New Advances in Semiconductor Devices/Circuits

A special issue of Electronics (ISSN 2079-9292). This special issue belongs to the section "Semiconductor Devices".

Deadline for manuscript submissions: 15 November 2024 | Viewed by 715

Special Issue Editor


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Guest Editor
1. ATV Automatisierung Technik Voigt, Heilbronner Str.17, 01089 Dresden, Germany
2. MPI Corporation, Advanced Semiconductor Test Division, Chungho St. 155, Chupei, Hsinchu 302, Taiwan
Interests: vector network analyzer calibration; automated measurement systems; high-frequency noise; harmonic distortion; low-frequency noise; vectorial and passive load pull characterization of on-wafer SiGe and AIIIBV HBTs, CMOS; HEMTs and emerging technology devices (CNTs, graphene FETs); characterization of MMICs, particularly LNA, PA, mixers, frequency multipliers and other circuits
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Special Issue Information

Dear Colleagues,

Recent advances in SiGe- and InP-based HBT technology have enabled the realization of monolithic microwave-integrated circuits (MMICs) including, for example, LNA, power amplifiers (PAs), MMIC receiver front-end devices, oscillators, and frequency multipliers. Based on InP HBT, a MMIC PA operating at G-band and yielding a 8.9dB gain and 90mW output power was realized. SiGe and InP HBTs are among the fastest transistors available today. For example, a 130 nm SiGe HBT with a collector–emitter breakdown voltage of BVCE0 = 3.5V exhibits a maximum transit and oscillation frequency of fT/fmax = 505/720 GHz, and a 250 nm InP HBT features a frequency of fT/fmax = 380/450GHz, a minimum noise figure of (NFmin) = 1.5/2.5dB at 1/50GHz and a PAE = 35%. Extremely scaled InP HBTs with a 12.5 nm base width are able to yield a record fT = 765 GHz, with a reasonable BVCE0 = 1.65V. SiGe HBT also features a low NFmin = 0.5/1.5dB at 1/50 GHz, good cryogenic performance, excellent reliability and radiation hardness, a low dc power consumption and a high PAE.

This Special Issue welcomes research papers that describe recent advances in semiconductor devices and circuits, not only limited to InP and SiGe HBTs, but also addressing advanced CMOS and AIIIBV. The scope of this Special Issue includes, but is not limited, to the following topics:

(1) High-frequency power amplifiers, LNAs, frequency multipliers, noise sources.

(2) Frequency multipliers.

(3) THz detection.

(4) High-frequency noise in advanced semiconductor devices.

(5) Harmonic distortion, load pull, device linearization.

(6) Advanced-technology semiconductor devices.

(7) Compact modeling.

Dr. Paulius Sakalas
Guest Editor

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Keywords

  • SiGe HBTs
  • InP DHBTs
  • fT
  • fmax scaled CMOS
  • GaN HEMT
  • high frequency circuits
  • power amplifier
  • low noise amplifier
  • noise parameters
  • harmonic distortion
  • linearity
  • THz detection

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Published Papers (1 paper)

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Research

15 pages, 7408 KiB  
Article
Schottky Barrier Formation Mechanism and Thermal Stability in Au-Free Cu/Metal–Silicide Contacts to GaN-Cap/AlGaN/AlN-Spacer/GaN-on-Si Heterostructure
by Marek Wzorek, Marek Ekielski, Krzysztof Piskorski, Jarosław Tarenko, Michał A. Borysiewicz, Ernest Brzozowski and Andrzej Taube
Electronics 2024, 13(17), 3429; https://doi.org/10.3390/electronics13173429 - 29 Aug 2024
Viewed by 385
Abstract
In this study, metal–silicide-based contacts to GaN-cap/AlGaN/AlN-spacer/GaN-on-Si heterostructure were investigated. Planar Schottky diodes with Cu-covered anodes comprising silicide layers of various metal–silicon (M–Si) compositions were fabricated and characterized in terms of their electrical parameters and thermal stability. The investigated contacts included Ti–Si, Ta–Si, [...] Read more.
In this study, metal–silicide-based contacts to GaN-cap/AlGaN/AlN-spacer/GaN-on-Si heterostructure were investigated. Planar Schottky diodes with Cu-covered anodes comprising silicide layers of various metal–silicon (M–Si) compositions were fabricated and characterized in terms of their electrical parameters and thermal stability. The investigated contacts included Ti–Si, Ta–Si, Co–Si, Ni–Si, Pd–Si, Ir–Si, and Pt–Si layers. Reference diodes with pure Cu or Au/Ni anodes were also examined. To test the thermal stability, selected devices were subjected to subsequent annealing steps in vacuum at incremental temperatures up to 900 °C. The Cu/M–Si anodes showed significantly better thermal stability than the single-layer Cu contact, and in most cases exceeded the stability of the reference Au/Ni contact. The work functions of the sputtered thin layers were determined to support the discussion of the formation mechanism of the Schottky barrier. It was concluded that the barrier heights were dependent on the M–Si composition, although they were not dependent on the work function of the layers. An extended, unified Schottky barrier formation model served as the basis for explaining the complex electrical behavior of the devices under investigation. Full article
(This article belongs to the Special Issue New Advances in Semiconductor Devices/Circuits)
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