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Coatings
Special Issues
Photonic and Electronic Multilayer Thin Films: Growth, Properties, and Applications
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Photonic and Electronic Multilayer Thin Films: Growth, Properties, and Applications

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Thin Films".

Deadline for manuscript submissions: closed (31 December 2020) | Viewed by 16302

Special Issue Editors

Prof. Dr. Chih-Hao Lee

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Guest Editor
Department of Engineering and System Science, National Tsing Hua University, Hsinchu 30013, Taiwan
Interests: synchrotron radiation and neutron beam applications; thin films; magnetism
Special Issues, Collections and Topics in MDPI journals
Dr. Florin Nastase

E-Mail Website
Guest Editor
Research Centre for Integrated Systems Nanotechnologies and Carbon Based Nanomaterials (CENASIC), National Institute for Research and Development in Microtechnologies-IMT Bucharest, 077190 Bucharest, Romania
Interests: thin films technology; atomic layer deposition (ALD); plasma processing of materials (plasma polymerization, plasma functionalization); organic semiconductors (semiconducting polymers); nanocomposites (polymer nanocomposites); polymer physics
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

The advance of electronic industries replies heavily on the devoplment of thin film growth and characterization techniques. Recent theoretical and experimental developments in solar cell thin film coatings and light emitting diodes (LED) as multilayers on oxide substrates and covering transparent conducting layers are among the most highly exploited research systems in the field. In addition, recent research topics such as photocatalysts to convert carbon dioxide into synthesis fuel or water splitting to generate hydrogen are active research areas for renewable energy. The efficiency and cost of solar light harvest and LED are improved year after year. The need to maintain structural material integrity, reliability assets, and the durability of new nanostructured coating systems have seen a huge demand for future industries. Furthermore, recent developments in electronic industries, such as the mini-LED display, the organic LED display, resistive random-access memory, and magnetoresistive random-access memory are all on the horizon for next decade. Nanoscale multilayer devices have become fashionable in the scientific comminuity, and as the thin film has become thinner, the interface properties, such as band bending and the interdiffusion of atoms, have increased in importance. To grow ultra-thin films with defects in a controllable way and to characterize these ultra-thin films and low concentration impurities at the interface are challenges in the near future.

This scope of this Special Issue will serve as a forum for papers including the manufacture, design, and characterization of high-performance thin film materials. Correlations among the growth methods, physical properties, and charaterization techniques are to be explored. The goal is to shed light on these correlations through an understanding of electronic and atomic structures and also the morphology of the untra thin films, expecially the interfaces between thin films.

Prof. Dr. Chih-Hao Lee
Dr. Florin Nastase
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • Physical properties of thin films
  • Optical devices
  • Photocatalysts
  • Thin film growth
  • Thin film characterizations

Published Papers (4 papers)

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Research

12 pages, 1917 KiB  
Article
Metallic Nanoparticle-Decorated Polydopamine Thin Films and Their Cell Proliferation Characteristics
by Ferhunde Aysin, Asli Yilmaz and Mehmet Yilmaz
Coatings 2020, 10(9), 802; https://doi.org/10.3390/coatings10090802 - 19 Aug 2020
Cited by 6 | Viewed by 2793
Abstract
Plasmonic metal nanoparticle (NP)-decorated thin films of biobased and biocompatible polymers provide significant opportunities in various biomedical applications. Inspired from the adhesive proteins of the marine mussels, polydopamine (PDA) serves as a versatile, biocompatible, and simple thin-film material and enhances cell growth and [...] Read more.
Plasmonic metal nanoparticle (NP)-decorated thin films of biobased and biocompatible polymers provide significant opportunities in various biomedical applications. Inspired from the adhesive proteins of the marine mussels, polydopamine (PDA) serves as a versatile, biocompatible, and simple thin-film material and enhances cell growth and proliferation. Herein, we report the fabrication of the gold NPs (AuNPs) or silver NPs (AgNPs)-deposited thin films of PDA and their employment in cell growth and proliferation. PDA thin film with its numerous functional groups enabled well-controlled adsorption of NPs. The number density of NPs was manipulated simply by tuning the deposition time. Cell viability test for human lung cancer (A549) and human colon cancer (CaCO2) cell lines indicated that a thin layer of PDA film remarkably enhanced the cell growth and proliferation. The lower number density of NPs for the 24 h of the culture time resulted in a higher proliferation rate. However, the increase in both the number density of NPs and culture time led to a decrease in cell growth. Full article
(This article belongs to the Special Issue Photonic and Electronic Multilayer Thin Films: Growth, Properties, and Applications)
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10 pages, 2775 KiB  
Article
Surface Morphology of Silicon Waveguide after Reactive Ion Etching (RIE)
by Yu Zheng, Piaopiao Gao, Lianqiong Jiang, Xiaochao Kai and Ji’an Duan
Coatings 2019, 9(8), 478; https://doi.org/10.3390/coatings9080478 - 29 Jul 2019
Cited by 4 | Viewed by 3397
Abstract
The side wall profile roughness of the silicon waveguide prepared by electron beam lithography and reactive ion etching is extracted by using the boundary tracing method. The maximum, minimum, and average roughness values are extracted from the side wall boundary, and the changes [...] Read more.
The side wall profile roughness of the silicon waveguide prepared by electron beam lithography and reactive ion etching is extracted by using the boundary tracing method. The maximum, minimum, and average roughness values are extracted from the side wall boundary, and the changes of the side wall boundary of waveguide after electron beam exposure and reactive ion etching were compared. The roughness variation of the waveguide side wall is similar with the same length. And roughness from the bottom of the waveguide etched region is measured directly by laser confocal microscope and roughness correlation statistics are also obtained. Full article
(This article belongs to the Special Issue Photonic and Electronic Multilayer Thin Films: Growth, Properties, and Applications)
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10 pages, 8548 KiB  
Article
Hybrid Nanostructured Antireflection Coating by Self-Assembled Nanosphere Lithography
by Zizheng Li, Chi Song, Qiang Li, Xiangjun Xiang, Haigui Yang, Xiaoyi Wang and Jinsong Gao
Coatings 2019, 9(7), 453; https://doi.org/10.3390/coatings9070453 - 18 Jul 2019
Cited by 15 | Viewed by 6301
Abstract
Broadband antireflection (AR) coatings are essential elements for improving the photocurrent generation of photovoltaic modules or the enhancement of visibility in optical devices. In this paper, we report a hybrid nanostructured antireflection coating combination that is a clean and efficient method for fabricating [...] Read more.
Broadband antireflection (AR) coatings are essential elements for improving the photocurrent generation of photovoltaic modules or the enhancement of visibility in optical devices. In this paper, we report a hybrid nanostructured antireflection coating combination that is a clean and efficient method for fabricating a nanostructured antireflection coating (ARC). A multilayer thin-film was introduced between the ARC and substrate to solve the significant problem of preparing nanostructured ARCs on different substrates. In this way, we rebuilt a gradient refractive index structure and optimize the antireflective property by simply adjusting the moth-eye structure and multilayers. Subwavelength-structured cone arrays were directly patterned using a self-assembled single-layer polystyrene (PS) nanosphere array as an etching mask. Nanostructure coatings exhibited excellent broadband and wide-angle antireflective properties. The bottom-up preparation process and hybrid structural combination have the potential to significantly enhance the broadband and wide-angle antireflective properties for a number of optical systems that require high transparency, which is promising for reducing the manufacturing cost of nanostructured AR coatings. Full article
(This article belongs to the Special Issue Photonic and Electronic Multilayer Thin Films: Growth, Properties, and Applications)
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10 pages, 3065 KiB  
Communication
The Effects of Thermal and Atmospheric Pressure Radio Frequency Plasma Annealing in the Crystallization of TiO2 Thin Films
by Yu Xu, Yu Zhang, Tao He, Ke Ding, Xiaojiang Huang, Hui Li, Jianjun Shi, Ying Guo and Jing Zhang
Coatings 2019, 9(6), 357; https://doi.org/10.3390/coatings9060357 - 31 May 2019
Cited by 12 | Viewed by 2943
Abstract
Amorphous TiO2 thin films were respectively annealed by 13.56 MHz radio frequency (RF) atmospheric pressure plasma at discharge powers of 40, 60, 80 W and thermal treatment at its corresponding substrate temperature (Ts). Ts was estimated through three [...] Read more.
Amorphous TiO2 thin films were respectively annealed by 13.56 MHz radio frequency (RF) atmospheric pressure plasma at discharge powers of 40, 60, 80 W and thermal treatment at its corresponding substrate temperature (Ts). Ts was estimated through three measurement methods (thermocouple, Newton’s law of cooling and OH optical emission spectra simulation) and showed identically close results of 196, 264 and 322 °C, respectively. Comparing with thermal annealing, this RF atmospheric pressure plasma annealing process has obvious effects in improving crystallization of the amorphous films, based on the XRD and Raman analysis of the film. Amorphous TiO2 film can be changed to anatase film at about 264 °C of Ts for 30 min plasma treatment, while it almost remains amorphous after 322 °C thermal treatment for the same time. Full article
(This article belongs to the Special Issue Photonic and Electronic Multilayer Thin Films: Growth, Properties, and Applications)
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