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Keywords = glancing angle deposition (GLAD)

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10 pages, 2889 KB  
Article
Nanocolumnar ZnO/Fe Magnetic Composites
by Andreas Kaidatzis, María Garrido-Segovia, José Miguel García-Martín, Nikolaos C. Diamantopoulos, Dimitrios-Panagiotis Theodoropoulos and Panagiotis Poulopoulos
Magnetochemistry 2026, 12(4), 41; https://doi.org/10.3390/magnetochemistry12040041 - 1 Apr 2026
Viewed by 345
Abstract
Composite ZnO/Fe nanostructured thin films are synthesized via physical vapor deposition using radio frequency magnetron sputtering in conventional, as well as in glancing angle deposition (GLAD) geometries. ZnO is employed as a compact nanocolumnar template to direct Fe growth in bilayer and multilayer [...] Read more.
Composite ZnO/Fe nanostructured thin films are synthesized via physical vapor deposition using radio frequency magnetron sputtering in conventional, as well as in glancing angle deposition (GLAD) geometries. ZnO is employed as a compact nanocolumnar template to direct Fe growth in bilayer and multilayer architectures. Morphological analysis reveals well-defined ZnO/Fe interfaces for normal deposition geometry, with diminished interface clarity and reduced layer thickness in GLAD samples. Crystallographic characterization indicates clear ZnO-{002} and α-Fe-{110} texture. Magnetostatic characterization investigates the effects of morphology on coercivity and domain nucleation. GLAD-deposited Fe films exhibit clear in-plane magnetic anisotropy, with remanence to saturation magnetization (MREM/MSAT) equal to 1 for the easy axis and equal to 0.24 for the hard axis, consistent with inclined nanocolumn morphology. Our findings show that deposition geometry, rather the ZnO template, mostly affects the morphology of Fe films. The above, highlight the potential of engineered ZnO/Fe nanocomposites for magnetic, spintronic, and magnetoplasmonic applications, by tuning morphology and interface quality through deposition parameters. Full article
(This article belongs to the Section Magnetic Materials)
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14 pages, 11153 KB  
Article
Photoluminescence of Rhodamine from Nano-Confinement Inside 3D Sculptured Coatings
by Lina Grineviciute, Hsin-Hui Huang, Haoran Mu, William McMahon-Puce, James W. M. Chon, Saulius Juodkazis and Andrew H. A. Clayton
Nanomaterials 2026, 16(5), 296; https://doi.org/10.3390/nano16050296 - 26 Feb 2026
Viewed by 403
Abstract
The effect of the confinement of fluorophores (rhodamine 6G) in nano-cavities of porous 3D sculptured coatings made by glancing-angle deposition (GLAD) was investigated by fluorescence-lifetime imaging microscopy (FLIM). Shortening of fluorescence/ photoluminescence lifetime by ∼10% was observed from the dye-permeated (in liquid) structure; [...] Read more.
The effect of the confinement of fluorophores (rhodamine 6G) in nano-cavities of porous 3D sculptured coatings made by glancing-angle deposition (GLAD) was investigated by fluorescence-lifetime imaging microscopy (FLIM). Shortening of fluorescence/ photoluminescence lifetime by ∼10% was observed from the dye-permeated (in liquid) structure; however, there was no rotational hindrance of dye molecules. When dried, a strong rotational hindrance 89% was observed for the orientation along the ordinary optical axis (slow-axis), and the hindrance was smaller than 57% for the extraordinary direction (fast axis). Light-intensity distribution inside the nano-structure with a form birefringence was numerically modeled using plane-wave illumination and a dipole source. Nanoscale localization of light intensity due to dipole nature I1/radius6 and boundary conditions for E-field allows efficient energy deposition inside the region of lower refractive index (nanogaps). Full article
(This article belongs to the Section Nanophotonics Materials and Devices)
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37 pages, 5895 KB  
Review
Advanced Optoelectronic Applications of Nanopillar Arrays Fabricated by Glancing Angle Deposition
by Yating Fang, Lin Yang and Zhifeng Huang
Nanomaterials 2025, 15(20), 1555; https://doi.org/10.3390/nano15201555 - 13 Oct 2025
Viewed by 1539
Abstract
Glancing angle deposition (GLAD) is a unique physical vapor deposition technique to enable wafer-scale production of close-packed nanopillar arrays (NaPAs) made of a wide range of inorganic and organic materials and engineerable structures, offering great potential for advanced optoelectronic applications. By flexibly controlling [...] Read more.
Glancing angle deposition (GLAD) is a unique physical vapor deposition technique to enable wafer-scale production of close-packed nanopillar arrays (NaPAs) made of a wide range of inorganic and organic materials and engineerable structures, offering great potential for advanced optoelectronic applications. By flexibly controlling substrate rotation during GLAD, this technique enables intricate sculpture of nanopillars in vertical/tilted column, helix, zigzag, and square spiral shapes or a combination of these shapes along the vertical growth axis. In particular, NaPAs exhibit unique engineerability in their material/structure-determined optical, electronic, chemical, mechanical, and morphological properties, making them versatile for significant applications in photovoltaics, photodetection, photocatalysis, and advanced displaying. In this review, we provide a comprehensive overview of recent advancements in optoelectronic applications of GLAD-fabricated NaPAs by exploring the relationship between structural features and device functionality. Additionally, we discuss the technical challenges associated with GLAD, such as scalability, material compatibility, and fabrication precision, and address prospects to produce next-generation optoelectronic devices. Full article
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17 pages, 4396 KB  
Article
Effect of the Different Growth Shapes on the Electrochemical Behavior of Ti Thin Films for Medical Applications
by Matteo Bertapelle, Joel Borges, Julia Claudia Mirza-Rosca and Filipe Vaz
Materials 2025, 18(17), 3959; https://doi.org/10.3390/ma18173959 - 24 Aug 2025
Viewed by 1063
Abstract
The response of titanium (Ti) thin films is closely related to their microstructure, which is extremely sensitive to the selected deposition parameters and geometrical configurations. The present study investigates the impact of geometrical factors on the growth of Ti thin films, focusing on [...] Read more.
The response of titanium (Ti) thin films is closely related to their microstructure, which is extremely sensitive to the selected deposition parameters and geometrical configurations. The present study investigates the impact of geometrical factors on the growth of Ti thin films, focusing on how variations in growth geometry influence film microstructure, surface morphology, and corrosion resistance. Three Ti thin films were prepared using Glancing Angle Deposition (GLAD) in a custom-built DC reactive magnetron sputtering system. For the first sample, the target was positioned perpendicular to the substrate surface (α = 0°); for the second and third samples, the substrate holder was positioned at an angle of 85° regarding the target direction (α = 85°), incorporating a 180° azimuthal rotation for the last (to obtain a zigzag-like deposition). The thickness and morphological features of the thin films were investigated by SEM, while the surface morphology, specifically roughness, and crystallinity of the thin films were assessed by AFM and XRD, respectively. Continuous and alternating current techniques were used for electrochemical characterization of behavior in simulated body fluid. The obtained results show a clear tendency to an improvement in anticorrosion performances varying the nanoarchitecture of the films in comparison to the conventional-grown sample, with the inclined sample presenting a slight enhancement in corrosion resistance and the zigzag-grown sample having the best corrosion resistance properties of the three. Full article
(This article belongs to the Section Metals and Alloys)
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81 pages, 10454 KB  
Review
Glancing Angle Deposition in Gas Sensing: Bridging Morphological Innovations and Sensor Performances
by Shivam Singh, Kenneth Christopher Stiwinter, Jitendra Pratap Singh and Yiping Zhao
Nanomaterials 2025, 15(14), 1136; https://doi.org/10.3390/nano15141136 - 21 Jul 2025
Cited by 5 | Viewed by 3371
Abstract
Glancing Angle Deposition (GLAD) has emerged as a versatile and powerful nanofabrication technique for developing next-generation gas sensors by enabling precise control over nanostructure geometry, porosity, and material composition. Through dynamic substrate tilting and rotation, GLAD facilitates the fabrication of highly porous, anisotropic [...] Read more.
Glancing Angle Deposition (GLAD) has emerged as a versatile and powerful nanofabrication technique for developing next-generation gas sensors by enabling precise control over nanostructure geometry, porosity, and material composition. Through dynamic substrate tilting and rotation, GLAD facilitates the fabrication of highly porous, anisotropic nanostructures, such as aligned, tilted, zigzag, helical, and multilayered nanorods, with tunable surface area and diffusion pathways optimized for gas detection. This review provides a comprehensive synthesis of recent advances in GLAD-based gas sensor design, focusing on how structural engineering and material integration converge to enhance sensor performance. Key materials strategies include the construction of heterojunctions and core–shell architectures, controlled doping, and nanoparticle decoration using noble metals or metal oxides to amplify charge transfer, catalytic activity, and redox responsiveness. GLAD-fabricated nanostructures have been effectively deployed across multiple gas sensing modalities, including resistive, capacitive, piezoelectric, and optical platforms, where their high aspect ratios, tailored porosity, and defect-rich surfaces facilitate enhanced gas adsorption kinetics and efficient signal transduction. These devices exhibit high sensitivity and selectivity toward a range of analytes, including NO2, CO, H2S, and volatile organic compounds (VOCs), with detection limits often reaching the parts-per-billion level. Emerging innovations, such as photo-assisted sensing and integration with artificial intelligence for data analysis and pattern recognition, further extend the capabilities of GLAD-based systems for multifunctional, real-time, and adaptive sensing. Finally, current challenges and future research directions are discussed, emphasizing the promise of GLAD as a scalable platform for next-generation gas sensing technologies. Full article
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18 pages, 4015 KB  
Article
Glancing Angle Deposited Nanostructured Tellurium Layer Against Dendrite Formation and Side Reactions in Aqueous Zn-Ion Battery Anode
by Salim Hussain, S. M. Sayem, Assem Basurrah, Tahany Rashed, Fumiya Watanabe, Noureen Siraj and Tansel Karabacak
Nanomaterials 2025, 15(12), 952; https://doi.org/10.3390/nano15120952 - 19 Jun 2025
Cited by 3 | Viewed by 1285
Abstract
Aqueous zinc ion batteries (AZIBs) have considerable potential for energy storage owing to their cost-effectiveness, safety, and environmental sustainability. However, dendrite formation, hydrogen evolution reaction (HER), and corrosion of the bare zinc (B-Zn) anode tremendously impact the performance degradation and premature failure of [...] Read more.
Aqueous zinc ion batteries (AZIBs) have considerable potential for energy storage owing to their cost-effectiveness, safety, and environmental sustainability. However, dendrite formation, hydrogen evolution reaction (HER), and corrosion of the bare zinc (B-Zn) anode tremendously impact the performance degradation and premature failure of AZIBs. This study introduces a glancing angle deposition (GLAD) approach during the sputtering process to fabricate tellurium nanostructured (TeNS) at the zinc (Zn) anode to avoid the aforementioned issues with the B-Zn anode. Three different deposition times (5, 10, and 30 min) were used to prepare TeNS at the Zn anode. The morphology, crystallinity, composition, and wettability of the TeNSs were analyzed. The TeNSs served as hydrophilic sites and a protective layer, facilitating uniform Zn nucleation and plating while inhibiting dendrite formation and side reactions. Consequently, the symmetric cell with TeNS deposited on the Zn anode for 10 min (Te@Zn_10 min) demonstrated an enhanced cycling stability of 350 h, the lowest nucleation overpotential of 10.65 mV at a current density of 1 mA/cm2, and an areal capacity of 0.5 mAh/cm2. The observed enhancement in the cycling stability and reduction in the nucleation overpotential can be attributed to the optimal open area fraction of the TeNSs on the Zn surface, which promotes uniform Zn deposition while effectively suppressing side reactions. Full article
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17 pages, 4524 KB  
Article
Resultant Incidence Angle: A Unique Criterion for Controlling the Inclined Columnar Nanostructure of Metallic Films
by Aurélien Besnard, Hamidreza Gerami, Marina Raschetti and Nicolas Martin
Nanomaterials 2025, 15(8), 620; https://doi.org/10.3390/nano15080620 - 18 Apr 2025
Cited by 2 | Viewed by 1367
Abstract
The original Glancing Angle Deposition (GLAD) technique was developed using the evaporation process, i.e., in high vacuum, with a nearly punctual source, and with the substrate aligned with the source axis. In this specific case, the substrate tilt angle can be assumed to [...] Read more.
The original Glancing Angle Deposition (GLAD) technique was developed using the evaporation process, i.e., in high vacuum, with a nearly punctual source, and with the substrate aligned with the source axis. In this specific case, the substrate tilt angle can be assumed to be equal to the impinging incidence angle of evaporated atoms. With the sputtering process, the deposition pressure is higher, sources are larger, and substrates are not intrinsically aligned with the source. As a result, deviations from the growth models applied for evaporation are reported, and the substrate tilt angle is no longer relevant for describing the impinging atomic flux. To control the inclined nanostructure of metallic films, a relevant description of the atomic flux is required, applicable across all deposition configurations. In this work, transport simulation is used to determine the resultant incidence angle, a unique criterion relevant to each specific deposition condition. The different representations of the flux are described and discussed, and some typical examples of the resultant angles are presented. Ten elements are investigated: three hcp transition metals (Ti, Zr, and Hf), six bcc transition metals (V, Nb, Ta, Cr, Mo, and W), and one fcc post-transition metal (Al). Full article
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13 pages, 1108 KB  
Article
Reduced Graphene Oxide Decorated Titanium Nitride Nanorod Array Electrodes for Electrochemical Applications
by Md Shafiul Islam, Alan Branigan, Dexian Ye and Maryanne M. Collinson
Electrochem 2024, 5(3), 274-286; https://doi.org/10.3390/electrochem5030017 - 3 Jul 2024
Cited by 2 | Viewed by 2812
Abstract
This work describes the fabrication and characterization of a new high surface area nanocomposite electrode containing reduced graphene oxide (rGO) and titanium nitride (TiN) for electrochemical applications. This approach involves electrochemically depositing rGO on a high surface area TiN nanorod array electrode to [...] Read more.
This work describes the fabrication and characterization of a new high surface area nanocomposite electrode containing reduced graphene oxide (rGO) and titanium nitride (TiN) for electrochemical applications. This approach involves electrochemically depositing rGO on a high surface area TiN nanorod array electrode to form a new nanocomposite electrode. The TiN nanorod array was first formed by the glancing angle deposition technique in a DC (Direct Current) sputtering system. GO flakes of ~1.5 μm in diameter, as confirmed by Dynamic Light Scattering (DLS), were electrodeposited on the nanostructured TiN electrode via the application of a fixed potential for one hour. The surface morphology of the as-prepared rGO/TiN electrode was evaluated by scanning electron microscopy (SEM) and the presence of rGO on TiN was confirmed by Raman Microscopy. The CV shows an increase in the capacitive current at rGO/TiN as compared to TiN. The rGO decorated TiN electrode was then used for analyzing the electrocatalytic oxidation of ascorbic acid and dopamine, and the reduction of nitrate by CV and linear sweep voltammetry (LSV), respectively. CV or LSV show that the electrochemical kinetics of these three analytes are significantly faster on rGO/TiN than TiN itself. Overall, the rGO/TiN electrode showed better electrochemical behavior for biomolecules like ascorbic acid and dopamine as well as another target analyte, nitrate ions, compared to TiN by itself. Full article
(This article belongs to the Special Issue Feature Papers in Electrochemistry)
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12 pages, 2241 KB  
Article
Role of CdTe Interface Structure on CdS/CdTe Photovoltaic Device Performance
by Niva K. Jayswal, Dipendra Adhikari, Indra Subedi, Ambalanath Shan and Nikolas J. Podraza
Materials 2023, 16(20), 6812; https://doi.org/10.3390/ma16206812 - 23 Oct 2023
Cited by 3 | Viewed by 2483
Abstract
Glancing angle deposition (GLAD) of CdTe can produce a cubic, hexagonal, or mixed phase crystal structure depending upon the oblique deposition angles (Φ) and substrate temperature. GLAD CdTe films are prepared at different Φ at room temperature (RT) and a high temperature (HT) [...] Read more.
Glancing angle deposition (GLAD) of CdTe can produce a cubic, hexagonal, or mixed phase crystal structure depending upon the oblique deposition angles (Φ) and substrate temperature. GLAD CdTe films are prepared at different Φ at room temperature (RT) and a high temperature (HT) of 250 °C and used as interlayers between the n-type hexagonal CdS window layer and the p-type cubic CdTe absorber layer to investigate the role of interfacial tailoring at the CdS/CdTe heterojunction in photovoltaic (PV) device performance. The Φ = 80° RT GLAD CdTe interlayer and CdS both have the hexagonal structure, which reduces lattice mismatch at the CdS/CdTe interface and improves electronic quality at the heterojunction for device performance optimization. The device performance of HT CdS/CdTe solar cells with Φ = 80° RT with 50 to 350 nm thick GLAD CdTe interlayers is evaluated in which a 250 nm interlayer device shows the best device performance with a 0.53 V increase in open-circuit voltage and fill-factor product and a 0.73% increase in absolute efficiency compared to the HT baseline PV device without an interlayer. Full article
(This article belongs to the Section Thin Films and Interfaces)
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16 pages, 10115 KB  
Article
Growth of Nanocolumnar TiO2 Bilayer by Direct Current Reactive Magnetron Sputtering in Glancing-Angle Deposition Configuration for High-Quality Electron Transport Layer
by Perla Yanet Rosales Medina, Fernando Avelar Muñoz, Elida Flores Sigala, Roberto Gómez Rosales, Javier Alejandro Berumen Torres, José de Jesús Araiza Ibarra, Hugo Tototzintle Huitle, Víctor Hugo Méndez García and José Juan Ortega Sigala
Micromachines 2023, 14(8), 1483; https://doi.org/10.3390/mi14081483 - 25 Jul 2023
Cited by 4 | Viewed by 2140
Abstract
The electron transport layer (ETL) plays a crucial role in solar cell technology, particularly in perovskite solar cells (PSCs), where nanostructured TiO2 films have been investigated as superior ETLs compared to compact TiO2. In this study, we explored the nanocolumnar [...] Read more.
The electron transport layer (ETL) plays a crucial role in solar cell technology, particularly in perovskite solar cells (PSCs), where nanostructured TiO2 films have been investigated as superior ETLs compared to compact TiO2. In this study, we explored the nanocolumnar growth of TiO2 in the anatase phase for bilayer thin films by DC reactive magnetron sputtering (MS) technique and glancing-angle deposition (GLAD). For the growth of the compact TiO2 layer, it was found that the crystalline quality of the films is strongly dependent on the sputtering power, and the samples deposited at 120 and 140 W are those with the best crystalline quality. However, for the nanocolumnar layer, the reactive atmosphere composition determined the best crystalline properties. By optimizing the growth parameters, the formation of TiO2 nanocolumns with a cross-sectional diameter ranging from 50 to 75 nm was achieved. The average thickness of the films exceeded 12.71 ± 0.5 µm. All nanostructured films were grown at a constant GLAD angle of 70°, and after deposition, the measured inclination angle of the nanocolumns is very close to this, having values between 68 and 80°. Furthermore, a correlation was observed between the quality of the initial layer and the enhanced growth of the TiO2 nanocolumns. All bilayer films are highly transparent, allowing light to pass through up to 90%, and present a band gap with values between 3.7 and 3.8 eV. This article offers the experimental parameters for the fabrication of a nanocolumnar TiO2 using the magnetron sputtering technique and the glancing-angle deposition configuration. Full article
(This article belongs to the Special Issue Thin Film Deposition: From Fundamental Research to Applications)
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42 pages, 9685 KB  
Review
GLAD Based Advanced Nanostructures for Diversified Biosensing Applications: Recent Progress
by Sarjana Yadav, Sneha Senapati, Samir Kumar, Shashank K. Gahlaut and Jitendra P. Singh
Biosensors 2022, 12(12), 1115; https://doi.org/10.3390/bios12121115 - 2 Dec 2022
Cited by 31 | Viewed by 6095
Abstract
Glancing angle deposition (GLAD) is a technique for the fabrication of sculpted micro- and nanostructures under the conditions of oblique vapor flux incident and limited adatom diffusion. GLAD-based nanostructures are emerging platforms with broad sensing applications due to their high sensitivity, enhanced optical [...] Read more.
Glancing angle deposition (GLAD) is a technique for the fabrication of sculpted micro- and nanostructures under the conditions of oblique vapor flux incident and limited adatom diffusion. GLAD-based nanostructures are emerging platforms with broad sensing applications due to their high sensitivity, enhanced optical and catalytic properties, periodicity, and controlled morphology. GLAD-fabricated nanochips and substrates for chemical and biosensing applications are replacing conventionally used nanomaterials due to their broad scope, ease of fabrication, controlled growth parameters, and hence, sensing abilities. This review focuses on recent advances in the diverse nanostructures fabricated via GLAD and their applications in the biomedical field. The effects of morphology and deposition conditions on GLAD structures, their biosensing capability, and the use of these nanostructures for various biosensing applications such as surface plasmon resonance (SPR), fluorescence, surface-enhanced Raman spectroscopy (SERS), and colorimetric- and wettability-based bio-detection will be discussed in detail. GLAD has also found diverse applications in the case of molecular imaging techniques such as fluorescence, super-resolution, and photoacoustic imaging. In addition, some in vivo applications, such as drug delivery, have been discussed. Furthermore, we will also provide an overview of the status of GLAD technology as well as future challenges associated with GLAD-based nanostructures in the mentioned areas. Full article
(This article belongs to the Special Issue Plasmonic Sensors: A New Frontier in Nanotechnology)
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6 pages, 1479 KB  
Brief Report
Direct-Grown Helical-Shaped Tungsten-Oxide-Based Devices with Reconfigurable Selectivity for Memory Applications
by Ying-Chen Chen, Yifu Huang, Sumant Sarkar, John Gibbs and Jack Lee
J. Low Power Electron. Appl. 2022, 12(4), 55; https://doi.org/10.3390/jlpea12040055 - 15 Oct 2022
Cited by 2 | Viewed by 2963
Abstract
In this study, a direct-grown helical-shaped tungsten-oxide-based (h-WOx) selection device is presented for emerging memory applications. The selectivity in the selection devices is from 10 to 103 with a low off-current of 0.1 to 0.01 nA. In addition, the selectivity [...] Read more.
In this study, a direct-grown helical-shaped tungsten-oxide-based (h-WOx) selection device is presented for emerging memory applications. The selectivity in the selection devices is from 10 to 103 with a low off-current of 0.1 to 0.01 nA. In addition, the selectivity of volatile switching in the h-WOx selection devices is reconfigurable with a pseudo RESET process on the one-time negative voltage operations. The helical-shaped selection devices with the glancing angle deposition (GLAD) method show good compatibility, low power consumption, good selectivity, and good reconfigurability for next-generation memory applications. Full article
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20 pages, 41214 KB  
Article
Large-Area Nanopillar Arrays by Glancing Angle Deposition with Tailored Magnetic Properties
by Elena Navarro, María Ujué González, Fanny Béron, Felipe Tejo, Juan Escrig and José Miguel García-Martín
Nanomaterials 2022, 12(7), 1186; https://doi.org/10.3390/nano12071186 - 1 Apr 2022
Cited by 8 | Viewed by 4036
Abstract
Ferromagnetic films down to thicknesses of tens of nanometers and composed by polycrystalline Fe and Fe2O3 nanopillars are grown in large areas by glancing angle deposition with magnetron sputtering (MS-GLAD). The morphological features of these films strongly depend on the [...] Read more.
Ferromagnetic films down to thicknesses of tens of nanometers and composed by polycrystalline Fe and Fe2O3 nanopillars are grown in large areas by glancing angle deposition with magnetron sputtering (MS-GLAD). The morphological features of these films strongly depend on the growth conditions. Vertical or tilted nanopillars have been fabricated depending on whether the substrate is kept rotating azimuthally during deposition or not, respectively. The magnetic properties of these nanopillars films, such as hysteresis loops squareness, adjustable switching fields, magnetic anisotropy and coercivity, can be tuned with the specific morphology. In particular, the growth performed through a collimator mask mounted onto a not rotating azimuthally substrate produces almost isolated well-defined tilted nanopillars that exhibit a magnetic hardening. The first-order reversal curves diagrams and micromagnetic simulations revealed that a growth-induced uniaxial anisotropy, associated with an anisotropic surface morphology produced by the glancing angle deposition in the direction perpendicular to the atomic flux, plays an important role in the observed magnetic signatures. These results demonstrate the potential of the MS-GLAD method to fabricate nanostructured films in large area with tailored structural and magnetic properties for technological applications. Full article
(This article belongs to the Special Issue Magnetic Nanomaterials and Nanostructures)
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18 pages, 6053 KB  
Brief Report
Developing GLAD Parameters to Control the Deposition of Nanostructured Thin Film
by Jakub Bronicki, Dominik Grochala and Artur Rydosz
Sensors 2022, 22(2), 651; https://doi.org/10.3390/s22020651 - 14 Jan 2022
Cited by 12 | Viewed by 4501
Abstract
In this paper, we describe the device developed to control the deposition parameters to manage the glancing angle deposition (GLAD) process of metal-oxide thin films for gas-sensing applications. The GLAD technique is based on a set of parameters such as the tilt, rotation, [...] Read more.
In this paper, we describe the device developed to control the deposition parameters to manage the glancing angle deposition (GLAD) process of metal-oxide thin films for gas-sensing applications. The GLAD technique is based on a set of parameters such as the tilt, rotation, and substrate temperature. All parameters are crucial to control the deposition of nanostructured thin films. Therefore, the developed GLAD controller enables the control of all parameters by the scientist during the deposition. Additionally, commercially available vacuum components were used, including a three-axis manipulator. High-precision readings were tested, where the relative errors calculated using the parameters provided by the manufacturer were 1.5% and 1.9% for left and right directions, respectively. However, thanks to the formula developed by our team, the values were decreased to 0.8% and 0.69%, respectively. Full article
(This article belongs to the Special Issue Gas Sensors for Environmental Applications)
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14 pages, 4150 KB  
Article
Anisotropy of 3D Columnar Coatings in Mid-Infrared Spectral Range
by Lina Grineviciute, Soon Hock Ng, Molong Han, Tania Moein, Vijayakumar Anand, Tomas Katkus, Meguya Ryu, Junko Morikawa, Mark J. Tobin, Jitraporn Vongsvivut, Tomas Tolenis and Saulius Juodkazis
Nanomaterials 2021, 11(12), 3247; https://doi.org/10.3390/nano11123247 - 29 Nov 2021
Cited by 5 | Viewed by 3105
Abstract
Polarisation analysis in the mid-infrared fingerprint region was carried out on thin (∼1 μm) Si and SiO2 films evaporated via glancing angle deposition (GLAD) method at 70 to the normal. Synchrotron-based infrared microspectroscopic measurements were carried out on the Infrared [...] Read more.
Polarisation analysis in the mid-infrared fingerprint region was carried out on thin (∼1 μm) Si and SiO2 films evaporated via glancing angle deposition (GLAD) method at 70 to the normal. Synchrotron-based infrared microspectroscopic measurements were carried out on the Infrared Microspectroscopy (IRM) beamline at Australian Synchrotron. Specific absorption bands, particularly Si-O-Si stretching vibration, was found to follow the angular dependence of ∼cos2θ, consistent with the absorption anisotropy. This unexpected anisotropy stems from the enhanced absorption in nano-crevices, which have orientation following the cos2θ angular dependence as revealed by Fourier transforming the image of the surface of 3D columnar films and numerical modeling of light field enhancement by sub-wavelength nano-crevices. Full article
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