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Polymers
Special Issues
Recent Advances in Photopolymerization
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Recent Advances in Photopolymerization

A special issue of Polymers (ISSN 2073-4360). This special issue belongs to the section "Polymer Chemistry".

Deadline for manuscript submissions: closed (5 November 2023) | Viewed by 4798

Special Issue Editor

Dr. Yi Zhu

E-Mail Website
Guest Editor
School of Chemical and Material Engineering, Jiangnan University, Wuxi 214122, China
Interests: photopolymerization; photoinitiator; organic and asymmetric catalysis chemistry; fluoropolymer; photocatalysis chemistry

Special Issue Information

Dear Colleagues,

Photoinitiators play a significant role in photopolymerization and can determine the photopolymerization speed and photopolymer properties among other factors. Nowadays, photoinitiators have widely applied in various fields such as coatings, adhesives and the  additive manufacturing and biomedical fields.

Thus, understanding the photophysical and photochemical processes that take place in photoinitiators during exposure and the design of efficient photoinitiators and photo initiation systems are of great value.

In this case, this Special Issue aims to compile original and cutting-edge research work in the development, characterization and application of photoinitiators in photopolymerization.

Dr. Yi Zhu
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Polymers is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2700 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • photoinitiator
  • photosensitive
  • photocurable
  • photochemical
  • photoinduced polymerization
  • photochromic
  • light-driven
  • photopolymerization kinetics
  • UV/visible/NIR photoinitiator

Published Papers (2 papers)

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Research

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20 pages, 7004 KiB  
Article
Coumarin Ketoxime Ester with Electron-Donating Substituents as Photoinitiators and Photosensitizers for Photopolymerization upon UV-Vis LED Irradiation
by Shuheng Fan, Xun Sun, Xianglong He, Yulian Pang, Yangyang Xin, Yanhua Ding and Yingquan Zou
Polymers 2022, 14(21), 4588; https://doi.org/10.3390/polym14214588 - 28 Oct 2022
Cited by 10 | Viewed by 2642
Abstract
High-performance photoinitiators (PIs) are essential for ultraviolet–visible (UV-Vis) light emitting diode (LED) photopolymerization. In this study, a series of coumarin ketoxime esters (COXEs) with electron-donating substituents (tert-butyl, methoxy, dimethylamino and methylthio) were synthesized to study the structure/reactivity/efficiency relationships for substituents for [...] Read more.
High-performance photoinitiators (PIs) are essential for ultraviolet–visible (UV-Vis) light emitting diode (LED) photopolymerization. In this study, a series of coumarin ketoxime esters (COXEs) with electron-donating substituents (tert-butyl, methoxy, dimethylamino and methylthio) were synthesized to study the structure/reactivity/efficiency relationships for substituents for the photoinitiation performance of PIs. The introduction of heteroatom electron-donating substituents leads to a redshift in the COXE absorption of more than 60 nm, which matches the UV-Vis LED emission spectra. The PIs also show acceptable thermal stability via differential scanning calorimetry (DSC) and thermal gravimetric analysis (TGA). The results from real-time Fourier transform infrared (RT-FTIR) measurements indicate that COXEs show an excellent photoinitiation efficiency for free radical polymerization under UV-Vis LED irradiation (365–450 nm); in particular, the conversion efficiency for tri-(propylene glycol) diacrylate (TPGDA) polymerization initiated by COXE-O and COXE-S (4.8 × 10−5 mol·g−1) in 3 s can reach more than 85% under UV-LED irradiation (365, 385 nm). Moreover, the photosensitization of COXEs in the iodonium hexafluorophosphate (Iod-PF6) and hexaarylbiimidazole/N-phenylglycine (BCIM/NPG) systems was investigated via RT-FTIR. As a coinitiator, COXEs show excellent performance in dry film photoresist (DFR) photolithography. This excellent performance of COXEs demonstrates great potential for UV-curing and photoresist applications, providing a new idea for the design of PIs. Full article
(This article belongs to the Special Issue Recent Advances in Photopolymerization)
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Review

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28 pages, 12867 KiB  
Review
Recent Advances and Challenges in Long Wavelength Sensitive Cationic Photoinitiating Systems
by Liping Zhang, Lun Li, Ying Chen, Junyi Pi, Ren Liu and Yi Zhu
Polymers 2023, 15(11), 2524; https://doi.org/10.3390/polym15112524 - 30 May 2023
Cited by 3 | Viewed by 1659
Abstract
With the advantages offered by cationic photopolymerization (CP) such as broad wavelength activation, tolerance to oxygen, low shrinkage and the possibility of “dark cure”, it has attracted extensive attention in photoresist, deep curing and other fields in recent years. The applied photoinitiating systems [...] Read more.
With the advantages offered by cationic photopolymerization (CP) such as broad wavelength activation, tolerance to oxygen, low shrinkage and the possibility of “dark cure”, it has attracted extensive attention in photoresist, deep curing and other fields in recent years. The applied photoinitiating systems (PIS) play a crucial role as they can affect the speed and type of the polymerization and properties of the materials formed. In the past few decades, much effort has been invested into developing cationic photoinitiating systems (CPISs) that can be activated at long wavelengths and overcome technical problems and challenges faced. In this article, the latest developments in the long wavelength sensitive CPIS under ultraviolet (UV)/visible light-emitting diodes (LED) lights are reviewed. The objective is, furthermore, to show differences as well as parallels between different PIS and future perspectives. Full article
(This article belongs to the Special Issue Recent Advances in Photopolymerization)
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