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Oxide Thin Film Transistors

A special issue of Applied Sciences (ISSN 2076-3417). This special issue belongs to the section "Materials Science and Engineering".

Deadline for manuscript submissions: closed (30 April 2019) | Viewed by 7038

Special Issue Editor


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Guest Editor
School of Electrical and Electronic Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 03722, Korea
Interests: oxide thin-film transistors; solution process; advanced memory; biosensors; phototransistors; CMOS image sensors
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Special Issue Information

Dear Colleagues,

Thin-film transistors (TFTs) have been in extensive use as on/off switches and current-driving devices for various applications since the concept of TFTs was first reported. TFTs are considered one of the most important devices that controls each pixel in active-matrix flat panel displays (AMFPD). TFTs are widely used, not only in liquid crystals (LCs), but also in organic light-emitting diode (OLED) displays, from mobile displays to wide-sized displays. In particular, oxide TFTs have gained significant attention due to their superior performance compared to conventional amorphous Si (a–Si) TFTs, with high mobility, low off-current, and high transparency. Furthermore, oxide TFTs are very attractive for various sensor applications (bio, photo, gas, pressure, etc.) due to their merits, including high sensitivity and compatibility for large-area deposition. This Special Issue of the Applied Sciences, "Oxide Thin-Film Transistors", will cover recent advances in oxide TFT technology. The main topics are as follows: 1) device performance and stability, covering research into improving device performance and stability through material engineering, structural engineering, and post-/pre-treatment engineering of oxide TFTs. 2) Flexible and wearable oxide TFTs. This research deals with wavy, stiff, and neutralizing structures that can improve mechanical stability. 3) Various oxide TFT-based sensors and memory devices. This research includes advanced structures and materials that react to external energy sources such as light, bias, atmosphere, etc. 4) Various oxide materials. This research includes oxide materials such as hafnium oxide (HfOx), zirconium oxide (ZrOx), indium-zinc-oxide (IZO), indium-gallium-zinc-oxide (IGZO), indium-tin-zinc-oxide (ITZO), indium-tin-oxide (ITO), etc. for gate insulators, channels and electrodes.

Prof. Hyun Jae Kim
Guest Editor

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Keywords

  • Thin-film transistors
  • Oxide semiconductor materials
  • Transparent electrodes
  • Solution process (sol-gel, ink jet printing, etc.)
  • Reliability (positive/negative voltage bias, light illumination, temperature, etc.)
  • Flexibility and wearability
  • Stretchability
  • Oxide-based application (biosensors, photo sensors, gas sensors, pressure sensors, and memory etc.)

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Published Papers (2 papers)

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Research

7 pages, 1763 KiB  
Article
Influence of N2/O2 Partial Pressure Ratio during Channel Layer Deposition on the Temperature and Light Stability of a-InGaZnO TFTs
by Xiaoming Huang, Dong Zhou and Weizong Xu
Appl. Sci. 2019, 9(9), 1880; https://doi.org/10.3390/app9091880 - 8 May 2019
Cited by 6 | Viewed by 3673
Abstract
The electrical characteristics of amorphous InGaZnO (a-IGZO) thin film transistors (TFTs) deposited with different N2/O2 partial pressure ratios (PN/O) are investigated. It is found that the device with 20% PN/O exhibits enhanced electrical stability after positive-bias-stress temperature [...] Read more.
The electrical characteristics of amorphous InGaZnO (a-IGZO) thin film transistors (TFTs) deposited with different N2/O2 partial pressure ratios (PN/O) are investigated. It is found that the device with 20% PN/O exhibits enhanced electrical stability after positive-bias-stress temperature (PBST) and negative-bias-stress illumination (NBSI), presenting decreased threshold voltage drift (ΔVth). Compared to the N-free TFT, the average effective interface barrier energy (Eτ) of the TFT with 20% PN/O is increased from 0.37 eV to 0.57 eV during the bias-stress process, which agrees with the suppressed ΔVth from 3.0 V to 1.12 V after the PBS at T = 70 °C. X-ray photoelectron spectroscopy analysis revealed that the enhanced stability of the a-IGZO TFT with 20% PN/O should be ascribed to the control of oxygen vacancy defects at the interfacial region. Full article
(This article belongs to the Special Issue Oxide Thin Film Transistors)
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7 pages, 4474 KiB  
Article
All-Sputtering, High-Transparency, Good-Stability Coplanar Top-Gate Thin Film Transistors
by Jianqiu Chen, Xiuqi Huang, Qunjie Li, Zhiqiang Fang, Honglong Ning, Ruiqiang Tao, Hongfu Liang, Yicong Zhou, Rihui Yao and Junbiao Peng
Appl. Sci. 2019, 9(1), 83; https://doi.org/10.3390/app9010083 - 26 Dec 2018
Cited by 3 | Viewed by 3015
Abstract
In this work, transparent, stable coplanar top-gate thin film transistors (TFTs) with an active layer of neodymium-doped indium oxide and zinc oxide (Nd-IZO) were successfully fabricated on a glass substrate by all sputtering processes. The devices with a post-annealing temperature of 400 °C [...] Read more.
In this work, transparent, stable coplanar top-gate thin film transistors (TFTs) with an active layer of neodymium-doped indium oxide and zinc oxide (Nd-IZO) were successfully fabricated on a glass substrate by all sputtering processes. The devices with a post-annealing temperature of 400 °C exhibited good electrical performances with a saturation mobility (μsat) of 4.25 cm2·V−1·S−1, Ion/Ioff ratio about 106, Vth of −0.97 V and SS about 0.34 V/decade. Furthermore, the devices exhibited excellent negative and positive bias stability (NBS, PBS) of only a ΔVth shift of about −0.04 V and 0.05 V after 1 h, respectively. In addition, the devices showed high transparency about 96% over the visible-light region of 400–700 nm, which indicates a great potential in transparent displays. Full article
(This article belongs to the Special Issue Oxide Thin Film Transistors)
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