Surface Deposition and Nano-Film Fabrication Process

A special issue of Processes (ISSN 2227-9717). This special issue belongs to the section "Materials Processes".

Deadline for manuscript submissions: closed (23 November 2023) | Viewed by 3560

Special Issue Editors


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Guest Editor
Kirensky Institute of Physics, Krasnoyarsk Scientific Center, Siberian Branch, Russian Academy of Sciences, Krasnoyarsk 660036, Russia
Interests: thin film; MBE; PLD; magnetron sputtering; magnetic materials; metal/semiconductor structures; spintronics

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Guest Editor
Kirensky Institute of Physics, Krasnoyarsk Scientific Center, Siberian Branch, Russian Academy of Sciences, Krasnoyarsk 660036, Russia
Interests: nanooptics; nanoparticles; MBE; PLD; magnetron sputtering; ellipsometry

Special Issue Information

Dear Colleagues,

Coating technologies have been developing for many decades, leading to the emergence of nano-films and enabling their application in many areas, such as optics, electronics, automotive, and many others. Depending on the required functionality of the material, various deposition methods can be used to obtain thin films and multilayer systems. The most complex and time-consuming method is MBE, but it allows for the synthesis of crystalline films, making it possible to obtain and study new materials. In recent years, great advances have been made in chemical fabrication methods, such as CVD, MOCVD and ALD, which have been used to produce graphene and, for example, many 2D Van der Waals films. Moreover, these methods are successfully used in the production of semiconductor devices. Sputtering techniques have not lost their relevance, both for science and for industry. For example, magnetron sputtering (MS) was used for the growth of MAX phases, a new family of quasi-2D naturally nanolaminate materials. In particular, magnetron sputtering (MS) is a versatile method, allowing the sputtering of almost any material on large surface areas. Thin films are in demand in science, technology, and many aspects of our life, which requires their study and development of synthesis technologies.

This Special Issue, “Surface Deposition and Nano-Film Fabrication Process”, is open for works that report the newest advances in the area of fabrication processes of thin and ultrathin films, including 2D and layered systems. Advanced characterizations and studies of deposition conditions and methods on the physical and other properties of thin films and coatings are highly appreciated. The topics within the scope of the issue are, but are not limited to, the following:

  • Optimization and controlling of MBE, PLD, CVD, ALD and sputtering techniques;
  • Fabrication of electrical, optical, magnetic and other functional thin and ultrathin films, including 2D and layered systems;
  • Study of materials’ properties and advanced characterization;
  • Applications of new nano-films and multilayered systems.

Dr. Anton S. Tarasov
Dr. Sergey A. Lyaschenko
Guest Editors

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Keywords

  • thin film
  • quasi 2D materials
  • surface deposition methods
  • chemical deposition
  • nanomaterials
  • MBE
  • PLD
  • CVD
  • ALD
  • magnetron sputtering

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Published Papers (3 papers)

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Research

13 pages, 7155 KiB  
Article
Magnetic Anisotropy of FeNi Multilayer Films with Different Orientations of the Magnetic Anisotropy Axes in Adjacent Layers
by Andrey V. Svalov, Vladimir N. Lepalovskij, Anastasia S. Rusalina, Egor V. Kudyukov, Anastasia A. Feshchenko, Anna A. Pasynkova, Anton A. Yushkov and Galina V. Kurlyandskaya
Processes 2024, 12(1), 81; https://doi.org/10.3390/pr12010081 - 28 Dec 2023
Viewed by 1150
Abstract
FeNi films were prepared using the DC magnetron sputtering technique with an oblique deposition arrangement. Multilayers with different orientations of the magnetic anisotropy axes were obtained thanks to a rotary sample holder inside the vacuum chamber. Magnetic properties were studied using magneto–optical Kerr [...] Read more.
FeNi films were prepared using the DC magnetron sputtering technique with an oblique deposition arrangement. Multilayers with different orientations of the magnetic anisotropy axes were obtained thanks to a rotary sample holder inside the vacuum chamber. Magnetic properties were studied using magneto–optical Kerr microscopy and a vibrating sample magnetometer. Single-layered FeNi films having thicknesses as high as 10 nm and 40 nm show in-plane uniaxial easy magnetization axes produced by the oblique incidence of incoming components of the beams. Magnetic anisotropy field for four-layered samples with orthogonal uniaxial magnetic anisotropy axes in the adjacent layers and the thickness of individual layers of 10 nm and 40 nm turned out to be less than in single-layered films. The magnetic properties peculiarities of the eight-layered sample FeNi (10 nm) × 8 obtained by rotation of the sample holder by 45° before deposition of each subsequent layer suggest the formation of a helix-like magnetic structure through the thickness of the multilayered sample similar to the magnetization arrangement in the Bloch-type magnetic domain wall. Full article
(This article belongs to the Special Issue Surface Deposition and Nano-Film Fabrication Process)
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12 pages, 2145 KiB  
Article
Growth Process, Structure and Electronic Properties of Cr2GeC and Cr2-xMnxGeC Thin Films Prepared by Magnetron Sputtering
by Anton S. Tarasov, Sergey A. Lyaschenko, Mikhail V. Rautskii, Anna V. Lukyanenko, Tatiana A. Andryushchenko, Leonid A. Solovyov, Ivan A. Yakovlev, Olga A. Maximova, Dmitriy V. Shevtsov, Mikhail A. Bondarev, Ilya A. Bondarev, Sergei G. Ovchinnikov and Sergey N. Varnakov
Processes 2023, 11(8), 2236; https://doi.org/10.3390/pr11082236 - 25 Jul 2023
Cited by 2 | Viewed by 1006
Abstract
The growth and phase formation features, along with the influence of structure and morphology on the electronic, optical, and transport properties of Cr2GeC and Cr2-xMnxGeC MAX phase thin films synthesized by magnetron sputtering technique, were studied. It [...] Read more.
The growth and phase formation features, along with the influence of structure and morphology on the electronic, optical, and transport properties of Cr2GeC and Cr2-xMnxGeC MAX phase thin films synthesized by magnetron sputtering technique, were studied. It was found that the Cr:Ge:C atomic ratios most likely play the main role in the formation of a thin film of the MAX phase. A slight excess of carbon and manganese doping significantly improved the phase composition of the films. Cr2GeC films with a thicknesses exceeding 40 nm consisted of crystallites with well-developed facets, exhibiting metallic optical and transport properties. The hopping conduction observed in the Cr2-xMnxGeC film could be attributed to the columnar form of crystallites. Calculations based on a two-band model indicated high carrier concentrations N, P and mobility μ in the best-synthesized Cr2GeC film, suggesting transport properties close to single crystal material. The findings of this study can be utilized to enhance the growth technology of MAX phase thin films. Full article
(This article belongs to the Special Issue Surface Deposition and Nano-Film Fabrication Process)
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10 pages, 2553 KiB  
Article
Influence of a Thin V2O3 Spacer on Interlayer Interactions in Fe-Ni/V2O3/FeNi Film Structures
by Gennadiy S. Patrin, Aleksandr V. Kobyakov, Vasiliy I. Yushkov, Igor O. Anisimov, Sergey M. Zharkov, Sergey V. Semenov and Evgeniy T. Moiseenko
Processes 2023, 11(7), 2084; https://doi.org/10.3390/pr11072084 - 13 Jul 2023
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Abstract
In this paper, we explore the suggestions of the results of experimental studies on low-dimensional layered systems in FeNi/V2O3/FeNi film structures. The multifunctional material V2O3 is used as an interlayer between the magnetically active FeNi layers. [...] Read more.
In this paper, we explore the suggestions of the results of experimental studies on low-dimensional layered systems in FeNi/V2O3/FeNi film structures. The multifunctional material V2O3 is used as an interlayer between the magnetically active FeNi layers. The films were obtained by ultrahigh vacuum magnetron sputtering on a glass substrate with a base size of 10−10 Torr. It has been found that for V2O3 films, the decrease in the metal–semiconductor transition temperature increases significantly. Magnetic characteristics were studied on the MPMS-XL SQUID magnetometer. The exchange effect occurs both in the region where the oxide has a magnetic order and in the paramagnetic region. The latter is due to the effect of the magnetic panel in the oxide package. The phenomenon of oscillation of the exchange field occurs depending on the phenomenon of intermediate observation observed experimentally. Full article
(This article belongs to the Special Issue Surface Deposition and Nano-Film Fabrication Process)
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