Order Article Reprints

Tang Z, Lv Y, Ang K, Wang B, Jiang X, Wang Y, Xu J, Meng H, Chen H, Shi Y, et al. Investigation of the Etching Resistance of Yttrium Oxyfluoride Coating Deposited via Atmospheric Plasma Spraying Against Cl₂/O₂ Plasma. Materials. 2025; 18(9):1903. https://doi.org/10.3390/ma18091903

Tang, Zaifeng, Yukun Lv, Kaiqu Ang, Bing Wang, Xiaojun Jiang, Yuwei Wang, Jin Xu, Hua Meng, Hongli Chen, Ying Shi, and et al. 2025. "Investigation of the Etching Resistance of Yttrium Oxyfluoride Coating Deposited via Atmospheric Plasma Spraying Against Cl₂/O₂ Plasma" Materials 18, no. 9: 1903. https://doi.org/10.3390/ma18091903

Tang, Z., Lv, Y., Ang, K., Wang, B., Jiang, X., Wang, Y., Xu, J., Meng, H., Chen, H., Shi, Y., & Wang, L. (2025). Investigation of the Etching Resistance of Yttrium Oxyfluoride Coating Deposited via Atmospheric Plasma Spraying Against Cl₂/O₂ Plasma. Materials, 18(9), 1903. https://doi.org/10.3390/ma18091903