Recent Progress in 2D Semiconductor Materials and Devices

Dear Colleagues,

In this Special Issue, “Recent Progress in 2D Semiconductor Materials and Devices”, we will focus on the field of 2D semiconductor materials in terms of their synthesis, fundamental properties, and the design and fabrication of devices. These materials have been intensively studied in recent years due to their unique physicochemical properties, giving them promising potential in electronics, optoelectronics, batteries, and biomedicine applications. The range of available materials include single-element layers, such as graphene, phosphorene, arsenene, antimonene, and bismuthine, and layered materials with mixed elemental compositions, such as transition metal dichalcogenides, MXenes, and van der Waals heterostructures. In our Special Issue, we welcome novel works on 2D semiconductor materials and their device applications that discuss the most recent breakthroughs and potential impacts in related research fields. All interested researchers are invited to contribute original research articles, short communications, and review articles. Manuscripts will be internationally peer-reviewed. Topics we specifically seek to cover include but are not limited to the following:

• Simulation and design methods of 2D semiconductor materials and their devices;
• Novel methods for the preparation of 2D semiconductor materials and their devices;
• Novel physicochemical properties of 2D semiconductor materials and their devices;
• Novel photoelectrical properties of 2D semiconductor materials and their devices;
• Novel quantum devices and performance based on 2D semiconductor materials;
• Advanced electronic device structure and MOSFET performance based on 2D semiconductor materials;
• Novel studies in interdisciplinary applications of 2D semiconductor materials;
• Promising applications of 2D semiconductor materials and their devices;
• Novel synthesis and fabrication of 2-D heterostructures and mixed-dimensional heterostructures.

Dr. Tianlong Zhao
Prof. Dr. Guoqing Xin
Dr. Shulong Wang
Dr. Dongdong Chen
Dr. Dezhong Cao
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Micromachines is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

• 2D semiconductor materials
• advanced processes
• photodetectors
• quantum devices
• MOSFET devices
• semiconductor device reliability
• first-principles calculations
• modelling and simulation
• intelligent design

• 2D Semiconductor Materials and Devices in Micromachines (4 articles)