Recent and Future Applications of Coatings for Semiconductors

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Surface Engineering for Energy Harvesting, Conversion, and Storage".

Deadline for manuscript submissions: 26 February 2025 | Viewed by 604

Special Issue Editors


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Guest Editor
School of Material Science and Engineering, Jiangsu University of Science and Technology, Zhenjiang 212003, China
Interests: thermoelectric materials; supercapacitor materials; photoelectric detection materials

E-Mail Website
Guest Editor
School of Material Science and Engineering, Jiangsu University of Science and Technology, Zhenjiang 212003, China
Interests: copper interconnects; ceramic materials; barrierless layer materials

Special Issue Information

Dear Colleagues,

Coatings play a significant role in various applications within the semiconductor industry, including surface coatings for various purposes, such as surface protection, electroplating, chemical oxidation, anti-reflection, and the enhancement of photoelectric properties. Internal coatings are primarily utilized for filler materials, packaging, metal interconnects, electronic isolation, and the enhancement of carrier mobility. Functional film coatings are employed for specific device applications, such as photoresistors, solar cells, and piezoelectric components. Semiconductor coatings are engineered to modify the surface or bulk characteristics of semiconductors, enhancing their electrical, optical, and chemical attributes. The efficacy of applying coatings in the semiconductor sector is influenced by preparation procedures and environmental conditions, resulting in a decrease in performance. Consequently, investigations into preparation techniques, microstructural alterations, and consequent changes in the physical properties of semiconductor coatings under varying operational conditions are warranted.

This Special Issue aims to provide Coatings readers with the most up-to-date research on the development of functional coatings for semiconductors. The scope is particularly related to the material design of functional coatings, preparation technology of functional coating, physical mechanism of performance improvement, the use of advanced techniques for testing, etc. We also welcome reviews and research articles.

Dr. Songtao Dong
Dr. Lei Wang
Guest Editors

Manuscript Submission Information

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Keywords

  • functional coating
  • photoelectric performance
  • thermoelectric property
  • dielectric property
  • ferroelectric property
  • photoelectric detection coating
  • dielectric layer coating
  • photoelectric device
  • solar cell absorbing layer coating
  • insulating coating
  • solar transparent conductive layer coating
  • electrolyte coating

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Published Papers (1 paper)

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Research

18 pages, 5614 KiB  
Article
Study on the Multi-Physical Field Simulation of the Double-Glow Plasma Alloying Process Parameters
by Lu Yu, Yiming Wen, Jindong Zhou, Yanzhao Qiu, Danning Yang, Hao Dai, Huilong Zhu, Zhiyuan Hu, Gongtao Liu, Aqib Mashood Khan and Hongyan Wu
Coatings 2024, 14(9), 1175; https://doi.org/10.3390/coatings14091175 - 11 Sep 2024
Viewed by 468
Abstract
In order to study the coupling mechanism of the process parameters during the double-glow discharge process, and thus to enhance the theoretical study of double-glow plasma surface metallurgical technology, in this paper, a two-dimensional fluid model is established using COMSOL simulation software. The [...] Read more.
In order to study the coupling mechanism of the process parameters during the double-glow discharge process, and thus to enhance the theoretical study of double-glow plasma surface metallurgical technology, in this paper, a two-dimensional fluid model is established using COMSOL simulation software. The effects of key processing factors on the distribution of electrons and excited argon ions, potential and electron temperature in the coupling process of double-glow discharge were investigated. The results indicated that the electron density between the two electrode plates increases as the voltage difference increases. The optimal working pressure was kept between 0.14 Torr and 0.29 Torr. The optimal electrode spacing was between 15 mm and 30 mm and decreased with the increase in pressure. Compared with the actual plasma surface alloying process experiment, the simulation results were consistent with the experiments. The research can guide experiments by combining simulation and theory, and the predictability and accuracy of double-glow surface metallurgy technology have been improved. Full article
(This article belongs to the Special Issue Recent and Future Applications of Coatings for Semiconductors)
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