemission spectroscopy. The activation temperatures of Zr and ZrVHf films are found to be 300 °C and [...] Read more.
The activation process of Zr, ZrVHf and TiZrV non-evaporative getter (NEG) thin films, prepared by direct current magnetron sputtering, is investigated by in situ synchrotron radiation photoemission spectroscopy. The activation temperatures of Zr and ZrVHf films are found to be 300 °C and 200 °C, respectively, and the activation temperature of TiZrV film is 120 °C—the lowest activation temperature reported on TiZrV. As the heating temperature increases, the transformation of metal-C bond follows the orders of V–C, Ti–C, Zr–C, Hf–C. It is found that the order of reduction difficulty of the same element oxides, that is, Zr oxide and V oxide in different films follows Zr film > ZrVHf film > TiZrV film. The order of difficulty in the reduction of oxides in the same alloy NEG films follows HfO2 > ZrO2 > TiO2 > V2O5. We propose that the above phenomena can be explained by interstitial diffusion, grain boundary diffusion of residual gas atoms and grain boundary precipitation of V and Ti in the solid solution of the NEG films. Full article
(This article belongs to the Special Issue Production and Characterization of Thin Hard Coatings)
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