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Nanomaterials
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Trends and Prospects in Nanoscale Thin Films and Coatings
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Trends and Prospects in Nanoscale Thin Films and Coatings

A special issue of Nanomaterials (ISSN 2079-4991). This special issue belongs to the section "Synthesis, Interfaces and Nanostructures".

Deadline for manuscript submissions: 25 May 2025 | Viewed by 7525

Special Issue Editor

Dr. Silvia Armini

E-Mail Website
Guest Editor
IMEC, Kapeldreef 75, 3001 Leuven, Belgium
Interests: materials for nanoelectronics; patterning materials; dielectrics; metals; area selective deposition; thin films; self-assembled monolayers; ALD; CVD; PVD; lithography; photoresist; directed self-assembly; colloids and nanoparticles
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

It is a great pleasure to invite you to contribute your original research to this Special Issue on “Trends and Prospects in Nanoscale Thin Films and Coatings” focused on the preparation, characterization, properties, and applications of nanoscale thin films and coatings. In recent years, nanoscale thin films and coatings have found extensive application across many fields due to their unique optical, electrical, thermal, and mechanical properties, which substantially differ from bulk properties.

This Special Issue aims to share recent achievements and new challenges in the field of nanomaterial science, engineering and nanotechnology, paying particular attention to the relationship between advanced fabrication, properties, applications, and physical–chemical characteristics. We welcome studies relating to experimental, theoretical, computational, or other applications of nanomaterials ranging from hard (inorganic) materials, through soft (polymeric and biological) materials, to hybrid materials or nanocomposites, including novel preparation and assembly methodologies, and industrially scalable techniques.

Subject areas include (but are by no means limited to):

  • Nanoparticles, nanocrystals, colloids, sols, and quantum dots;
  • Self-assemblies and directed assemblies (of moledules and nanoparticles);
  • Films, membranes, and coatings;
  • Nanotubes, nanowires, nanofibers, nanorods, and nanobelts;
  • Nanoporous, mesoporous, and microporous materials;
  • Hierarchical structures and molecular–particle networks;
  • Surface and interface sciences and engineering;
  • Inorganic–organic hybrids or nanocomposites;
  • Nanoceramics, metals, and alloys;
  • Nanomaterials (atomic, molecular, and bulk) characterization techniques.

Areas of nanomaterials engineering and applications include (but are not limited to):

  • Catalysis, gas/liquid separations, and membrane reactors;
  • Energy conversion and storage devices/systems such as fuel cells and solar cells;
  • Electronics, photonics, and magnetics;
  • Sensors;
  • Medical, biological, and drug development;
  • Environmental, building, transportation, telecommunications, and food technologies;
  • Nuclear, aerospace, military, and national defense/security technologies;
  • Chemical, petrochemical, and pharmaceutical technologies.

Dr. Silvia Armini
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Nanomaterials is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2900 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • self-assembled molecular films
  • ALD/CVD
  • thin films
  • bottom-up fabrication
  • atomic-scale processing
  • nanotechnology
  • smart materials
  • nanomaterials
  • membranes

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Further information on MDPI's Special Issue polices can be found here.

Published Papers (4 papers)

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15 pages, 2965 KiB  
Article
Degradation of Perfluorododecyl-Iodide Self-Assembled Monolayers upon Exposure to Ambient Light
by Lauren Colbeck Kirby, Jayant K. Lodha, Simon Astley, Dave Skelton, Silvia Armini, Andrew Evans and Anita Brady-Boyd
Nanomaterials 2024, 14(11), 982; https://doi.org/10.3390/nano14110982 - 5 Jun 2024
Cited by 1 | Viewed by 4450 | Correction
Abstract
Perfluorododecyl iodide (I-PFC12) is of interest for area-selective deposition (ASD) applications as it exhibits intriguing properties such as ultralow surface energy, the ability to modify silicon’s band gap, low surface friction, and suitability for micro-contact patterning. Traditional photolithography is struggling to reach the [...] Read more.
Perfluorododecyl iodide (I-PFC12) is of interest for area-selective deposition (ASD) applications as it exhibits intriguing properties such as ultralow surface energy, the ability to modify silicon’s band gap, low surface friction, and suitability for micro-contact patterning. Traditional photolithography is struggling to reach the required critical dimensions. This study investigates the potential of using I-PFC12 as a way to produce contrast between the growth area and non-growth areas of a surface subsequent to extreme ultraviolet (EUV) exposure. Once exposed to EUV, the I-PFC12 molecule should degrade with the help of the photocatalytic substrate, allowing for the subsequent selective deposition of the hard mask. The stability of a vapor-deposited I-PFC12 self-assembled monolayer (SAM) was examined when exposed to ambient light for extended periods of time by using X-ray photoelectron spectroscopy (XPS). Two substrates, SiO2 and TiO2, are investigated to ascertain the suitability of using TiO2 as a photocatalytic active substrate. Following one month of exposure to light, the atomic concentrations showed a more substantial fluorine loss of 10.2% on the TiO2 in comparison to a 6.2% loss on the SiO2 substrate. This more pronounced defluorination seen on the TiO2 is attributed to its photocatalytic nature. Interestingly, different routes to degradation were observed for each substrate. Reference samples preserved in dark conditions with no light exposure for up to three months show little degradation on the SiO2 substrate, while no change is observed on the TiO2 substrate. The results reveal that the I-PFC12 SAM is an ideal candidate for resistless EUV lithography. Full article
(This article belongs to the Special Issue Trends and Prospects in Nanoscale Thin Films and Coatings)
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14 pages, 7945 KiB  
Article
High-Throughput Micro-Combinatorial TEM Phase Mapping of the DC Magnetron Sputtered YxTi1−xOy Thin Layer System
by Dániel Olasz, Viktória Kis, Ildikó Cora, Miklós Németh and György Sáfrán
Nanomaterials 2024, 14(11), 925; https://doi.org/10.3390/nano14110925 - 24 May 2024
Viewed by 608
Abstract
High-throughput methods are extremely important in today’s materials science, especially in the case of thin film characterization. The micro-combinatorial method enables the deposition and characterization of entire multicomponent thin film systems within a single sample. In this paper, we report the application of [...] Read more.
High-throughput methods are extremely important in today’s materials science, especially in the case of thin film characterization. The micro-combinatorial method enables the deposition and characterization of entire multicomponent thin film systems within a single sample. In this paper, we report the application of this method for the comprehensive TEM characterization of the Y-Ti-O layer system. Variable composition samples (YxTi1−xOy) were prepared by dual DC magnetron sputtering, covering the entire (0 ≤ x ≤ 1) concentration range. The structure and morphology of phases formed in both as-deposited and annealed samples at 600, 700, and 800 °C were revealed as a function of Y-Ti composition (x). A comprehensive map showing the appropriate amorphous and crystalline phases, and their occurrence regions of the whole Y-Ti-O layer system, was revealed. Thanks to the applied method, it was shown with ease that at the given experimental conditions, the Y2Ti2O7 phase with a pyrochlore structure forms already at 700 °C without the TiO2 and Y2O3 by-phases, which is remarkably lower than the required temperature for most physical preparation methods, demonstrating the importance and benefits of creating phase maps in materials science and technology. Full article
(This article belongs to the Special Issue Trends and Prospects in Nanoscale Thin Films and Coatings)
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8 pages, 1168 KiB  
Communication
Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al2O3 Film Growth
by João Chaves, William Chiappim, Júlia Karnopp, Benedito Neto, Douglas Leite, Argemiro da Silva Sobrinho and Rodrigo Pessoa
Nanomaterials 2023, 13(24), 3110; https://doi.org/10.3390/nano13243110 - 10 Dec 2023
Cited by 3 | Viewed by 1450
Abstract
In the presented study, a novel approach for thermal atomic layer deposition (ALD) of Al2O3 thin films using plasma-activated water (PAW) as a co-reactant, replacing traditionally employed deionized (DI) water, is introduced. Utilizing ex situ PAW achieves up to a [...] Read more.
In the presented study, a novel approach for thermal atomic layer deposition (ALD) of Al2O3 thin films using plasma-activated water (PAW) as a co-reactant, replacing traditionally employed deionized (DI) water, is introduced. Utilizing ex situ PAW achieves up to a 16.4% increase in the growth per cycle (GPC) of Al2O3 films, consistent with results from plasma-enhanced atomic layer deposition (PEALD). Time-resolved mass spectrometry (TRMS) revealed disparities in CH4 partial pressures between TMA reactions with DI water and PAW, with PAW demonstrating enhanced reactivity. Reactive oxygen species (ROS), namely H2O2 and O3, are posited to activate Si(100) substrate sites, thereby improving GPC and film quality. Specifically, Al2O3 films grown with PAW pH = 3.1 displayed optimal stoichiometry, reduced carbon content, and an expanded bandgap. This study thus establishes “PAW-ALD” as a descriptor for this ALD variation and highlights the significance of comprehensive assessments of PAW in ALD processes. Full article
(This article belongs to the Special Issue Trends and Prospects in Nanoscale Thin Films and Coatings)
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1 pages, 399 KiB  
Correction
Correction: Colbeck Kirby et al. Degradation of Perfluorododecyl-Iodide Self-Assembled Monolayers upon Exposure to Ambient Light. Nanomaterials 2024, 14, 982
by Lauren Colbeck Kirby, Jayant K. Lodha, Simon Astley, Dave Skelton, Silvia Armini, Andrew Evans and Anita Brady-Boyd
Nanomaterials 2024, 14(18), 1512; https://doi.org/10.3390/nano14181512 - 18 Sep 2024
Viewed by 323
Abstract
In the original publication [...] Full article
(This article belongs to the Special Issue Trends and Prospects in Nanoscale Thin Films and Coatings)
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