Advances and Innovations in Glancing Angle Deposition and Related Nanostructures

Dear Colleagues,

Glancing Angle Deposition (GLAD) is a sophisticated nanofabrication technique that is used to design three-dimensional and other types of nanostructures. In GLAD, the substrate is tilted at a controlled angle relative to the incoming vapor or ion flux and can be rotated azimuthally. This unique deposition method, in combination with templates and/or deposition configurations, allows for the creation of complex and precisely engineered nanostructures with a wide range of morphologies. The resulting films exhibit novel mechanical, electrical, magnetic, optical, and chemical properties, making GLAD a versatile and powerful tool for broad applications in optical coatings, sensors, catalysis, microelectronics, photonic devices, biomedical devices, energy devices, MEMS/NEMS devices, etc. The focus of this Special Issue on Nanomaterials is to highlight the following fields:

• Understanding GLAD growth mechanisms;
• Novel structures and materials fabricated by GLAD;
• The characterization of GLAD materials and structures;
• The physics and chemical properties of GLAD structures;
• Various applications of GLAD materials and structures.

We welcome original article and review submissions.

Prof. Dr. Yiping Zhao
Prof. Dr. Jitendra P. Singh
Prof. Dr. Tansel Karabacak
Guest Editors

Manuscript Submission Information

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Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2900 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

• oblique angle deposition
• glancing angle deposition
• nanostructures
• thin films
• nanoengineering
• surface morphology
• optical coatings
• sensors
• catalysis
• microelectronics
• photonic devices
• biomedical applications
• energy devices
• MEMS/NEMS
• vapor deposition
• nanostructuring
• controlled growth
• substrate engineering
• nanostructured surfaces
• deposition techniques
• thin-film growth
• simulations
• numerical calculations