Functional Probes for Scanning Probe Microscopy

A special issue of Micromachines (ISSN 2072-666X). This special issue belongs to the section "A:Physics".

Deadline for manuscript submissions: closed (28 February 2022) | Viewed by 4434

Special Issue Editor


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Guest Editor
Kavli Institute at Cornell, Cornell University, Ithaca, NY 14853, USA
Interests: superconductivity; scanning probe microscopy; quantum materials; 2D materials; nanomaterials; borophene

Special Issue Information

Dear Colleagues,

Scanning probe microscopy is one of the most powerful yet versatile experimental techniques offering unparalleled resolution and precision. Modern functional probes, broadly defined, drastically broaden the functionality of conventional scanning probe microscopes for characterization (e.g., physical properties, chemical identities), manipulation (e.g., creation of artificial structures), and fabrication (e.g., nanolithography) at length scales ranging from single atoms to macroscopic wafers. Such advances are made possible, for example, by the maturity of nanofabrication technologies (e.g., smart and nanostructured probes, MEMS probes), the integration of existing scanning probes with additional excitations (e.g., laser, X-ray, microwave, and mechanical excitations), functional modifications of probes (e.g., chemical decoration, superconducting probes), and the implementation of entirely new probes (e.g., the miniaturization and integration of existing technologies to a scanning probe). Accordingly, this Special Issue seeks to showcase research papers, communications, and review articles that focus on technological developments that expand the capabilities of conventional scanning probe microscopy by designing novel probes and measurement techniques, as well as applications of such unconventional scanning probe microscopy in physics, chemistry, materials science, and biology.

Dr. Xiaolong Liu
Guest Editor

Manuscript Submission Information

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Keywords

  • scanning probe microscopy
  • smart tips
  • functional probes
  • nanofabrication
  • excitation
  • characterization
  • manipulation
  • fabrication
  • lithography
  • functionalization

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Published Papers (2 papers)

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Research

16 pages, 4132 KiB  
Article
Calculation and AFM Experimental Research on Slip Friction for Unlubricated Spherical Contact with Roughness Effect
by Shengguang Zhu and Liyong Ni
Micromachines 2021, 12(11), 1428; https://doi.org/10.3390/mi12111428 - 21 Nov 2021
Cited by 1 | Viewed by 1800
Abstract
Previous research on friction calculation models has mainly focused on static friction, whereas sliding friction calculation models are rarely reported. In this paper, a novel sliding friction model for realizing a dry spherical flat contact with a roughness effect at the micro/nano scale [...] Read more.
Previous research on friction calculation models has mainly focused on static friction, whereas sliding friction calculation models are rarely reported. In this paper, a novel sliding friction model for realizing a dry spherical flat contact with a roughness effect at the micro/nano scale is proposed. This model yields the sliding friction by the change in the periodic substrate potential, adopts the basic assumptions of the Greenwood–Williamson random contact model about asperities, and assumes that the contact area between a rigid sphere and a nominal rough flat satisfies the condition of interfacial friction. It subsequently employs a statistical method to determine the total sliding friction force, and finally, the feasibility of this model presented is verified by atomic force microscopy friction experiments. The comparison results show that the deviations of the sliding friction force and coefficient between the theoretical calculated values and the experimental values are in a relatively acceptable range for the samples with a small plasticity index (Ψ1). Full article
(This article belongs to the Special Issue Functional Probes for Scanning Probe Microscopy)
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14 pages, 51434 KiB  
Article
Improving the Performance of the ToGoFET Probe: Advances in Design, Fabrication, and Signal Processing
by Hoontaek Lee, Junsoo Kim, Kumjae Shin and Wonkyu Moon
Micromachines 2021, 12(11), 1303; https://doi.org/10.3390/mi12111303 - 23 Oct 2021
Viewed by 1820
Abstract
We report recent improvements of the tip-on-gate of field-effect-transistor (ToGoFET) probe used for capacitive measurement. Probe structure, fabrication, and signal processing were modified. The inbuilt metal-oxide-semiconductor field-effect-transistor (MOSFET) was redesigned to ensure reliable probe operation. Fabrication was based on the standard complementary metal-oxide-semiconductor [...] Read more.
We report recent improvements of the tip-on-gate of field-effect-transistor (ToGoFET) probe used for capacitive measurement. Probe structure, fabrication, and signal processing were modified. The inbuilt metal-oxide-semiconductor field-effect-transistor (MOSFET) was redesigned to ensure reliable probe operation. Fabrication was based on the standard complementary metal-oxide-semiconductor (CMOS) process, and trench formation and the channel definition were modified. Demodulation of the amplitude-modulated drain current was varied, enhancing the signal-to-noise ratio. The I-V characteristics of the inbuilt MOSFET reflect the design and fabrication modifications, and measurement of a buried electrode revealed improved ToGoFET imaging performance. The minimum measurable value was enhanced 20-fold. Full article
(This article belongs to the Special Issue Functional Probes for Scanning Probe Microscopy)
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