15 Years of SU8 as MEMS Material

Dear Colleagues,

Interest in the use of SU8 as MEMS material was first expressed in 1997; since then SU8 has significantly contributed to the development of a large array of microsystems. First used as a negative photoresist, the high aspect ratio components that were quickly obtained, and the possibility to easily pattern multilevel structures, made it a polymer of choice for the UV-LIGA process, and led to its early adoption in industrial applications. In the last 15 years, SU8 has been largely used in academic research for a large range of applications: structural components, optical waveguides, micro-channels for microfluidic and lab-on-chip applications, micro-mixers, cell-chips, bio-related applications, etc. In addition to UV-photolithography, many other micro-patterning methods have been used to process SU8, such as electron-beam lithography, laser ablation, thermal and UV nano-imprinting, inkjet printing, molding, etc. Composite materials based on SU8 have also been developed by the addition of a wide variety of fillers such as nanoparticles, carbon nanotubes, carbon black, ceramic powders, and many others.

This Special Issue aims to highlight the current state of the art in the use of SU8 for microtechnology. We invite contributions on all aspects related to SU8, including its processing techniques, its use in new composite resists, its academic and industrial developments, its use for manufacturing systems in optics, biology, medicine, chemistry, mechanics, fluidics, etc.

We are looking forward to receiving your contributions.

Prof. Dr. Philippe Renaud
Dr. Arnaud Bertsch
Guest Editors

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