Micro/Nano Manufacturing of Electronic Devices

A special issue of Micromachines (ISSN 2072-666X). This special issue belongs to the section "D:Materials and Processing".

Deadline for manuscript submissions: 31 March 2025 | Viewed by 865

Special Issue Editors


E-Mail Website
Guest Editor Assistant
School of Electronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
Interests: sealing of microwave devices; brazing; interfacial behavior regulation; microstructure

E-Mail Website
Guest Editor
Zhengzhou Research Institute, Harbin Institute of Technology, Zhengzhou 450000, China
Interests: dissimilar material welding; laser micro-welding; laser beam control; Interfacial reaction; mechanical properties

E-Mail Website
Guest Editor
School of Electronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
Interests: vacuum electronic devices; passive pulse compressor; microwave biosensor; dielectric microwave measurement
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

As the demand for more sophisticated and miniaturized electronic devices accelerates, micro/nano manufacturing technologies are playing a pivotal role in shaping the future of electronic components. This Special Issue aims to spotlight the latest advancements in micro/nano-scale processes, containing micro-joining, laser micromachining, etc., and their applications in electronic devices. These technologies are integral to modern electronic manufacturing, driving innovations that enhance device performance, reliability, and integration.

We invite researchers and engineers to contribute original research articles and comprehensive reviews that explore the following areas, among others: advancements in soldering techniques and materials, laser micromachining technologies, and the development of micro/nanostructures for surface and interface engineering. Contributions that address modeling, simulation, reliability assessments, and manufacturing tools in these domains are also highly encouraged.

This Special Issue seeks to provide a platform for sharing breakthroughs and fostering collaboration in the intersection of micro/nano manufacturing of electronic device fabrication, advancing both fundamental understanding and practical applications in this rapidly evolving field.

Dr. Haoyue Li
Prof. Dr. Guo Liu
Guest Editors

Dr. Qianqian Chen
Guest Editor Assistant

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Micromachines is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2100 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • micromachining of vacuum electronic devices
  • interface engineering of sensors
  • microelectronics assembly
  • micro/nano-scale processes
  • micro-joining
  • laser micromachining
  • emerging microfabrication technologies
  • micro/nanostructures for surface and interface engineering
  • reliability assessment

Benefits of Publishing in a Special Issue

  • Ease of navigation: Grouping papers by topic helps scholars navigate broad scope journals more efficiently.
  • Greater discoverability: Special Issues support the reach and impact of scientific research. Articles in Special Issues are more discoverable and cited more frequently.
  • Expansion of research network: Special Issues facilitate connections among authors, fostering scientific collaborations.
  • External promotion: Articles in Special Issues are often promoted through the journal's social media, increasing their visibility.
  • e-Book format: Special Issues with more than 10 articles can be published as dedicated e-books, ensuring wide and rapid dissemination.

Further information on MDPI's Special Issue polices can be found here.

Published Papers (1 paper)

Order results
Result details
Select all
Export citation of selected articles as:

Research

13 pages, 8604 KiB  
Article
Low-Temperature Bonding for Heterogeneous Integration of Silicon Chips with Nanocrystalline Diamond Films
by Jicun Lu, Xiaochun Lv, Chenghao Zhang, Chuting Zhang and Yang Liu
Micromachines 2024, 15(12), 1436; https://doi.org/10.3390/mi15121436 - 28 Nov 2024
Viewed by 631
Abstract
Integrating nanocrystalline diamond (NCD) films on silicon chips has great practical significance and many potential applications, including high-power electronic devices, microelectromechanical systems, optoelectronic devices, and biosensors. In this study, we provide a solution for ensuring heterogeneous interface integration between silicon (Si) chips and [...] Read more.
Integrating nanocrystalline diamond (NCD) films on silicon chips has great practical significance and many potential applications, including high-power electronic devices, microelectromechanical systems, optoelectronic devices, and biosensors. In this study, we provide a solution for ensuring heterogeneous interface integration between silicon (Si) chips and NCD films using low-temperature bonding technology. This paper details the design and implementation of a magnetron sputtering layer on an NCD surface, as well as the materials and process for the connection layer of the integrated interface. The obtained NCD/Ti/Cu composite layer shows uniform island-like Cu nanostructures with 100~200 nm diameters, which could promote bonding between NCD and Si chips. Ultimately, a heterogeneous interface preparation of Si/Ag/Cu/Ti/NCD was achieved, with the integration temperature not exceeding 250 °C. The TEM analysis shows the closely packed atomic interface of the Cu NPs and deposited Ti/Cu layers, revealing the bonding mechanism. Full article
(This article belongs to the Special Issue Micro/Nano Manufacturing of Electronic Devices)
Show Figures

Figure 1

Back to TopTop